IN2014MN02198A - - Google Patents

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Publication number
IN2014MN02198A
IN2014MN02198A IN2198MUN2014A IN2014MN02198A IN 2014MN02198 A IN2014MN02198 A IN 2014MN02198A IN 2198MUN2014 A IN2198MUN2014 A IN 2198MUN2014A IN 2014MN02198 A IN2014MN02198 A IN 2014MN02198A
Authority
IN
India
Prior art keywords
substrate
bag
introducing
chamber
secondary stamp
Prior art date
Application number
Inventor
Nicolas Chemin
Jérémie Teisseire
Elin Sondergard
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of IN2014MN02198A publication Critical patent/IN2014MN02198A/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
    • B29C43/12—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies using bags surrounding the moulding material or using membranes contacting the moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/0227—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould using pressure vessels, e.g. autoclaves, vulcanising pans
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
    • B29C43/3642—Bags, bleeder sheets or cauls for isostatic pressing
    • B29C2043/3644—Vacuum bags; Details thereof, e.g. fixing or clamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing

Abstract

The invention relates to a method for forming a texture on a substrate comprising: depositing a deformable layer on the substrate; bringing the deformable layer into contact with the textured surface of a secondary stamp; introducing the covered substrate and the secondary stamp into a bag made from non permeable material; introducing the bag and the contents thereof into a sealed chamber; removing the air from the chamber until a pressure value of at most 0.5 bar is obtained; sealing the bag before reintroducing air into the chamber; introducing the sealed bag and the contents thereof into an autoclave; applying a pressure of between 0.5 and 8 bar and a temperature of between 25 and 400 °C for a period of between 15 minutes and several hours; opening the bag; and separating the substrate and the secondary stamp. The invention also relates to: a transparent assembly comprising a glass substrate covered with a textured layer which is obtained using the above method; and the uses of the method in order to obtain a substrate intended for extracting guiding or redirecting light or a superhydrophobic or superhydrophilic substrate.
IN2198MUN2014 2012-05-14 2013-05-14 IN2014MN02198A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1254373A FR2990384B1 (en) 2012-05-14 2012-05-14 METHOD FOR TEXTURING ON A LARGE SURFACE SUBSTRATE
PCT/FR2013/051048 WO2013171420A1 (en) 2012-05-14 2013-05-14 Method for texturing a substrate having a large surface area

Publications (1)

Publication Number Publication Date
IN2014MN02198A true IN2014MN02198A (en) 2015-09-11

Family

ID=48577122

Family Applications (1)

Application Number Title Priority Date Filing Date
IN2198MUN2014 IN2014MN02198A (en) 2012-05-14 2013-05-14

Country Status (9)

Country Link
US (1) US9296132B2 (en)
EP (1) EP2850493A1 (en)
JP (1) JP6141969B2 (en)
KR (1) KR20150010726A (en)
CN (1) CN104272187A (en)
EA (1) EA201492087A1 (en)
FR (1) FR2990384B1 (en)
IN (1) IN2014MN02198A (en)
WO (1) WO2013171420A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11133118B2 (en) 2012-05-22 2021-09-28 University Of Massachusetts Patterned nanoparticle structures
US10088110B2 (en) * 2016-05-17 2018-10-02 Hexagon Technology As Pressure vessel liner venting via nanotextured surface
US20190243237A1 (en) * 2016-07-08 2019-08-08 University Of Massachusetts Patterning of nanostructures using imprint lithography
FR3065723B1 (en) 2017-04-28 2021-09-03 Saint Gobain ARTICLE PROTECTED BY A ROUGH TEMPORARY PROTECTIVE LAYER
US20210325777A1 (en) 2020-04-20 2021-10-21 Applied Materials, Inc. Methods for increasing the refractive index of high-index nanoimprint lithography films
FR3122523B1 (en) * 2021-04-30 2023-06-09 Commissariat Energie Atomique HYBRID SURFACE STRUCTURING PROCESS BY PLASMA ETCHING

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1493348A (en) * 1973-10-30 1977-11-30 Ft Projects Ltd Thermal treatment of heat fusible materials
US4360266A (en) * 1979-08-24 1982-11-23 Dai Nippon Insatsu Kabushiki Kaisha Contact printing method and apparatus
JPS6172529A (en) * 1984-09-17 1986-04-14 Mitsui Toatsu Chem Inc Manufacture of composite material
US5393365A (en) * 1993-11-19 1995-02-28 E. I. Du Pont De Nemours And Company Embossed glass/plastic laminate and process for preparing the same
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
SE515607C2 (en) * 1999-12-10 2001-09-10 Obducat Ab Device and method for fabrication of structures
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
JP2007503120A (en) * 2003-08-19 2007-02-15 ナノオプト コーポレーション Submicron scale patterning method and system
EP1687130B1 (en) 2003-11-17 2007-11-28 Dow Corning Corporation Method of embossing cured silicone resin substrates
JP4146817B2 (en) * 2004-04-16 2008-09-10 サカイオーベックス株式会社 Manufacturing method of fiber reinforced laminate
EP1742893B1 (en) * 2004-04-27 2012-10-10 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
US7186367B2 (en) * 2004-05-13 2007-03-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Double vacuum bag process for resin matrix composite manufacturing
FR2893610B1 (en) * 2005-11-23 2008-07-18 Saint Gobain SURFACE STRUCTURING METHOD OF A GLASS PRODUCT, A STRUCTURED SURFACE GLASS PRODUCT, AND USES
JP2012061820A (en) * 2010-09-17 2012-03-29 Dainippon Printing Co Ltd Molding method of fiber-reinforced composite material

Also Published As

Publication number Publication date
FR2990384A1 (en) 2013-11-15
EA201492087A1 (en) 2015-02-27
JP2015522443A (en) 2015-08-06
WO2013171420A1 (en) 2013-11-21
US9296132B2 (en) 2016-03-29
KR20150010726A (en) 2015-01-28
FR2990384B1 (en) 2015-05-15
CN104272187A (en) 2015-01-07
EP2850493A1 (en) 2015-03-25
US20150140837A1 (en) 2015-05-21
JP6141969B2 (en) 2017-06-07

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