JP6212884B2 - 露光装置、露光方法、及びデバイス製造方法 - Google Patents

露光装置、露光方法、及びデバイス製造方法 Download PDF

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JP6212884B2
JP6212884B2 JP2013053321A JP2013053321A JP6212884B2 JP 6212884 B2 JP6212884 B2 JP 6212884B2 JP 2013053321 A JP2013053321 A JP 2013053321A JP 2013053321 A JP2013053321 A JP 2013053321A JP 6212884 B2 JP6212884 B2 JP 6212884B2
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substrate
liquid
exposure apparatus
exposure
space
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JP2014179509A5 (enExample
JP2014179509A (ja
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真路 佐藤
真路 佐藤
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Nikon Corp
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JP2013053321A 2013-03-15 2013-03-15 露光装置、露光方法、及びデバイス製造方法 Active JP6212884B2 (ja)

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JP2014179509A JP2014179509A (ja) 2014-09-25
JP2014179509A5 JP2014179509A5 (enExample) 2016-03-24
JP6212884B2 true JP6212884B2 (ja) 2017-10-18

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US11156921B2 (en) 2017-12-15 2021-10-26 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006237291A (ja) * 2005-02-25 2006-09-07 Canon Inc 露光装置
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
JP2010157726A (ja) * 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9256137B2 (en) * 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method

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