JP6173146B2 - 樹脂ガラス及びその製造方法 - Google Patents
樹脂ガラス及びその製造方法 Download PDFInfo
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- JP6173146B2 JP6173146B2 JP2013197709A JP2013197709A JP6173146B2 JP 6173146 B2 JP6173146 B2 JP 6173146B2 JP 2013197709 A JP2013197709 A JP 2013197709A JP 2013197709 A JP2013197709 A JP 2013197709A JP 6173146 B2 JP6173146 B2 JP 6173146B2
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- 229920005989 resin Polymers 0.000 title claims description 166
- 239000011347 resin Substances 0.000 title claims description 166
- 239000011521 glass Substances 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000463 material Substances 0.000 claims description 69
- 150000003377 silicon compounds Chemical class 0.000 claims description 35
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 29
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 29
- 229920005749 polyurethane resin Polymers 0.000 claims description 25
- 229920005668 polycarbonate resin Polymers 0.000 claims description 23
- 239000004431 polycarbonate resin Substances 0.000 claims description 23
- 238000010030 laminating Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 186
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 28
- 238000000034 method Methods 0.000 description 26
- 239000000047 product Substances 0.000 description 21
- 239000007789 gas Substances 0.000 description 18
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 17
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 16
- 239000013067 intermediate product Substances 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 15
- 229910052786 argon Inorganic materials 0.000 description 14
- 239000003973 paint Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 9
- 229910001882 dioxygen Inorganic materials 0.000 description 9
- 229920005862 polyol Polymers 0.000 description 9
- 238000005299 abrasion Methods 0.000 description 8
- 238000009832 plasma treatment Methods 0.000 description 8
- 238000002156 mixing Methods 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- -1 acrylic polyol Chemical class 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229920000515 polycarbonate Polymers 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 150000003077 polyols Chemical class 0.000 description 5
- 229910052724 xenon Inorganic materials 0.000 description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 229910021331 inorganic silicon compound Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000002650 laminated plastic Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- AJJVKRVIERKZPK-UHFFFAOYSA-N methyl(triethoxymethyl)silane Chemical compound C(C)OC([SiH2]C)(OCC)OCC AJJVKRVIERKZPK-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NKLYMYLJOXIVFB-UHFFFAOYSA-N triethoxymethylsilane Chemical compound CCOC([SiH3])(OCC)OCC NKLYMYLJOXIVFB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- TUQLLQQWSNWKCF-UHFFFAOYSA-N trimethoxymethylsilane Chemical compound COC([SiH3])(OC)OC TUQLLQQWSNWKCF-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Laminated Bodies (AREA)
Description
14 アンダーコート層 16 トップコート層
18 下地層 22 プラズマCVD装置
Claims (2)
- ポリカーボネート製の樹脂成形品からなる樹脂基材の表面上に、ポリウレタン樹脂からなるアンダーコート層が積層形成されると共に、該アンダーコート層上に、珪素化合物からなるトップコート層が更に積層形成されてなる樹脂ガラスであって、
前記アンダーコート層と樹脂基材との間に、アクリルウレタン樹脂からなる下地層が形成されており、
該下地層は、前記樹脂基材の表面上の全面に亘って形成されており、
該下地層の表面上の全面に亘って前記アンダーコート層が形成されている、
ことを特徴とする樹脂ガラス。 - ポリカーボネート製の樹脂成形品からなる樹脂基材の表面上に、ポリウレタン樹脂からなるアンダーコート層が積層形成されると共に、該アンダーコート層上に、珪素化合物からなるトップコート層が更に積層形成されてなる樹脂ガラスの製造方法であって、
前記樹脂基材を準備する工程と、
該樹脂基材の表面上の全面に亘って、アクリルウレタン樹脂からなる下地層を形成する工程と、
該下地層の表面上の全面に亘って、前記ポリウレタン樹脂からなるアンダーコート層を形成する工程と、
該アンダーコート層の表面上に、前記珪素化合物からなるトップコート層を積層形成する工程と、
を含むことを特徴とする樹脂ガラスの製造方法。
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JP2013197709A JP6173146B2 (ja) | 2013-09-25 | 2013-09-25 | 樹脂ガラス及びその製造方法 |
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JP2013197709A JP6173146B2 (ja) | 2013-09-25 | 2013-09-25 | 樹脂ガラス及びその製造方法 |
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JP2015063051A JP2015063051A (ja) | 2015-04-09 |
JP6173146B2 true JP6173146B2 (ja) | 2017-08-02 |
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Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4461897B2 (ja) * | 2004-05-06 | 2010-05-12 | 凸版印刷株式会社 | 反射フィルム |
JP4681372B2 (ja) * | 2004-12-09 | 2011-05-11 | 帝人化成株式会社 | 着色層を有する透明樹脂積層体と金属枠との接着体 |
US20080160298A1 (en) * | 2006-12-28 | 2008-07-03 | Chengtao Li | Polycarbonate glazing system and method for making the same |
WO2008137505A1 (en) * | 2007-05-01 | 2008-11-13 | Exatec, Llc | A plastic glazing panel having uv curable printed pattern and process for making the same |
PL2266711T3 (pl) * | 2008-03-04 | 2014-09-30 | Kk Reniasu | Przezroczysta płytka z żywicy i sposób jej wytwarzania |
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