JP6124276B2 - 基体表面の親水性維持方法 - Google Patents
基体表面の親水性維持方法 Download PDFInfo
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- JP6124276B2 JP6124276B2 JP2012173998A JP2012173998A JP6124276B2 JP 6124276 B2 JP6124276 B2 JP 6124276B2 JP 2012173998 A JP2012173998 A JP 2012173998A JP 2012173998 A JP2012173998 A JP 2012173998A JP 6124276 B2 JP6124276 B2 JP 6124276B2
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- 239000000758 substrate Substances 0.000 title claims description 226
- 238000000034 method Methods 0.000 title claims description 28
- 239000000126 substance Substances 0.000 claims description 108
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 56
- 238000004519 manufacturing process Methods 0.000 claims description 49
- 239000004020 conductor Substances 0.000 claims description 48
- 230000005660 hydrophilic surface Effects 0.000 claims description 48
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 45
- 229920001296 polysiloxane Polymers 0.000 claims description 39
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 38
- 230000003373 anti-fouling effect Effects 0.000 claims description 25
- 230000001699 photocatalysis Effects 0.000 claims description 24
- 230000007774 longterm Effects 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 17
- 239000002131 composite material Substances 0.000 claims description 15
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 14
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 14
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 9
- 150000001450 anions Chemical class 0.000 claims description 7
- 150000001768 cations Chemical class 0.000 claims description 7
- 238000012423 maintenance Methods 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 72
- -1 polyethylene Polymers 0.000 description 62
- 229910052751 metal Inorganic materials 0.000 description 45
- 239000002184 metal Substances 0.000 description 42
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 40
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 39
- 238000011156 evaluation Methods 0.000 description 39
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 34
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 34
- 238000000576 coating method Methods 0.000 description 33
- 239000007800 oxidant agent Substances 0.000 description 33
- 150000001875 compounds Chemical class 0.000 description 31
- 239000000356 contaminant Substances 0.000 description 31
- 239000007788 liquid Substances 0.000 description 30
- 239000000203 mixture Substances 0.000 description 30
- 239000002585 base Substances 0.000 description 29
- 239000010410 layer Substances 0.000 description 29
- 238000001035 drying Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 24
- 239000000243 solution Substances 0.000 description 24
- 239000010949 copper Substances 0.000 description 23
- 239000010936 titanium Substances 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
- 239000011135 tin Substances 0.000 description 21
- 229910021529 ammonia Inorganic materials 0.000 description 20
- 229910052718 tin Inorganic materials 0.000 description 19
- 229910052684 Cerium Inorganic materials 0.000 description 18
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 18
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 18
- 229910052709 silver Inorganic materials 0.000 description 18
- 239000011701 zinc Substances 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
- 239000010931 gold Substances 0.000 description 17
- 229910052742 iron Inorganic materials 0.000 description 17
- 150000003839 salts Chemical class 0.000 description 17
- 239000004332 silver Substances 0.000 description 17
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 16
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 16
- 229910052697 platinum Inorganic materials 0.000 description 16
- 229910052725 zinc Inorganic materials 0.000 description 16
- 229910052759 nickel Inorganic materials 0.000 description 15
- 229910052737 gold Inorganic materials 0.000 description 14
- 229910052726 zirconium Inorganic materials 0.000 description 14
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000004721 Polyphenylene oxide Substances 0.000 description 12
- 229910017052 cobalt Inorganic materials 0.000 description 12
- 239000010941 cobalt Substances 0.000 description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 12
- 229910052719 titanium Inorganic materials 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 11
- 229920000570 polyether Polymers 0.000 description 11
- 230000002829 reductive effect Effects 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 150000003609 titanium compounds Chemical class 0.000 description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 10
- 239000004698 Polyethylene Substances 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- 239000011737 fluorine Substances 0.000 description 10
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229920000573 polyethylene Polymers 0.000 description 10
- 229920002050 silicone resin Polymers 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002801 charged material Substances 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 229920001451 polypropylene glycol Polymers 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 238000005507 spraying Methods 0.000 description 9
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 8
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical class Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical class Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 8
- 150000002978 peroxides Chemical class 0.000 description 8
- 239000005871 repellent Substances 0.000 description 8
- 229910000077 silane Inorganic materials 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 6
- 229920000178 Acrylic resin Polymers 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 230000009471 action Effects 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 238000011109 contamination Methods 0.000 description 5
- 239000004205 dimethyl polysiloxane Substances 0.000 description 5
- 238000003618 dip coating Methods 0.000 description 5
- 239000000839 emulsion Substances 0.000 description 5
- 150000007529 inorganic bases Chemical class 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 150000003961 organosilicon compounds Chemical class 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000002940 repellent Effects 0.000 description 5
- 229910052711 selenium Inorganic materials 0.000 description 5
- 239000011669 selenium Substances 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 229920003002 synthetic resin Polymers 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 4
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- YOUIDGQAIILFBW-UHFFFAOYSA-J Tungsten(IV) chloride Inorganic materials Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical class Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 4
- 239000012736 aqueous medium Substances 0.000 description 4
- 229920001400 block copolymer Polymers 0.000 description 4
- 229910052792 caesium Inorganic materials 0.000 description 4
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 4
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical class [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- BWKCCRPHMILRGD-UHFFFAOYSA-N chloro hypochlorite;tungsten Chemical compound [W].ClOCl BWKCCRPHMILRGD-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 4
- 229960003280 cupric chloride Drugs 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- AAQNGTNRWPXMPB-UHFFFAOYSA-N dipotassium;dioxido(dioxo)tungsten Chemical compound [K+].[K+].[O-][W]([O-])(=O)=O AAQNGTNRWPXMPB-UHFFFAOYSA-N 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 4
- 150000004679 hydroxides Chemical class 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 239000011565 manganese chloride Substances 0.000 description 4
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- 229940099607 manganese chloride Drugs 0.000 description 4
- 239000002609 medium Substances 0.000 description 4
- 150000002736 metal compounds Chemical class 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- BGRYSGVIVVUJHH-UHFFFAOYSA-N prop-2-ynyl propanoate Chemical compound CCC(=O)OCC#C BGRYSGVIVVUJHH-UHFFFAOYSA-N 0.000 description 4
- LNBXMNQCXXEHFT-UHFFFAOYSA-N selenium tetrachloride Chemical class Cl[Se](Cl)(Cl)Cl LNBXMNQCXXEHFT-UHFFFAOYSA-N 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 125000005504 styryl group Chemical group 0.000 description 4
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- 238000002834 transmittance Methods 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 239000011592 zinc chloride Substances 0.000 description 4
- 235000005074 zinc chloride Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical class Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
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- 238000002845 discoloration Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- ZQCYYJCFXGFARW-UHFFFAOYSA-N hydroxy-phenyl-di(propan-2-yl)silane Chemical compound CC(C)[Si](O)(C(C)C)C1=CC=CC=C1 ZQCYYJCFXGFARW-UHFFFAOYSA-N 0.000 description 3
- IGUXCTSQIGAGSV-UHFFFAOYSA-K indium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[In+3] IGUXCTSQIGAGSV-UHFFFAOYSA-K 0.000 description 3
- 229910021331 inorganic silicon compound Inorganic materials 0.000 description 3
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical class Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 3
- 229910052746 lanthanum Inorganic materials 0.000 description 3
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- 239000000843 powder Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 239000008399 tap water Substances 0.000 description 3
- 235000020679 tap water Nutrition 0.000 description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 229910003771 Gold(I) chloride Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910015800 MoS Inorganic materials 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
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- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- HRXDYOKVWGTDPD-UHFFFAOYSA-N ctk4b9193 Chemical compound [NH4+].[O-]S(F)(=O)=O HRXDYOKVWGTDPD-UHFFFAOYSA-N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- JTWQAVAMWKUNAX-UHFFFAOYSA-N cyclohexyl-hydroxy-di(propan-2-yl)silane Chemical compound CC(C)[Si](O)(C(C)C)C1CCCCC1 JTWQAVAMWKUNAX-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- OBNNZFWATGFKET-UHFFFAOYSA-N cyclopentyl-hydroxy-di(propan-2-yl)silane Chemical compound CC(C)[Si](O)(C(C)C)C1CCCC1 OBNNZFWATGFKET-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- NWQOYXKMAOEMTM-UHFFFAOYSA-N decyl-hydroxy-di(propan-2-yl)silane Chemical compound CCCCCCCCCC[Si](O)(C(C)C)C(C)C NWQOYXKMAOEMTM-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- SHJSHDLTAIMSDH-UHFFFAOYSA-N di(butan-2-yl)-(3-chloropropyl)-hydroxysilane Chemical compound CCC(C)[Si](O)(C(C)CC)CCCCl SHJSHDLTAIMSDH-UHFFFAOYSA-N 0.000 description 1
- UZWNMFPFGOFVLL-UHFFFAOYSA-N di(butan-2-yl)-butyl-hydroxysilane Chemical compound CCCC[Si](O)(C(C)CC)C(C)CC UZWNMFPFGOFVLL-UHFFFAOYSA-N 0.000 description 1
- MGGGRPWMGVJRNR-UHFFFAOYSA-N di(butan-2-yl)-ethyl-hydroxysilane Chemical compound CCC(C)[Si](O)(CC)C(C)CC MGGGRPWMGVJRNR-UHFFFAOYSA-N 0.000 description 1
- GVZJSCXIKDFVKN-UHFFFAOYSA-N di(butan-2-yl)-hydroxy-methylsilane Chemical compound CCC(C)[Si](C)(O)C(C)CC GVZJSCXIKDFVKN-UHFFFAOYSA-N 0.000 description 1
- FUDLCCSIJJPSMY-UHFFFAOYSA-N di(butan-2-yl)-hydroxy-propan-2-ylsilane Chemical compound CCC(C)[Si](O)(C(C)C)C(C)CC FUDLCCSIJJPSMY-UHFFFAOYSA-N 0.000 description 1
- NHTYURCQJWYGFZ-UHFFFAOYSA-N di(butan-2-yl)-hydroxy-propylsilane Chemical compound CCC[Si](O)(C(C)CC)C(C)CC NHTYURCQJWYGFZ-UHFFFAOYSA-N 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- YDHFNPLALGFCFC-UHFFFAOYSA-L dichloroplatinum platinum Chemical compound Cl[Pt](Cl)[Pt] YDHFNPLALGFCFC-UHFFFAOYSA-L 0.000 description 1
- SHKLFLAFFCSSSV-UHFFFAOYSA-N dicyclopentyl-hydroxy-methylsilane Chemical compound C1CCCC1[Si](O)(C)C1CCCC1 SHKLFLAFFCSSSV-UHFFFAOYSA-N 0.000 description 1
- WVDJPBMEPFXCQM-UHFFFAOYSA-N dicyclopentyl-hydroxy-propan-2-ylsilane Chemical compound C1CCCC1[Si](O)(C(C)C)C1CCCC1 WVDJPBMEPFXCQM-UHFFFAOYSA-N 0.000 description 1
- VDHUZTCMTDJQMI-UHFFFAOYSA-N dicyclopentyl-hydroxy-propylsilane Chemical compound C1CCCC1[Si](O)(CCC)C1CCCC1 VDHUZTCMTDJQMI-UHFFFAOYSA-N 0.000 description 1
- NIEVDOKKAAPIJO-UHFFFAOYSA-N diethyl-hydroxy-phenylsilane Chemical compound CC[Si](O)(CC)C1=CC=CC=C1 NIEVDOKKAAPIJO-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- VTIIJXUACCWYHX-UHFFFAOYSA-L disodium;carboxylatooxy carbonate Chemical compound [Na+].[Na+].[O-]C(=O)OOC([O-])=O VTIIJXUACCWYHX-UHFFFAOYSA-L 0.000 description 1
- SMVSTYYEOSBGBB-UHFFFAOYSA-N dodecyl-hydroxy-di(propan-2-yl)silane Chemical compound CCCCCCCCCCCC[Si](O)(C(C)C)C(C)C SMVSTYYEOSBGBB-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- QPBWLEGNBSNMLG-UHFFFAOYSA-N ethyl-hydroxy-di(propan-2-yl)silane Chemical compound CC[Si](O)(C(C)C)C(C)C QPBWLEGNBSNMLG-UHFFFAOYSA-N 0.000 description 1
- UFAHFMYBTCNZPM-UHFFFAOYSA-N ethyl-hydroxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(CC)C1=CC=CC=C1 UFAHFMYBTCNZPM-UHFFFAOYSA-N 0.000 description 1
- MGLPUHWTRVIBKO-UHFFFAOYSA-N ethyl-hydroxy-phenyl-propan-2-ylsilane Chemical compound CC[Si](O)(C(C)C)C1=CC=CC=C1 MGLPUHWTRVIBKO-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005621 ferroelectricity Effects 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- FCQJEPASRCXVCB-UHFFFAOYSA-N flavianic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FCQJEPASRCXVCB-UHFFFAOYSA-N 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MIXCKKHYRAOUFJ-UHFFFAOYSA-N hexyl-hydroxy-di(propan-2-yl)silane Chemical compound CCCCCC[Si](O)(C(C)C)C(C)C MIXCKKHYRAOUFJ-UHFFFAOYSA-N 0.000 description 1
- VKNKSKIMMVEIPM-UHFFFAOYSA-N hexyl-hydroxy-dimethylsilane Chemical compound CCCCCC[Si](C)(C)O VKNKSKIMMVEIPM-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- KEXKNWXWRKHSGH-UHFFFAOYSA-N hydroxy-bis(2-methylpropyl)-propan-2-ylsilane Chemical compound CC(C)C[Si](O)(C(C)C)CC(C)C KEXKNWXWRKHSGH-UHFFFAOYSA-N 0.000 description 1
- GGAPGRXVJXIYRQ-UHFFFAOYSA-N hydroxy-di(propan-2-yl)-propylsilane Chemical compound CCC[Si](O)(C(C)C)C(C)C GGAPGRXVJXIYRQ-UHFFFAOYSA-N 0.000 description 1
- UUVTVNCRLIGKMN-UHFFFAOYSA-N hydroxy-dimethyl-(1-methylcyclohexyl)silane Chemical compound C[Si](O)(C)C1(C)CCCCC1 UUVTVNCRLIGKMN-UHFFFAOYSA-N 0.000 description 1
- WNHSAMFLQOPXQS-UHFFFAOYSA-N hydroxy-dimethyl-(2-methylbutan-2-yl)silane Chemical compound CCC(C)(C)[Si](C)(C)O WNHSAMFLQOPXQS-UHFFFAOYSA-N 0.000 description 1
- RTQZFPBKRLELIX-UHFFFAOYSA-N hydroxy-methyl-di(propan-2-yl)silane Chemical compound CC(C)[Si](C)(O)C(C)C RTQZFPBKRLELIX-UHFFFAOYSA-N 0.000 description 1
- MLPRTGXXQKWLDM-UHFFFAOYSA-N hydroxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(C)C1=CC=CC=C1 MLPRTGXXQKWLDM-UHFFFAOYSA-N 0.000 description 1
- CXCGDSFPDHPVSY-UHFFFAOYSA-N hydroxy-octadecyl-di(propan-2-yl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](O)(C(C)C)C(C)C CXCGDSFPDHPVSY-UHFFFAOYSA-N 0.000 description 1
- VXTVYATXCXGGPD-UHFFFAOYSA-N hydroxy-pentyl-di(propan-2-yl)silane Chemical compound CCCCC[Si](O)(C(C)C)C(C)C VXTVYATXCXGGPD-UHFFFAOYSA-N 0.000 description 1
- MQNNNLJCDJBERF-UHFFFAOYSA-N hydroxy-tri(propan-2-yl)silane Chemical compound CC(C)[Si](O)(C(C)C)C(C)C MQNNNLJCDJBERF-UHFFFAOYSA-N 0.000 description 1
- ISWVFYQSXFHUPD-UHFFFAOYSA-N hydroxy-tris(3-methylphenyl)silane Chemical compound CC1=CC=CC([Si](O)(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 ISWVFYQSXFHUPD-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910001410 inorganic ion Inorganic materials 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- GELKBWJHTRAYNV-UHFFFAOYSA-K lithium iron phosphate Chemical compound [Li+].[Fe+2].[O-]P([O-])([O-])=O GELKBWJHTRAYNV-UHFFFAOYSA-K 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- LAQFLZHBVPULPL-UHFFFAOYSA-N methyl(phenyl)silicon Chemical compound C[Si]C1=CC=CC=C1 LAQFLZHBVPULPL-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- BBJSDUUHGVDNKL-UHFFFAOYSA-J oxalate;titanium(4+) Chemical compound [Ti+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O BBJSDUUHGVDNKL-UHFFFAOYSA-J 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
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- 229920002401 polyacrylamide Polymers 0.000 description 1
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- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000323 polyazulene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 125000005625 siliconate group Chemical group 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940045872 sodium percarbonate Drugs 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- YPMOSINXXHVZIL-UHFFFAOYSA-N sulfanylideneantimony Chemical compound [Sb]=S YPMOSINXXHVZIL-UHFFFAOYSA-N 0.000 description 1
- QXKXDIKCIPXUPL-UHFFFAOYSA-N sulfanylidenemercury Chemical compound [Hg]=S QXKXDIKCIPXUPL-UHFFFAOYSA-N 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- ZLDUKZLZXXDDQX-UHFFFAOYSA-N tert-butyl-hydroxy-di(propan-2-yl)silane Chemical compound CC(C)[Si](O)(C(C)C)C(C)(C)C ZLDUKZLZXXDDQX-UHFFFAOYSA-N 0.000 description 1
- FGWRMMTYIZKYMA-UHFFFAOYSA-N tert-butyl-hydroxy-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)O FGWRMMTYIZKYMA-UHFFFAOYSA-N 0.000 description 1
- UNAYGNMKNYRIHL-UHFFFAOYSA-N tert-butyl-hydroxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O)(C(C)(C)C)C1=CC=CC=C1 UNAYGNMKNYRIHL-UHFFFAOYSA-N 0.000 description 1
- XPDICGYEJXYUDW-UHFFFAOYSA-N tetraarsenic tetrasulfide Chemical compound S1[As]2S[As]3[As]1S[As]2S3 XPDICGYEJXYUDW-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- JUWGUJSXVOBPHP-UHFFFAOYSA-B titanium(4+);tetraphosphate Chemical compound [Ti+4].[Ti+4].[Ti+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O JUWGUJSXVOBPHP-UHFFFAOYSA-B 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 208000029257 vision disease Diseases 0.000 description 1
- 230000004393 visual impairment Effects 0.000 description 1
- XOSXWYQMOYSSKB-LDKJGXKFSA-L water blue Chemical compound CC1=CC(/C(\C(C=C2)=CC=C2NC(C=C2)=CC=C2S([O-])(=O)=O)=C(\C=C2)/C=C/C\2=N\C(C=C2)=CC=C2S([O-])(=O)=O)=CC(S(O)(=O)=O)=C1N.[Na+].[Na+] XOSXWYQMOYSSKB-LDKJGXKFSA-L 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Images
Landscapes
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
に関する。
また、塩基としては無機塩基が好ましく、アンモニアがより好ましい。
(1)陽イオン;
(2)正電荷を有する導電体又は誘電体;並びに
(3)正電荷を有する導電体、及び、誘電体又は半導体、の複合体
からなる群から選択される1種以上であることが好ましい。
(4)陰イオン;
(5)負電荷を有する導電体又は誘電体;
(6)負電荷を有する導電体、及び、誘電体又は半導体、の複合体;並びに
(7)光触媒機能を有する物質
からなる群から選択される1種以上であること画好ましい。
(1)陽イオン;
(2)正電荷を有する導電体又は誘電体;並びに
(3)正電荷を有する導電体、及び、誘電体又は半導体、の複合体
からなる群から選択される1種又は2種以上であることが好ましい。
(4)陰イオン;
(5)負電荷を有する導電体又は誘電体;
(6)負電荷を有する導電体、及び、誘電体又は半導体、の複合体、並びに
(7)光触媒機能を有する物質
からなる群から選択される1種又は2種であることが好ましい。
まず、四塩化チタン等の四価チタンの化合物とアンモニア等の塩基とを反応させて、水酸化チタンを形成する。次に、この水酸化チタンを酸化剤でペルオキソ化し、超微細粒子のアモルファス型過酸化チタンを形成する。この反応は好ましくは水性媒体中で行なわれる。さらに、任意に加熱処理することによりアナターゼ型過酸化チタンに転移させることも可能である。上記の各工程のいずれかにおいて、正電荷又は負電荷を有する金属元素として、例えば、セリウム、金、銀、白金、錫、銅、ジルコニウム、錫、マンガン、ニッケル、コバルト、鉄、亜鉛又はそれらの化合物の少なくともいずれか1つが混合される。
四塩化チタン等の四価チタンの化合物を酸化剤でペルオキソ化し、これとアンモニア等の塩基とを反応させて超微細粒子のアモルファス型過酸化チタンを形成する。この反応は好ましくは水性媒体中で行なわれる。さらに、任意に加熱処埋することによりアナターゼ型過酸化チタンに転移させることも可能である。上記の各工程のいずれかにおいて、正電荷又は負電荷を有する金属元素として、例えば、セリウム、金、銀、白金、銅、ジルコニウム、錫、マンガン、ニッケル、コバルト、鉄、亜鉛又はそれらの化合物の少なくともいずれか1つが混合される。
四塩化チタン等の四価チタンの化合物を、酸化剤及び塩基と同時に反応させて、水酸化チタン形成とそのペルオキソ化とを同時に行い、超微細粒子のアモルファス型過酸化チタンを形成する。この反応は好ましくは水性媒体中で行なわれる。さらに、任意に加熱処埋することによりアナターゼ型過酸化チタンに転移させることも可能である。上記の各工程のいずれかにおいて、正電荷又は負電荷を有する金属元素として、例えば、セリウム、金、銀、白金、銅、ジルコニウム、錫、マンガン、ニッケル、コバルト、鉄、亜鉛又はそれらの化合物の少なくともいずれか1つが混合される。
チタンアルコキシドに、水、アルコール等の溶媒、酸又は塩基触媒を混合撹拌し、チタンアルコキシドを加水分解させ、超微粒子のチタン酸化物のゾル溶液を生成する。この加水分解の前後のいずれかに、正電荷又は負電荷を有する金属元素として、例えば、セリウム、金、銀、白金、銅、ジルコニウム、錫、マンガン、ニッケル、コバルト、鉄、亜鉛又はそれらの化合物の少なくともいずれか1つが混合される。なお、このようにして得られるチタン酸化物は、ペルオキソ基を有するアモルファス型である。
金属ドープチタン酸化物の製造に使用する四価チタンの化合物としては、塩基と反応させた際に、オルトチタン酸(H4TiO4)とも呼称される水酸化チタンを形成できるものであれば各種のチタン化合物が使用でき、例えば四塩化チタン、硫酸チタン、硝酸チタン、燐酸チタン等のチタンの水溶性無機酸塩がある。それ以外にも蓚酸チタン等のチタンの水溶性有機酸塩も使用できる。なお、これらの各種チタン化合物の中では、水溶性に特に優れ、かつ金属ドープチタン酸化物の分散液中にチタン以外の成分が残留しない点で、四塩化チタンが好ましい。
上記四価チタンの化合物と反応させる塩基は、四価チタンの化合物と反応して水酸化チタンを形成できるものであれば、各種のものが使用可能であり、それにはアンモニア、苛性ソーダ、炭酸ソーダ、苛性カリ等が例示できるが、アンモニアが好ましい。
セリウム、金、銀、白金、銅、ジルコニウム、錫、マンガン、ニッケル、コバルト、鉄又は亜鉛の化合物としては、それぞれ以下のものが例示できる。
Ce化合物:CeO2、CeCl3、Ce2(SO4)3、Ce(NO3)3及びこれらの水和物
Au化合物:AuCl、AuCl3、AuOH、Au(OH)2、Au2O、Au2O3
Ag化合物:AgNO3、AgF、AgClO3、AgOH、Ag(NH3)OH、Ag2SO4
Pt化合物:PtCl2、PtO、Pt(NH3)Cl2、PtO2、PtCl4、〔Pt(OH)6〕2−
Ni化合物:Ni(OH)2、NiCl2
Co化合物:Co(OH)NO3、Co(OH)2、CoSO4、CoCl2
Cu化合物:Cu(OH)2、Cu(NO3)2、CuSO4、CuCl2、Cu(CH3COO)2
Zr化合物:Zr(OH)3、ZrCl2、ZrCl4
Sn化合物:SnCl2、SnCl4、[Sn(OH)]+
Mn化合物:MnNO3、MnSO4、MnCl2
Fe化合物:Fe(OH)2、Fe(OH)3、FeCl3
Zn化合物:Zn(NO3)2、ZnSO4、ZnCl2
メチルシリケート51(三菱化学(株)製)30g、メタノール変性アルコール(エタノール88重量%、メタノール5重量%、水7重量%の混合物)60g、純水5.7g、及び、アセチルアセトンアルミニウム0.3gを混合し60℃に加温しながら24時間撹拌することによって、固形分濃度16重量%のポリシリケート液96gを作製した。
作製例1で得られたポリシリケート液5.3gを純水94.7gで希釈して固形分濃度0.85重量%のポリシリケート液100gを製造した。
純水1000gにCeCl3・7H2O(塩化第一セリウム)1.298gを完全に溶かした溶液に、更に50%四塩化チタン溶液((株)大阪チタニウムテクノロジーズ製)20gを添加し純水を加え2000gにメスアップした溶液を準備する。この液に25%アンモニア水(高杉製薬(株)製)を10倍希釈したアンモニア水を滴下してpH7.0に調整して水酸化セリウムと水酸化チタンの混合物を沈殿させた。この沈殿物を純水で上澄み液の導電率が0.8mS/m以下になるまで洗浄した。導電率が0.679mS/mになったところで洗浄を終了すると濃度0.79重量%の水酸化物分散液650gが得られた。次に、この液を室温下で35重量%過酸化水素水(タイキ薬品工業(株)製)を112g添加し16時間撹拌すると黄褐色の透明なセリウムがドープされた濃度0.82重量%のアモルファス型過酸化チタン溶液760gが得られた。
固形分濃度0.85重量%の市販のアナターゼ型過酸化チタン分散液(STi−Z18−1600:サスティナブル・テクノロジー(株)製)と市販のカリウムドープポリシリケート(MS−AAAL1K10:サスティナブル・テクノロジー(株)製)を純水で固形分濃度0.85重量%に調整した液を1:1の重量比で混合したものに、市販の変性シリコーン(SH3746:東レ・ダウコーニング(株)製)を濃度0.1重量%となる量添加して正電荷付与液とした。
作製例2で得られたポリシリケート液と作製例3で得られたセリウムドープアモルファス型過酸化チタン溶液を1:1の重量比で混合したものに、市販の変性シリコーン(SH3746:東レ・ダウコーニング(株)製)を濃度0.1重量%となる量添加して負電荷付与液とした。
市販のシリカベース正電荷付与液(MS−AAAL1K10:サスティナブル・テクノロジー(株)製)を純水で固形分濃度0.85重量%に調整した液と作製例3で得られたセリウムドープアモルファス型過酸化チタン溶液を1:1の重量比で混合したものに、市販の変性シリコーン(SH3746:東レ・ダウコーニング(株)製)を濃度0.1重量%となる量添加して両性電荷付与液とした。
市販の変性シリコーン(SH3746:東レ・ダウコーニング(株))100gをメタノール変性アルコール81gで希釈して固形分濃度50重量%の変性シリコーン液181gを製造した。
市販の35重量%工業用過酸化水素水(タイキ薬品工業(株)製)を過酸化水素水として使用した。
市販の工業用25wt%アンモニア水(高杉製薬(株)製)をイオン交換水で10倍希釈して濃度2.5wt%のアンモニア水を得た。
建材用青フロートガラス(厚さ3mm)上に、スポンジスキージー塗布方法で、正電荷付与液を12g/m2の割合で塗布し、常温乾燥後、500℃で15分間加熱して、正電荷層(約100nm厚)を形成した。その後、常温で、作製例1で得られたポリシリケート液を、2〜3g/m2の割合で塗布し、流水でSiO2分を除去して親水基を形成した後に、乾燥を行った。その後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、その後、アンモニア水を同量塗布し、20分間常温乾燥して評価基板1とした。
作製例1で得られたポリシリケート液を作製例4で得られた変性シリコーン液とした以外は、評価基板1の上記製造工程を繰り返して、評価基板2を得た。
過酸化水素水の塗布及びその後のアンモニア塗布並びに常温乾燥を行わない以外は、評価基板1の上記製造工程を繰り返して、比較基板1を得た。
作製例1で得られたポリシリケート液の塗布並びにその後の流水処理及び乾燥を行わない以外は、評価基板1の上記製造工程を繰り返して、比較基板2を得た。
過酸化水素水の塗布及びその後のアンモニア塗布並びに常温乾燥を行わない以外は、評価基板2の上記製造工程を繰り返して、比較基板3を得た。
建材用青フロートガラス(厚さ3mm)上に、スポンジスキージー塗布方法で、両性電荷付与液を12g/m2の割合で塗布し、常温乾燥後、500℃で15分間加熱して、正及び負電荷層(約100nm厚)を形成した。その後、常温で、作製例1で得られたポリシリケート液を、2〜3g/m2の割合で塗布し、流水でSiO2分を除去して親水基を形成した後に、乾燥を行った。その後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、その後、アンモニア水を同量塗布し、20分間常温乾燥して評価基板3とした。
作製例1で得られたポリシリケート液を作製例4で得られた変性シリコーン液とした以外は、評価基板3の上記製造工程を繰り返して、評価基板4を得た。
過酸化水素水の塗布及びその後アンモニア塗布並びに常温乾燥を行わない以外は、評価基板3の上記製造工程を繰り返して、比較基板4を得た。
作製例1で得られたポリシリケート液の塗布並びにその後の流水処理及び乾燥を行わない以外は、評価基板3の上記製造工程を繰り返して、比較基板5を得た。
過酸化水素水の塗布及びその後のアンモニア塗布並びに常温乾燥を行わない以外は、評価基板4の上記製造工程を繰り返して、比較基板6を得た。
建材用青フロートガラス(厚さ3mm)上に、スポンジスキージー塗布方法で、負電荷付与液を12g/m2の割合で塗布し、常温乾燥後、500℃で15分間加熱して、負電荷層(約100nm厚)を形成した。その後、常温で、作製例1で得られたポリシリケート液を、2〜3g/m2の割合で塗布し、流水でSiO2分を除去して親水基を形成した後に、乾燥を行った。その後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、その後、アンモニア水を同量塗布し、20分間常温乾燥して評価基板5とした。
作製例1で得られたポリシリケート液を作製例4で得られた変性シリコーン液とした以外は、評価基板5の上記製造工程を繰り返して、評価基板6を得た。
過酸化水素水の塗布及びその後アンモニア塗布並びに常温乾燥を行わない以外は、評価基板5の上記製造工程を繰り返して、比較基板7を得た。
作製例1で得られたポリシリケート液の塗布並びにその後の流水処理及び乾燥を行わない以外は、評価基板5の上記製造工程を繰り返して、比較基板8を得た。
過酸化水素水の塗布及びその後アンモニア塗布並びに常温乾燥を行わない以外は、評価基板6の上記製造工程を繰り返して、比較基板9を得た。
ソーダライムガラス板(厚さ3mm)の表面を研磨、洗浄して表面の付着物を除去・乾燥後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、表面乾燥後アンモニアを同量塗布して、更に、20分間常温乾燥して評価基板7とした。
ソーダライムガラス板(厚さ3mm)の表面を洗浄して表面の付着物を除去・乾燥後、センエンジニアリング(株)製PL16−11001Dを使用して184.9nm及び253.7nmの紫外線を照射後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、表面乾燥後アンモニアを同量塗布して、更に、20分間常温乾燥して評価基板8とした。
過酸化水素水の塗布及びその後の常温乾燥を行わない以外は、評価基板7の上記製造工程を繰り返して、比較基板10を得た。
過酸化水素水の塗布及びその後の常温乾燥を行わない以外は、評価基板8の上記製造工程を繰り返して、比較基板11を得た。
ポリカーボネート板(厚さ2mm)の表面を洗浄して表面の付着物を除去・乾燥後、センエンジニアリング(株)製PL16−11001Dを使用して184.9nm及び253.7nmの紫外線を照射後、スプレーで過酸化水素水を2〜3g/m2の割合で塗布し、表面乾燥後アンモニアを同量塗布して、更に、20分間常温乾燥して評価基板9とした。
過酸化水素水の塗布及びその後の常温乾燥を行わない以外は、評価基板9の上記製造工程を繰り返して、比較基板12を得た。
評価基板1〜9及び比較基板1〜12について、イオン交換水を表面に滴下して、手動分度角度計を用いて目視で初期水接触角を測定した。次に、評価基板1〜9及び比較基板1〜12を水道水に浸漬後、暗室に24時間放置する作業を5回繰り返し、更に、その度に、ウェットウェスでの手動磨きを4回繰り返した。その後、イオン交換水を表面に滴下して、同様に、手動分度角度計を用いて目視で水接触角を測定した。結果を表1〜5に示す。
評価基板1〜9及び比較基板1〜12について、光度計V−550DS(日本分光(株))を用いて、可視光(380nm〜780nm)の平均透過率を測定した。次に、評価基板1〜9及び比較基板1〜12を水道水に浸漬後、暗室に24時間放置する作業を5回繰り返し、更に、その度に、ウェットウェスでの手動磨きを4回繰り返した。その後、同様に、光度計V−550DS(日本分光(株))を用いて、可視光(380nm〜780nm)の平均透過率を測定した。測定結果から、平均透過率の変化率を算出した。結果を表1〜5に示す
Claims (6)
- 正電荷物質及び/又は負電荷物質が配置された基体表面に、シラノール、ポリシリケート、水酸基変性シリコーン及び/又はポリエーテル変性シリコーンを塗布して親水性表面を形成し、当該親水性表面に過酸化水素水を塗布し、さらにアンモニア水を塗布する、親水性表面を有する基体の当該表面の親水性長期維持方法。
- 前記正電荷物質が
(1)陽イオン;
(2)正電荷を有する導電体又は誘電体;並びに
(3)正電荷を有する導電体、及び、誘電体又は半導体、の複合体
からなる群から選択される1種以上である、請求項1に記載の方法。 - 前記負電荷物質が
(4)陰イオン;
(5)負電荷を有する導電体又は誘電体;
(6)負電荷を有する導電体、及び、誘電体又は半導体、の複合体;並びに
(7)光触媒機能を有する物質
からなる群から選択される1種以上である、請求項1に記載の方法。 - 正電荷物質及び/又は負電荷物質が配置された基体表面に、シラノール、ポリシリケート、水酸基変性シリコーン及び/又はポリエーテル変性シリコーンを塗布して親水性表面を形成し、当該親水性表面に過酸化水素水を塗布し、さらにアンモニア水を塗布する、長期防曇性又は長期防汚性を備える基体の製造方法。
- 正電荷物質及び/又は負電荷物質が配置された基体表面に、シラノール、ポリシリケート、水酸基変性シリコーン及び/又はポリエーテル変性シリコーンを塗布して親水性表面が形成され、当該親水性表面に過酸化水素水が塗布され、さらにアンモニア水が塗布された、親水性表面を有する長期防曇性又は長期防汚性を備える基体。
- 基体上の、正電荷物質及び/又は負電荷物質含有層、並びに、シラノール、ポリシリケート、水酸基変性シリコーン及び/又はポリエーテル変性シリコーンを塗布して親水性表面を形成し、当該親水性表面に過酸化水素が塗布され、さらにアンモニア水が塗布された親水性物質層からなる、長期防曇性又は長期防汚性を有する積層構造。
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