JP6254178B2 - ダブル電極放電チャンバの導流装置及びこれを適用した放電チャンバ、エキシマレーザ - Google Patents
ダブル電極放電チャンバの導流装置及びこれを適用した放電チャンバ、エキシマレーザ Download PDFInfo
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- JP6254178B2 JP6254178B2 JP2015543248A JP2015543248A JP6254178B2 JP 6254178 B2 JP6254178 B2 JP 6254178B2 JP 2015543248 A JP2015543248 A JP 2015543248A JP 2015543248 A JP2015543248 A JP 2015543248A JP 6254178 B2 JP6254178 B2 JP 6254178B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
- H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
- H01S3/076—Folded-path lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
Claims (6)
- 対称の構造を有し、2ペアの電極を含む放電チャンバの導流装置であって、
この導流装置は、2つのインペラを含み、この2つのインペラは、前記2ペアの電極のうちの1ペアにそれぞれ対応しており、その実装位置は、前記放電チャンバの対称面に対して対称し、かつ前記電極の下方に位置しており、その回転軸が電極の軸方向に平行し、前記電極の軸方向は前記放電チャンバの底面に平行し、
この2つのインペラは、回転方向が対向しており、回転数が同じであり、
前記インペラの側壁に導流板が実装され、
各前記インペラの下方に、気流がインペラの下方を通過することを阻止するための下スポイラがそれぞれ実装され、
ペア毎の電極の下方実装所から、対応するインペラ方向に上スポイラを延出し、
前記導流板の端末と前記電極の上方との間に上導流板が実装されており、この上導流板と前記上スポイラとは収束型流路を構成していることを特徴とする放電チャンバの導流装置。 - 前記下スポイラは、斜面式又は弧面式であり、すなわち、スポイラの風上側は、斜面又は弧面の形式に設計され、弧面は、内凹または外凸弧面、あるいは、内凹と外凸弧面の組み合わせであることを特徴とする請求項1に記載の放電チャンバの導流装置。
- 2つの前記電極の放電領域の中間位置に、前記放電領域を流す気流を下向きの気流に合流させるための対称の合流導流片が設けられていることを特徴とする請求項1に記載の放電チャンバの導流装置。
- 下導流板は、各前記電極の下方から、対応するインペラに延出されており、前記上スポイラと一体となり、インペラ方向に曲げる弧形になっていることを特徴とする請求項1に記載の放電チャンバの導流装置。
- 請求項1−4のいずれか1項に記載の導流装置を含むことを特徴とするダブル電極放電チャンバ。
- 請求項5に記載のダブル電極放電チャンバを含むことを特徴とするエキシマレーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210476797.3 | 2012-11-21 | ||
CN201210476797.3A CN102969645B (zh) | 2012-11-21 | 2012-11-21 | 双电极放电腔的导流装置及应用其的放电腔、准分子激光器 |
PCT/CN2013/071507 WO2014079174A1 (zh) | 2012-11-21 | 2013-02-07 | 双电极放电腔的导流装置及应用其的放电腔、准分子激光器 |
Publications (2)
Publication Number | Publication Date |
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JP2015537386A JP2015537386A (ja) | 2015-12-24 |
JP6254178B2 true JP6254178B2 (ja) | 2017-12-27 |
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JP2015543248A Active JP6254178B2 (ja) | 2012-11-21 | 2013-02-07 | ダブル電極放電チャンバの導流装置及びこれを適用した放電チャンバ、エキシマレーザ |
Country Status (7)
Country | Link |
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US (1) | US9350135B2 (ja) |
EP (1) | EP2924818B1 (ja) |
JP (1) | JP6254178B2 (ja) |
KR (1) | KR101750425B1 (ja) |
CN (1) | CN102969645B (ja) |
RU (1) | RU2618792C2 (ja) |
WO (1) | WO2014079174A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104697041B (zh) * | 2013-12-04 | 2018-09-18 | 珠海格力电器股份有限公司 | 吊顶式空调内机系统 |
CN104993364A (zh) * | 2015-07-22 | 2015-10-21 | 中国科学院光电研究院 | 一种具有环形腔结构的准分子激光系统 |
US20180212397A1 (en) * | 2015-07-22 | 2018-07-26 | Academy Of Opto-Electronics, Chinese Academy Of Sciences | Excimer laser systems with a ring cavity structure |
CN105655855A (zh) * | 2016-02-26 | 2016-06-08 | 中国科学院光电研究院 | 声波和激波控制装置 |
JPWO2022201843A1 (ja) * | 2021-03-24 | 2022-09-29 | ||
WO2022201844A1 (ja) * | 2021-03-24 | 2022-09-29 | ギガフォトン株式会社 | チャンバ装置、ガスレーザ装置、及び電子デバイスの製造方法 |
CN114294720A (zh) * | 2021-12-28 | 2022-04-08 | 中山市爱美泰电器有限公司 | 一种水源除湿机 |
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JPS60118261A (ja) * | 1983-11-30 | 1985-06-25 | Hitachi Zosen Corp | 塗装装置 |
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JPS6191983A (ja) * | 1984-10-11 | 1986-05-10 | Mitsubishi Electric Corp | 放電励起短パルスレ−ザ装置 |
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JPS61236179A (ja) * | 1985-04-12 | 1986-10-21 | Toshiba Corp | ガスレ−ザ発振装置 |
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2012
- 2012-11-21 CN CN201210476797.3A patent/CN102969645B/zh active Active
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2013
- 2013-02-07 EP EP13856276.4A patent/EP2924818B1/en active Active
- 2013-02-07 US US14/646,176 patent/US9350135B2/en active Active
- 2013-02-07 RU RU2015123678A patent/RU2618792C2/ru active
- 2013-02-07 JP JP2015543248A patent/JP6254178B2/ja active Active
- 2013-02-07 KR KR1020157016499A patent/KR101750425B1/ko active IP Right Grant
- 2013-02-07 WO PCT/CN2013/071507 patent/WO2014079174A1/zh active Application Filing
Also Published As
Publication number | Publication date |
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US9350135B2 (en) | 2016-05-24 |
RU2618792C2 (ru) | 2017-05-11 |
JP2015537386A (ja) | 2015-12-24 |
US20150333468A1 (en) | 2015-11-19 |
WO2014079174A1 (zh) | 2014-05-30 |
KR101750425B1 (ko) | 2017-06-23 |
EP2924818A1 (en) | 2015-09-30 |
CN102969645A (zh) | 2013-03-13 |
EP2924818B1 (en) | 2021-04-21 |
EP2924818A4 (en) | 2016-07-20 |
KR20150106404A (ko) | 2015-09-21 |
CN102969645B (zh) | 2015-07-15 |
RU2015123678A (ru) | 2017-01-10 |
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