JP6218241B2 - 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物 - Google Patents

薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物 Download PDF

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JP6218241B2
JP6218241B2 JP2014523098A JP2014523098A JP6218241B2 JP 6218241 B2 JP6218241 B2 JP 6218241B2 JP 2014523098 A JP2014523098 A JP 2014523098A JP 2014523098 A JP2014523098 A JP 2014523098A JP 6218241 B2 JP6218241 B2 JP 6218241B2
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block copolymer
block
modified
copolymer
styrene
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JP2014521790A (ja
JP2014521790A5 (OSRAM
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ベイツ、フランク、エス．
キム、サンウォン
ニーリー、ポール、フランクリン
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Wisconsin Alumni Research Foundation
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/08—Isoprene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/04—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes
    • C08F297/046—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes polymerising vinyl aromatic monomers and isoprene, optionally with other conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/08—Epoxidation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/04—Oxidation
    • C08C19/06—Epoxidation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)
JP2014523098A 2011-07-29 2012-07-27 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物 Active JP6218241B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161513343P 2011-07-29 2011-07-29
US61/513,343 2011-07-29
PCT/US2012/048720 WO2013019679A1 (en) 2011-07-29 2012-07-27 Block copolymer materials for directed assembly of thin films

Publications (3)

Publication Number Publication Date
JP2014521790A JP2014521790A (ja) 2014-08-28
JP2014521790A5 JP2014521790A5 (OSRAM) 2015-09-10
JP6218241B2 true JP6218241B2 (ja) 2017-10-25

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US (1) US9580534B2 (OSRAM)
EP (1) EP2736931A1 (OSRAM)
JP (1) JP6218241B2 (OSRAM)
KR (1) KR101963924B1 (OSRAM)
WO (1) WO2013019679A1 (OSRAM)

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US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
KR20140090595A (ko) * 2011-09-06 2014-07-17 코넬 유니버시티 블럭 공중합체 및 그것을 사용한 리소그래피 패턴화
US8821738B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc Thermal annealing process
US8821739B2 (en) * 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc High temperature thermal annealing process
KR102245179B1 (ko) 2013-04-03 2021-04-28 브레우어 사이언스, 인코포레이션 지향성 자가 조립용 블록 공중합체에 사용하기 위한 고도로 내에칭성인 중합체 블록
FR3014877B1 (fr) 2013-12-17 2017-03-31 Arkema France Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
US9518907B2 (en) * 2014-01-16 2016-12-13 The Boeing Company Methods and apparatus to determine integrity of composite structures
WO2015109224A1 (en) * 2014-01-16 2015-07-23 Brewer Science Inc. High-chi block copolymers for directed self-assembly
FR3022249B1 (fr) 2014-06-11 2018-01-19 Arkema France Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
US9758648B2 (en) * 2015-03-30 2017-09-12 Kraton Polymers U.S. Llc Curable transparent rubber composition, a cured transparent rubber composition made thereof, and manufacturing process for the same
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
KR102508525B1 (ko) 2015-10-19 2023-03-09 삼성전자주식회사 블록 코폴리머 및 이를 이용한 집적회로 소자의 제조 방법
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
CN109153760B (zh) 2016-02-23 2021-10-29 得克萨斯大学体系董事会 用于10nm以下构图的嵌段共聚物
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WO2020026236A1 (en) * 2018-07-29 2020-02-06 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. Multi-morphology block co-polymer films and processes for their preparation
JP2020189930A (ja) 2019-05-22 2020-11-26 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
JP7541306B2 (ja) * 2020-01-24 2024-08-28 東京応化工業株式会社 相分離構造形成用樹脂組成物、相分離構造を含む構造体の製造方法、及びブロックコポリマー
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Publication number Publication date
US20130029113A1 (en) 2013-01-31
EP2736931A1 (en) 2014-06-04
JP2014521790A (ja) 2014-08-28
KR20140061431A (ko) 2014-05-21
KR101963924B1 (ko) 2019-03-29
WO2013019679A1 (en) 2013-02-07
US9580534B2 (en) 2017-02-28

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