JP6085088B2 - 垂直磁気記録媒体の製造方法 - Google Patents
垂直磁気記録媒体の製造方法 Download PDFInfo
- Publication number
- JP6085088B2 JP6085088B2 JP2012001897A JP2012001897A JP6085088B2 JP 6085088 B2 JP6085088 B2 JP 6085088B2 JP 2012001897 A JP2012001897 A JP 2012001897A JP 2012001897 A JP2012001897 A JP 2012001897A JP 6085088 B2 JP6085088 B2 JP 6085088B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- soft
- substrate
- bias voltage
- soft underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000758 substrate Substances 0.000 claims description 41
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000010410 layer Substances 0.000 description 145
- 239000011241 protective layer Substances 0.000 description 8
- 239000013078 crystal Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/676—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
以下に説明される非制限的な実施例において、化学気相成長法によって形成された保護層119を除き、垂直記録媒体103の全ての層が、DCマグネトロンスパッタリング(INTERVAC、250B)によって製造された。この製造が、10−5またはそれ未満の内部真空レベルで維持された真空チャンバ内で実施された。
110 下層
111 中間層
112 記録層
113 第一軟質下層
113n 第一軟質下層の一部
114 第二軟質下層
114n 第二軟質下層の一部
115 (AFC)Ru層
116 方位制御層
116−1 第一副層
116−2 第二副層
119 保護層
120 潤滑剤層
Claims (9)
- 垂直磁気記録媒体の製造方法であって、
前記垂直磁気記録媒体が、基板、該基板上の下層、該下層上の中間層及び該中間層上の記録層を備え、
前記下層が、第一軟質下層、該第一軟質下層上の反強磁性的に結合されたRu層、該反強磁性的に結合されたRu層上の第二軟質下層、及び該第二軟質下層上の方位制御層を備え、
前記下層を形成する間、前記基板に負バイアス電圧を印加するステップを含み、
前記第一軟質下層及び前記第二軟質下層を形成する間、負バイアス電圧が、前記基板に印加され、
前記反強磁性的に結合されたRu層と隣接する前記第一軟質下層及び前記第二軟質下層の一部を形成する間、負バイアス電圧を除去するステップをさらに含むことを特徴とする方法。 - 前記方位制御層を形成する間、負バイアス電圧が、前記基板に印加されることを特徴とする請求項1に記載の方法。
- 前記反強磁性的に結合されたRu層と隣接する前記第一軟質下層及び前記第二軟質下層の前記一部が、前記第一軟質下層の厚さの最大10%の厚さを有することを特徴とする請求項2に記載の方法。
- 前記方位制御層が、第一副層及び第二副層を備え、
前記第一副層及び前記第二副層の少なくとも1つを形成する間、負バイアス電圧が、前記基板に印加されることを特徴とする請求項1から3のいずれか一項に記載の方法。 - 印加される負バイアス電圧が、最大500Vであることを特徴とする請求項1から4のいずれか一項に記載の方法。
- 基板、該基板上の下層、該下層上の中間層及び該中間層上の記録層を備えた垂直磁気記録媒体であって、
前記下層が、第一軟質下層、該第一軟質下層上の反強磁性的に結合されたRu層、該反強磁性的に結合されたRu層上の第二軟質下層、及び該第二軟質下層上の方位制御層を備えており、
前記反強磁性的に結合されたRu層と隣接する前記第一軟質下層及び前記第二軟質下層の一部が、前記第一軟質下層の厚さの最大10%の厚さを有している、垂直磁気記録媒体。 - 前記方位制御層が、面心立方構造を有することを特徴とする請求項6に記載の垂直磁気記録媒体。
- 前記方位制御層が、第一副層及び第二副層を備えることを特徴とする請求項6または7に記載の垂直磁気記録媒体。
- 前記第一副層が、非晶構造を有し、
前記第二副層が、面心立方構造を有することを特徴とする請求項8に記載の垂直磁気記録媒体。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG201100141-9 | 2011-01-07 | ||
SG2011001419A SG182861A1 (en) | 2011-01-07 | 2011-01-07 | Method of fabricating a perpendicular magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012146385A JP2012146385A (ja) | 2012-08-02 |
JP6085088B2 true JP6085088B2 (ja) | 2017-02-22 |
Family
ID=46789809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012001897A Active JP6085088B2 (ja) | 2011-01-07 | 2012-01-10 | 垂直磁気記録媒体の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9053732B2 (ja) |
JP (1) | JP6085088B2 (ja) |
SG (1) | SG182861A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8976492B1 (en) | 2013-10-29 | 2015-03-10 | HGST Netherlands B.V. | Magnetic head having two domain control layers for stabilizing magnetization of the hard bias layer |
US9672856B1 (en) | 2015-11-19 | 2017-06-06 | HGST Netherlands B.V. | Perpendicular magnetic recording media with lateral exchange control layer |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62212934A (ja) | 1986-03-12 | 1987-09-18 | Mitsubishi Electric Corp | 垂直磁気記録媒体の製造方法 |
JPH05258272A (ja) | 1991-03-06 | 1993-10-08 | Nippon Digital Equip Kk | 垂直磁気記録媒体及びその製造方法 |
JP2002063718A (ja) * | 2000-08-16 | 2002-02-28 | Toshiba Corp | 垂直磁気記録媒体の製造方法、垂直磁気記録媒体、及び垂直磁気記録装置 |
US6818330B2 (en) * | 2000-08-25 | 2004-11-16 | Seagate Technology Llc | Perpendicular recording medium with antiferromagnetic exchange coupling in soft magnetic underlayers |
WO2003009313A2 (en) * | 2001-07-17 | 2003-01-30 | Seagate Technology Llc | Method for making uniaxial, high moment fe-co alloys |
JP2003151128A (ja) * | 2001-11-07 | 2003-05-23 | Mitsubishi Chemicals Corp | 軟磁性層を形成した基板の製造方法、軟磁性層を形成した基板、磁気記録媒体及び磁気記録装置 |
JP2009116964A (ja) * | 2007-11-07 | 2009-05-28 | Showa Denko Kk | 垂直磁気記録媒体の製造方法及び磁気記録再生装置 |
US8993073B2 (en) * | 2008-07-14 | 2015-03-31 | Seagate Technology Llc | Applying bias voltage during formation of granular recording media |
JP5524464B2 (ja) * | 2008-10-06 | 2014-06-18 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気記録媒体 |
JP5274998B2 (ja) * | 2008-12-01 | 2013-08-28 | ショウワデンコウ エイチディ シンガポール ピーティイー リミテッド | 磁気記録媒体及びその製造方法、並びに磁気記録再生装置 |
US8431258B2 (en) | 2009-03-30 | 2013-04-30 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and method of manufacturing the same |
-
2011
- 2011-01-07 SG SG2011001419A patent/SG182861A1/en unknown
-
2012
- 2012-01-06 US US13/344,867 patent/US9053732B2/en active Active
- 2012-01-10 JP JP2012001897A patent/JP6085088B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
SG182861A1 (en) | 2012-08-30 |
US20120231298A1 (en) | 2012-09-13 |
JP2012146385A (ja) | 2012-08-02 |
US9053732B2 (en) | 2015-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5401069B2 (ja) | 垂直磁気記録媒体 | |
US7993765B2 (en) | Perpendicular magnetic recording medium | |
US8057926B2 (en) | Perpendicular magnetic recording medium | |
US9064518B2 (en) | Perpendicular magnetic recording medium | |
US8795857B2 (en) | Perpendicular magnetic recording medium and manufacturing method of the same | |
JP4380577B2 (ja) | 垂直磁気記録媒体 | |
US20090311557A1 (en) | Perpendicular magnetic recording disk and method of manufacturing the same | |
WO2009119709A1 (ja) | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 | |
JP2008176858A (ja) | 垂直磁気記録媒体、及びそれを用いたハードディスクドライブ | |
JP2011248969A (ja) | 垂直磁気ディスク | |
JPWO2007114402A1 (ja) | 垂直磁気記録ディスク及びその製造方法 | |
WO2007074585A1 (en) | Magnetic recording medium and magnetic recording and reproducing device using the magnetic recording medium | |
JP4922995B2 (ja) | 垂直磁気記録媒体及び磁気記憶装置 | |
JP2009289360A (ja) | 垂直磁気記録媒体及び磁気記憶装置 | |
JP4534711B2 (ja) | 垂直磁気記録媒体 | |
JP5569213B2 (ja) | 垂直磁気記録媒体 | |
KR20090044999A (ko) | 자기 기록 매체, 그 제조 방법 및 자기 기억 장치 | |
JP5325945B2 (ja) | 垂直磁気記録媒体及び磁気記録再生装置 | |
JP6085088B2 (ja) | 垂直磁気記録媒体の製造方法 | |
JP5126674B2 (ja) | 垂直磁気記録媒体 | |
US9040179B2 (en) | Magnetic recording medium and magnetic recording and reproducing apparatus | |
JP6416041B2 (ja) | 垂直磁気記録媒体及び磁気記録再生装置 | |
JP3588039B2 (ja) | 磁気記録媒体および磁気記録再生装置 | |
JP6451011B2 (ja) | 垂直磁気記録媒体及び磁気記録再生装置 | |
JP2004273046A (ja) | 垂直磁気記録媒体用ディスク基板及び垂直磁気記録ディスク |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150108 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150624 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150629 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150928 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160404 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160704 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170104 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170127 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6085088 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |