JP4899026B2 - レーザ装置 - Google Patents
レーザ装置 Download PDFInfo
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- JP4899026B2 JP4899026B2 JP2006042537A JP2006042537A JP4899026B2 JP 4899026 B2 JP4899026 B2 JP 4899026B2 JP 2006042537 A JP2006042537 A JP 2006042537A JP 2006042537 A JP2006042537 A JP 2006042537A JP 4899026 B2 JP4899026 B2 JP 4899026B2
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- laser
- anode
- cross flow
- flow fan
- main electrode
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- 230000002411 adverse Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Description
図1は、本発明を適用したパルス発振型ガスレーザ装置の一実施例を示しており、このレーザ装置1の基本的な構造は、図4に示した従来のレーザ装置Aに準ずるものである。
2…レーザチャンバ、
3…カソード(主電極)、
4…アノード(主電極)、
5…リターンプレート、
6…コロナバー(予備電離電極)、
6B…外部誘電体、
7…板状端子、
8…クロスフローファン、
8F…ファンブレード、
9…ラジエータ、
S…放電空間。
Claims (2)
- レーザガスを封入したレーザチャンバの内部に、一方向に延在して相対向する一対の主電極と、前記主電極に並行して延在するクロスフローファンを設け、前記主電極間の放電空間に生じさせたパルス状の主放電により前記レーザガスを励起してレーザ光を発振させる、パルス繰り返し数が2KHz以上であるレーザ装置において、
前記クロスフローファンの回転軸の延在方向が、前記主電極の延在方向に対して傾斜して、前記主電極の一端部と前記クロスフローファンの一端部との間の第1の距離と、前記主電極の他端部と前記クロスフローファンの他端部との間の第2の距離との差が、前記クロスフローファンにおいて隣り合うファンブレード同士の間隔の1/2以上、且つ前記間隔の2倍以下になり、かつ、前記クロスフローファンの回転軸の位置が放電空間及び主電極の外側であることを特徴とするレーザ装置。 - 前記クロスフローファンの回転軸の延在方向が、予備電離電極の延在方向に対して傾斜する請求項1記載のレーザ装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006042537A JP4899026B2 (ja) | 2006-02-20 | 2006-02-20 | レーザ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006042537A JP4899026B2 (ja) | 2006-02-20 | 2006-02-20 | レーザ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007221053A JP2007221053A (ja) | 2007-08-30 |
JP4899026B2 true JP4899026B2 (ja) | 2012-03-21 |
Family
ID=38497966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2006042537A Active JP4899026B2 (ja) | 2006-02-20 | 2006-02-20 | レーザ装置 |
Country Status (1)
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JP (1) | JP4899026B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8885684B2 (en) | 2011-06-20 | 2014-11-11 | Mitsubishi Electric Corporation | Gas laser device |
CN102810810A (zh) * | 2012-03-02 | 2012-12-05 | 中国科学院光电研究院 | 单腔双电极放电腔及准分子激光器 |
CN103199412A (zh) * | 2013-03-26 | 2013-07-10 | 中国科学院光电研究院 | 具有微流道结构的单腔双电极放电腔 |
WO2023175729A1 (ja) * | 2022-03-15 | 2023-09-21 | ギガフォトン株式会社 | ガスレーザ装置のチャンバ及び電子デバイスの製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61284984A (ja) * | 1985-06-11 | 1986-12-15 | Mitsubishi Electric Corp | ガスレ−ザ装置 |
DE4112311A1 (de) * | 1991-04-15 | 1992-10-22 | Max Planck Gesellschaft | Transversal elektrisch gepumpter gaslaser mit schraeg ausgefuehrtem strahldurchgang |
US6765946B2 (en) * | 2000-01-25 | 2004-07-20 | Cymer, Inc. | Fan for gas discharge laser |
JP2001345499A (ja) * | 2000-05-31 | 2001-12-14 | Ushio Sogo Gijutsu Kenkyusho:Kk | 放電励起ガスレーザ装置 |
JP2003060270A (ja) * | 2001-08-10 | 2003-02-28 | Gigaphoton Inc | パルス発振ガスレーザ装置 |
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2006
- 2006-02-20 JP JP2006042537A patent/JP4899026B2/ja active Active
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JP2007221053A (ja) | 2007-08-30 |
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