JP6174899B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

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Publication number
JP6174899B2
JP6174899B2 JP2013098202A JP2013098202A JP6174899B2 JP 6174899 B2 JP6174899 B2 JP 6174899B2 JP 2013098202 A JP2013098202 A JP 2013098202A JP 2013098202 A JP2013098202 A JP 2013098202A JP 6174899 B2 JP6174899 B2 JP 6174899B2
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JP
Japan
Prior art keywords
data holding
transistor
holding unit
electrically connected
region
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Expired - Fee Related
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JP2013098202A
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English (en)
Japanese (ja)
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JP2013254945A (ja
JP2013254945A5 (enExample
Inventor
達也 大貫
達也 大貫
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP2013098202A priority Critical patent/JP6174899B2/ja
Publication of JP2013254945A publication Critical patent/JP2013254945A/ja
Publication of JP2013254945A5 publication Critical patent/JP2013254945A5/ja
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/06—Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/063—Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C14/00—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down
    • G11C14/0054—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down in which the volatile element is a SRAM cell
    • G11C14/0063—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down in which the volatile element is a SRAM cell and the nonvolatile element is an EEPROM element, e.g. a floating gate or MNOS transistor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/06—Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/10—Arrangements for interconnecting storage elements electrically, e.g. by wiring for interconnecting capacitors

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Static Random-Access Memory (AREA)
JP2013098202A 2012-05-11 2013-05-08 半導体装置 Expired - Fee Related JP6174899B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013098202A JP6174899B2 (ja) 2012-05-11 2013-05-08 半導体装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012109286 2012-05-11
JP2012109286 2012-05-11
JP2013098202A JP6174899B2 (ja) 2012-05-11 2013-05-08 半導体装置

Publications (3)

Publication Number Publication Date
JP2013254945A JP2013254945A (ja) 2013-12-19
JP2013254945A5 JP2013254945A5 (enExample) 2016-06-16
JP6174899B2 true JP6174899B2 (ja) 2017-08-02

Family

ID=49548479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013098202A Expired - Fee Related JP6174899B2 (ja) 2012-05-11 2013-05-08 半導体装置

Country Status (2)

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US (1) US9001549B2 (enExample)
JP (1) JP6174899B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102087443B1 (ko) 2012-05-11 2020-03-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 구동 방법
JP2014195241A (ja) 2013-02-28 2014-10-09 Semiconductor Energy Lab Co Ltd 半導体装置
US9607991B2 (en) 2013-09-05 2017-03-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
TWI658597B (zh) 2014-02-07 2019-05-01 日商半導體能源研究所股份有限公司 半導體裝置
KR102581808B1 (ko) 2014-12-18 2023-09-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 센서 장치, 및 전자 기기
JP6981401B2 (ja) * 2016-02-29 2021-12-15 ソニーグループ株式会社 半導体回路、半導体回路の駆動方法、および電子機器
WO2017158465A1 (ja) 2016-03-18 2017-09-21 株式会社半導体エネルギー研究所 記憶装置
TWI724231B (zh) * 2016-09-09 2021-04-11 日商半導體能源硏究所股份有限公司 記憶體裝置及其工作方法、半導體裝置、電子構件以及電子裝置
KR102412243B1 (ko) 2017-01-10 2022-06-23 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 동작 방법, 전자 부품, 및 전자 기기
WO2020139895A1 (en) * 2018-12-24 2020-07-02 The Trustees Of Columbia University In The City Of New York Circuits and methods for in-memory computing

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291168A (ja) * 1986-06-11 1987-12-17 Seiko Instr & Electronics Ltd 不揮発性ｒａｍ
JPH01307094A (ja) * 1988-06-02 1989-12-12 Seiko Instr Inc 不揮発性ｒａｍ
JPH0770227B2 (ja) * 1990-10-01 1995-07-31 日鉄セミコンダクター株式会社 半導体メモリの読出し動作制御方法
JPH04366495A (ja) * 1991-06-14 1992-12-18 Kawasaki Steel Corp 不揮発性メモリ
JP4198201B2 (ja) * 1995-06-02 2008-12-17 株式会社ルネサステクノロジ 半導体装置
JP2000293989A (ja) * 1999-04-07 2000-10-20 Nec Corp 強誘電体容量を用いたシャドーｒａｍセル及び不揮発性メモリ装置並びにその制御方法
JP5064747B2 (ja) 2005-09-29 2012-10-31 株式会社半導体エネルギー研究所 半導体装置、電気泳動表示装置、表示モジュール、電子機器、及び半導体装置の作製方法
EP3614442A3 (en) 2005-09-29 2020-03-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having oxide semiconductor layer and manufactoring method thereof
JP5078246B2 (ja) 2005-09-29 2012-11-21 株式会社半導体エネルギー研究所 半導体装置、及び半導体装置の作製方法
JP2007108402A (ja) 2005-10-13 2007-04-26 Kyocera Mita Corp 半導体集積回路
US20100006912A1 (en) * 2008-07-14 2010-01-14 Honeywell International Inc. Planar Metal-Insulator-Metal Circuit Element and Method for Planar Integration of Same
JP5781720B2 (ja) * 2008-12-15 2015-09-24 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
JP2010218671A (ja) * 2009-03-19 2010-09-30 Renesas Electronics Corp 半導体記憶装置
EP2502272B1 (en) 2009-11-20 2015-04-15 Semiconductor Energy Laboratory Co. Ltd. Nonvolatile latch circuit and logic circuit, and semiconductor device using the same
CN102714180B (zh) * 2009-12-11 2015-03-25 株式会社半导体能源研究所 非易失性锁存电路和逻辑电路以及使用它们的半导体器件
WO2011074408A1 (en) 2009-12-18 2011-06-23 Semiconductor Energy Laboratory Co., Ltd. Non-volatile latch circuit and logic circuit, and semiconductor device using the same
KR20200013808A (ko) * 2009-12-25 2020-02-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 메모리 장치, 반도체 장치, 및 전자 장치
TWI616873B (zh) 2011-05-20 2018-03-01 半導體能源研究所股份有限公司 儲存裝置及信號處理電路
KR102087443B1 (ko) 2012-05-11 2020-03-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 구동 방법

Also Published As

Publication number Publication date
JP2013254945A (ja) 2013-12-19
US9001549B2 (en) 2015-04-07
US20130301332A1 (en) 2013-11-14

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