JP6141969B2 - 大面積を有する基板のテクスチャ加工方法 - Google Patents

大面積を有する基板のテクスチャ加工方法 Download PDF

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Publication number
JP6141969B2
JP6141969B2 JP2015512106A JP2015512106A JP6141969B2 JP 6141969 B2 JP6141969 B2 JP 6141969B2 JP 2015512106 A JP2015512106 A JP 2015512106A JP 2015512106 A JP2015512106 A JP 2015512106A JP 6141969 B2 JP6141969 B2 JP 6141969B2
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JP
Japan
Prior art keywords
substrate
pouch
minutes
mold
deformable layer
Prior art date
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Expired - Fee Related
Application number
JP2015512106A
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English (en)
Japanese (ja)
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JP2015522443A (ja
Inventor
シュマン ニコラ
シュマン ニコラ
テセール ジェレミー
テセール ジェレミー
ゾンデルガルト エリン
ゾンデルガルト エリン
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Saint Gobain Glass France SAS
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Saint Gobain Glass France SAS
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Publication of JP2015522443A publication Critical patent/JP2015522443A/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
    • B29C43/12—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies using bags surrounding the moulding material or using membranes contacting the moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/0227—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould using pressure vessels, e.g. autoclaves, vulcanising pans
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
    • B29C43/3642—Bags, bleeder sheets or cauls for isostatic pressing
    • B29C2043/3644—Vacuum bags; Details thereof, e.g. fixing or clamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2015512106A 2012-05-14 2013-05-14 大面積を有する基板のテクスチャ加工方法 Expired - Fee Related JP6141969B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1254373A FR2990384B1 (fr) 2012-05-14 2012-05-14 Procede de texturation sur un substrat de grande surface
FR1254373 2012-05-14
PCT/FR2013/051048 WO2013171420A1 (fr) 2012-05-14 2013-05-14 Procede de texturation sur un substrat de grande surface

Publications (2)

Publication Number Publication Date
JP2015522443A JP2015522443A (ja) 2015-08-06
JP6141969B2 true JP6141969B2 (ja) 2017-06-07

Family

ID=48577122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015512106A Expired - Fee Related JP6141969B2 (ja) 2012-05-14 2013-05-14 大面積を有する基板のテクスチャ加工方法

Country Status (9)

Country Link
US (1) US9296132B2 (https=)
EP (1) EP2850493A1 (https=)
JP (1) JP6141969B2 (https=)
KR (1) KR20150010726A (https=)
CN (1) CN104272187A (https=)
EA (1) EA201492087A1 (https=)
FR (1) FR2990384B1 (https=)
IN (1) IN2014MN02198A (https=)
WO (1) WO2013171420A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11133118B2 (en) * 2012-05-22 2021-09-28 University Of Massachusetts Patterned nanoparticle structures
US10088110B2 (en) * 2016-05-17 2018-10-02 Hexagon Technology As Pressure vessel liner venting via nanotextured surface
EP3481562A4 (en) * 2016-07-08 2019-06-26 University of Massachusetts STRUCTURING OF NANOSTRUCTURES WITH IMPRINT LITHOGRAPHY
FR3065723B1 (fr) 2017-04-28 2021-09-03 Saint Gobain Article protege par une couche de protection temporaire rugueuse
KR102870782B1 (ko) * 2019-08-06 2025-10-13 엘지전자 주식회사 디스플레이 장치의 제조 방법 및 디스플레이 장치 제조를 위한 전사 기판
US12044963B2 (en) 2020-01-22 2024-07-23 Applied Materials, Inc. High refractive index imprint compositions and materials and processes for making the same
US11892771B2 (en) 2020-04-20 2024-02-06 Applied Materials, Inc. Methods for increasing the density of high-index nanoimprint lithography films
FR3122523B1 (fr) * 2021-04-30 2023-06-09 Commissariat Energie Atomique Procede de structuration de surface hybride par gravure plasma
CN116875091B (zh) * 2023-07-12 2024-08-30 东方绿色能源(河北)有限公司华中分公司 一种不锈钢基体表面超疏水薄膜及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1493348A (en) * 1973-10-30 1977-11-30 Ft Projects Ltd Thermal treatment of heat fusible materials
US4360266A (en) * 1979-08-24 1982-11-23 Dai Nippon Insatsu Kabushiki Kaisha Contact printing method and apparatus
JPS6172529A (ja) * 1984-09-17 1986-04-14 Mitsui Toatsu Chem Inc 複合材料の製法
US5393365A (en) * 1993-11-19 1995-02-28 E. I. Du Pont De Nemours And Company Embossed glass/plastic laminate and process for preparing the same
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
SE515607C2 (sv) * 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US20050084613A1 (en) * 2003-08-19 2005-04-21 Jian Wang Sub-micron-scale patterning method and system
CN100540275C (zh) 2003-11-17 2009-09-16 陶氏康宁公司 固化有机硅树脂基底的压花方法
JP4146817B2 (ja) * 2004-04-16 2008-09-10 サカイオーベックス株式会社 繊維強化積層材の製造方法
US7195733B2 (en) * 2004-04-27 2007-03-27 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
US7186367B2 (en) * 2004-05-13 2007-03-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Double vacuum bag process for resin matrix composite manufacturing
FR2893610B1 (fr) * 2005-11-23 2008-07-18 Saint Gobain Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations
JP2012061820A (ja) * 2010-09-17 2012-03-29 Dainippon Printing Co Ltd 繊維強化複合材料の賦型方法

Also Published As

Publication number Publication date
JP2015522443A (ja) 2015-08-06
FR2990384A1 (fr) 2013-11-15
IN2014MN02198A (https=) 2015-09-11
WO2013171420A1 (fr) 2013-11-21
US9296132B2 (en) 2016-03-29
FR2990384B1 (fr) 2015-05-15
CN104272187A (zh) 2015-01-07
EP2850493A1 (fr) 2015-03-25
KR20150010726A (ko) 2015-01-28
US20150140837A1 (en) 2015-05-21
EA201492087A1 (ru) 2015-02-27

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