JP6258132B2 - 基板液処理装置 - Google Patents

基板液処理装置 Download PDF

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JP6258132B2
JP6258132B2 JP2014118032A JP2014118032A JP6258132B2 JP 6258132 B2 JP6258132 B2 JP 6258132B2 JP 2014118032 A JP2014118032 A JP 2014118032A JP 2014118032 A JP2014118032 A JP 2014118032A JP 6258132 B2 JP6258132 B2 JP 6258132B2
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substrate
liquid
discharge port
gas
wafer
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JP2015231030A (ja
JP2015231030A5 (enExample
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健 人 久留巣
健 人 久留巣
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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JP2014118032A 2014-06-06 2014-06-06 基板液処理装置 Active JP6258132B2 (ja)

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JP2014118032A JP6258132B2 (ja) 2014-06-06 2014-06-06 基板液処理装置

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JP2014118032A JP6258132B2 (ja) 2014-06-06 2014-06-06 基板液処理装置

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JP2015231030A JP2015231030A (ja) 2015-12-21
JP2015231030A5 JP2015231030A5 (enExample) 2017-01-05
JP6258132B2 true JP6258132B2 (ja) 2018-01-10

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Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
JP6887912B2 (ja) 2017-08-07 2021-06-16 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3293399B2 (ja) * 1995-04-07 2002-06-17 株式会社日立製作所 板状試料表面の処理方法
JPH1057877A (ja) * 1996-05-07 1998-03-03 Hitachi Electron Eng Co Ltd 基板処理装置及び基板処理方法
JPH10135178A (ja) * 1996-10-25 1998-05-22 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2002158202A (ja) * 2000-11-20 2002-05-31 Super Silicon Kenkyusho:Kk ウエハ洗浄装置
JP3803913B2 (ja) * 2001-07-12 2006-08-02 大日本スクリーン製造株式会社 基板乾燥装置、基板乾燥方法および基板のシリコン酸化膜除去方法
JP2007207811A (ja) * 2006-01-31 2007-08-16 Sumco Corp ウェーハの枚葉式エッチング装置
JP4940066B2 (ja) * 2006-10-23 2012-05-30 東京エレクトロン株式会社 洗浄装置、洗浄方法、およびコンピュータ読取可能な記憶媒体

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