JP6217651B2 - 基板処理装置、デバイス製造システム及びデバイス製造方法 - Google Patents

基板処理装置、デバイス製造システム及びデバイス製造方法 Download PDF

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JP6217651B2
JP6217651B2 JP2014553056A JP2014553056A JP6217651B2 JP 6217651 B2 JP6217651 B2 JP 6217651B2 JP 2014553056 A JP2014553056 A JP 2014553056A JP 2014553056 A JP2014553056 A JP 2014553056A JP 6217651 B2 JP6217651 B2 JP 6217651B2
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Prior art keywords
projection
substrate
light
optical system
illumination
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Japanese (ja)
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JPWO2014097859A1 (ja
Inventor
加藤　正紀
正紀 加藤
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2014553056A 2012-12-18 2013-11-29 基板処理装置、デバイス製造システム及びデバイス製造方法 Active JP6217651B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012276139 2012-12-18
JP2012276139 2012-12-18
PCT/JP2013/082185 WO2014097859A1 (ja) 2012-12-18 2013-11-29 基板処理装置、デバイス製造システム及びデバイス製造方法

Related Child Applications (1)

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JP2017178348A Division JP6414303B2 (ja) 2012-12-18 2017-09-15 基板処理装置、デバイス製造システム及びデバイス製造方法

Publications (2)

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JPWO2014097859A1 JPWO2014097859A1 (ja) 2017-01-12
JP6217651B2 true JP6217651B2 (ja) 2017-10-25

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JP2014553056A Active JP6217651B2 (ja) 2012-12-18 2013-11-29 基板処理装置、デバイス製造システム及びデバイス製造方法
JP2017178348A Active JP6414303B2 (ja) 2012-12-18 2017-09-15 基板処理装置、デバイス製造システム及びデバイス製造方法
JP2018186122A Active JP6635167B2 (ja) 2012-12-18 2018-09-28 投影露光装置及びデバイス製造方法
JP2019222657A Pending JP2020052420A (ja) 2012-12-18 2019-12-10 露光装置及びデバイス製造方法

Family Applications After (3)

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JP2017178348A Active JP6414303B2 (ja) 2012-12-18 2017-09-15 基板処理装置、デバイス製造システム及びデバイス製造方法
JP2018186122A Active JP6635167B2 (ja) 2012-12-18 2018-09-28 投影露光装置及びデバイス製造方法
JP2019222657A Pending JP2020052420A (ja) 2012-12-18 2019-12-10 露光装置及びデバイス製造方法

Country Status (6)

Country Link
JP (4) JP6217651B2 (xx)
KR (6) KR101988820B1 (xx)
CN (2) CN107247388B (xx)
HK (1) HK1208915A1 (xx)
TW (3) TWI687779B (xx)
WO (1) WO2014097859A1 (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107255858B (zh) * 2011-12-20 2020-05-29 株式会社尼康 基底处理装置
EP4130239A4 (en) 2020-03-24 2024-05-15 Kaneka Corporation METHODS FOR INDUCING DIFFERENTIATION IN PANCREAS ALPHA CELLS
CN114070971A (zh) * 2020-07-27 2022-02-18 奥林巴斯株式会社 观察装置、光偏转单元、像形成方法
CN117031720B (zh) * 2023-09-28 2023-12-29 微纳动力(北京)科技有限责任公司 一种自动化集成光学装置及系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0864501A (ja) 1994-08-25 1996-03-08 Nikon Corp 投影光学系及びそれを備えた露光装置
JP2002258489A (ja) * 2000-04-20 2002-09-11 Nikon Corp 露光装置および露光方法
KR101653514B1 (ko) * 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path
DE102005030839A1 (de) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
EP2003506A2 (en) * 2006-03-20 2008-12-17 Nikon Corporation Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
JP4984631B2 (ja) 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
JP4880511B2 (ja) * 2007-03-28 2012-02-22 株式会社オーク製作所 露光描画装置
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2009231311A (ja) * 2008-03-19 2009-10-08 Nikon Corp 照明装置、露光装置、露光方法及びデバイス製造方法
DE102009037077B3 (de) * 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP2012004564A (ja) * 2010-06-11 2012-01-05 Nikon Corp 露光方法、露光装置、デバイス製造方法
JPWO2013035661A1 (ja) * 2011-09-07 2015-03-23 株式会社ニコン 基板処理装置
CN107255858B (zh) 2011-12-20 2020-05-29 株式会社尼康 基底处理装置

Also Published As

Publication number Publication date
KR102009138B1 (ko) 2019-08-08
KR102075325B1 (ko) 2020-02-07
KR101903941B1 (ko) 2018-10-02
KR101988820B1 (ko) 2019-06-12
TWI687779B (zh) 2020-03-11
KR20190067258A (ko) 2019-06-14
KR20150097514A (ko) 2015-08-26
KR20190093699A (ko) 2019-08-09
HK1208915A1 (en) 2016-03-18
KR101861905B1 (ko) 2018-05-28
JPWO2014097859A1 (ja) 2017-01-12
JP6414303B2 (ja) 2018-10-31
TW201905603A (zh) 2019-02-01
WO2014097859A1 (ja) 2014-06-26
CN104871091A (zh) 2015-08-26
CN107247388A (zh) 2017-10-13
TW201426202A (zh) 2014-07-01
CN107247388B (zh) 2018-09-18
KR20180040730A (ko) 2018-04-20
JP6635167B2 (ja) 2020-01-22
TW201740218A (zh) 2017-11-16
TWI639896B (zh) 2018-11-01
TWI596438B (zh) 2017-08-21
JP2019049723A (ja) 2019-03-28
KR20170127053A (ko) 2017-11-20
CN104871091B (zh) 2017-06-30
KR20190000398A (ko) 2019-01-02
KR101934228B1 (ko) 2018-12-31
JP2020052420A (ja) 2020-04-02
JP2017227916A (ja) 2017-12-28

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