JP6062640B2 - 光伝導素子 - Google Patents
光伝導素子 Download PDFInfo
- Publication number
- JP6062640B2 JP6062640B2 JP2012047443A JP2012047443A JP6062640B2 JP 6062640 B2 JP6062640 B2 JP 6062640B2 JP 2012047443 A JP2012047443 A JP 2012047443A JP 2012047443 A JP2012047443 A JP 2012047443A JP 6062640 B2 JP6062640 B2 JP 6062640B2
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- JP
- Japan
- Prior art keywords
- semiconductor
- layer
- semiconductor layer
- substrate
- photoconductive element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
- G01N21/3586—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation by Terahertz time domain spectroscopy [THz-TDS]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/10—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Light Receiving Elements (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012047443A JP6062640B2 (ja) | 2011-03-18 | 2012-03-03 | 光伝導素子 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011061439 | 2011-03-18 | ||
| JP2011061439 | 2011-03-18 | ||
| JP2012047443A JP6062640B2 (ja) | 2011-03-18 | 2012-03-03 | 光伝導素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012212868A JP2012212868A (ja) | 2012-11-01 |
| JP2012212868A5 JP2012212868A5 (enExample) | 2015-04-09 |
| JP6062640B2 true JP6062640B2 (ja) | 2017-01-18 |
Family
ID=46827727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012047443A Active JP6062640B2 (ja) | 2011-03-18 | 2012-03-03 | 光伝導素子 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8835853B2 (enExample) |
| JP (1) | JP6062640B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230420606A1 (en) * | 2022-06-28 | 2023-12-28 | National Tsing Hua University | Method for manufacturing terahertz device |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103048061B (zh) * | 2012-10-29 | 2014-12-17 | 大连理工大学 | 反射太赫兹谱技术检测偏滤器石墨瓦瞬态温度的装置 |
| US20140151581A1 (en) * | 2012-12-03 | 2014-06-05 | Yael Nemirovsky | Terahertz source |
| JP6332980B2 (ja) * | 2013-03-08 | 2018-05-30 | キヤノン株式会社 | 光伝導素子、光伝導素子の製造方法、及び、テラヘルツ時間領域分光装置 |
| JP2014175598A (ja) * | 2013-03-12 | 2014-09-22 | Asahi Kasei Corp | 化合物半導体積層体及び半導体装置 |
| JP2015148541A (ja) * | 2014-02-07 | 2015-08-20 | セイコーエプソン株式会社 | 光伝導アンテナ、カメラ、イメージング装置、および計測装置 |
| JP6306363B2 (ja) * | 2014-02-14 | 2018-04-04 | パイオニア株式会社 | 時間領域分光装置 |
| RU2610222C1 (ru) * | 2015-12-02 | 2017-02-08 | Федеральное государственное бюджетное учреждение науки Институт сверхвысокочастотной полупроводниковой электроники Российской академии наук (ИСВЧПЭ РАН) | Материал для фотопроводящих антенн |
| JP6755590B2 (ja) * | 2015-12-15 | 2020-09-16 | 国立大学法人東京工業大学 | テラヘルツ検出センサ及びテラヘルツ画像測定装置 |
| JP6705672B2 (ja) * | 2016-03-17 | 2020-06-03 | パイオニア株式会社 | 電磁波計測装置 |
| RU2624612C1 (ru) * | 2016-10-07 | 2017-07-04 | Федеральное государственное бюджетное учреждение науки Институт сверхвысокочастотной полупроводниковой электроники Российской академии наук (ИСВЧПЭ РАН) | Полупроводниковая структура для фотопроводящих антенн |
| RU2671286C1 (ru) * | 2017-09-22 | 2018-10-30 | Федеральное государственное бюджетное учреждение науки Институт сверхвысокочастотной полупроводниковой электроники Российской академии наук (ИСВЧПЭ РАН) | Полупроводниковая структура для фотопроводящих антенн |
| JP7062481B2 (ja) * | 2018-03-23 | 2022-05-06 | パイオニア株式会社 | 電磁波計測装置 |
| CN112204756B (zh) * | 2018-05-29 | 2025-02-28 | Iqe公司 | 在缓冲器上方形成的光电子器件 |
| EP3907764A1 (de) * | 2020-05-07 | 2021-11-10 | FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. | Anordnung für eine antenne zum erzeugen oder empfangen von terahertz-strahlung, antenne, terahertzsystem sowie verfahren zur herstellung einer anordnung für eine antenne |
| US11431236B2 (en) * | 2020-08-18 | 2022-08-30 | Meta Platforms Technologies, Llc | Dynamically addressable high voltage optical transformer with integrated optically triggered switches |
| JP2020198448A (ja) * | 2020-08-26 | 2020-12-10 | パイオニア株式会社 | 光伝導素子及び計測装置 |
| KR102458236B1 (ko) * | 2021-08-25 | 2022-10-25 | 한국전자통신연구원 | 테라헤르츠 소자의 제조 방법 |
| KR20230081463A (ko) * | 2021-11-30 | 2023-06-07 | 삼성전자주식회사 | 광 소자용 기판 및 그 제조방법과 이 기판을 포함하는 광 소자 및 그 제조방법과 광 소자를 포함하는 전자장치 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US4551394A (en) * | 1984-11-26 | 1985-11-05 | Honeywell Inc. | Integrated three-dimensional localized epitaxial growth of Si with localized overgrowth of GaAs |
| CA1274900A (en) * | 1987-01-05 | 1990-10-02 | Nec Corporation | Field-effect transistor and the same associated with an optical semiconductor device |
| US4963949A (en) * | 1988-09-30 | 1990-10-16 | The United States Of America As Represented Of The United States Department Of Energy | Substrate structures for InP-based devices |
| JPH02263427A (ja) * | 1989-04-03 | 1990-10-26 | Sumitomo Metal Ind Ltd | 化合物半導体基板およびその製造方法 |
| JP3194503B2 (ja) | 1992-06-04 | 2001-07-30 | キヤノン株式会社 | 化合物半導体装置及びその製造方法 |
| JP3854693B2 (ja) | 1996-09-30 | 2006-12-06 | キヤノン株式会社 | 半導体レーザの製造方法 |
| JPH11168262A (ja) | 1997-09-30 | 1999-06-22 | Canon Inc | 面型光デバイス、その製造方法、および表示装置 |
| JPH11168263A (ja) | 1997-09-30 | 1999-06-22 | Canon Inc | 光デバイス装置及びその製造方法 |
| JP3728147B2 (ja) | 1999-07-16 | 2005-12-21 | キヤノン株式会社 | 光電気混載配線基板 |
| JP3990846B2 (ja) | 1999-08-27 | 2007-10-17 | キヤノン株式会社 | 面型光素子、その製造方法、およびこれを用いた装置 |
| WO2003047036A1 (en) * | 2001-11-29 | 2003-06-05 | Picometrix, Inc. | Amplified photoconductive gate |
| GB2393037B (en) | 2002-09-11 | 2007-05-23 | Tera View Ltd | Method of enhancing the photoconductive properties of a semiconductor and method of producing a seminconductor with enhanced photoconductive properties |
| JP4794878B2 (ja) * | 2004-03-26 | 2011-10-19 | キヤノン株式会社 | 光伝導素子 |
| US7615787B2 (en) | 2004-03-26 | 2009-11-10 | Canon Kabushiki Kaisha | Photo-semiconductor device and method of manufacturing the same |
| JP3913253B2 (ja) | 2004-07-30 | 2007-05-09 | キヤノン株式会社 | 光半導体装置およびその製造方法 |
| JP2006086227A (ja) | 2004-09-14 | 2006-03-30 | Osaka Univ | 光スイッチ |
| JP3922463B2 (ja) * | 2004-09-30 | 2007-05-30 | 独立行政法人科学技術振興機構 | 赤外光放射装置および赤外光検出装置ならびに時系列変換パルス分光計測装置 |
| JP5196779B2 (ja) * | 2006-03-17 | 2013-05-15 | キヤノン株式会社 | 光伝導素子及びセンサ装置 |
| JP4857027B2 (ja) | 2006-05-31 | 2012-01-18 | キヤノン株式会社 | レーザ素子 |
| JP5127430B2 (ja) | 2007-12-25 | 2013-01-23 | キヤノン株式会社 | レーザ素子 |
-
2012
- 2012-03-03 JP JP2012047443A patent/JP6062640B2/ja active Active
- 2012-03-09 US US13/416,447 patent/US8835853B2/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230420606A1 (en) * | 2022-06-28 | 2023-12-28 | National Tsing Hua University | Method for manufacturing terahertz device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120235040A1 (en) | 2012-09-20 |
| US8835853B2 (en) | 2014-09-16 |
| JP2012212868A (ja) | 2012-11-01 |
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