JP6025211B2 - Ｘ線トポグラフィ装置 - Google Patents

Ｘ線トポグラフィ装置 Download PDF

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Publication number
JP6025211B2
JP6025211B2 JP2013246533A JP2013246533A JP6025211B2 JP 6025211 B2 JP6025211 B2 JP 6025211B2 JP 2013246533 A JP2013246533 A JP 2013246533A JP 2013246533 A JP2013246533 A JP 2013246533A JP 6025211 B2 JP6025211 B2 JP 6025211B2
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Prior art keywords
ray
sample
rays
dimensional
image
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Japanese (ja)
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JP2015105831A5 (enExample
JP2015105831A (ja
Inventor
表　和彦
和彦 表
恵一 森川
恵一 森川
義徳 上ヱ地
義徳 上ヱ地
政博 土屋
政博 土屋
藤村　健
健 藤村
敦徳 禧久
敦徳 禧久
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Rigaku Corp
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Rigaku Corp
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Priority to JP2013246533A priority Critical patent/JP6025211B2/ja
Priority to GB1419384.1A priority patent/GB2521907B/en
Priority to US14/538,837 priority patent/US9658174B2/en
Priority to DE102014117251.5A priority patent/DE102014117251A1/de
Publication of JP2015105831A publication Critical patent/JP2015105831A/ja
Publication of JP2015105831A5 publication Critical patent/JP2015105831A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20016—Goniometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20025—Sample holders or supports therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/045—Investigating materials by wave or particle radiation combination of at least 2 measurements (transmission and scatter)
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/315—Accessories, mechanical or electrical features monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/646—Specific applications or type of materials flaws, defects
    • G01N2223/6462—Specific applications or type of materials flaws, defects microdefects
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Molecular Biology (AREA)
JP2013246533A 2013-11-28 2013-11-28 Ｘ線トポグラフィ装置 Active JP6025211B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013246533A JP6025211B2 (ja) 2013-11-28 2013-11-28 Ｘ線トポグラフィ装置
GB1419384.1A GB2521907B (en) 2013-11-28 2014-10-31 X-ray topography apparatus
US14/538,837 US9658174B2 (en) 2013-11-28 2014-11-12 X-ray topography apparatus
DE102014117251.5A DE102014117251A1 (de) 2013-11-28 2014-11-25 Röntgentopographievorrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013246533A JP6025211B2 (ja) 2013-11-28 2013-11-28 Ｘ線トポグラフィ装置

Publications (3)

Publication Number Publication Date
JP2015105831A JP2015105831A (ja) 2015-06-08
JP2015105831A5 JP2015105831A5 (enExample) 2016-01-14
JP6025211B2 true JP6025211B2 (ja) 2016-11-16

Family

ID=53045648

Family Applications (1)

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JP2013246533A Active JP6025211B2 (ja) 2013-11-28 2013-11-28 Ｘ線トポグラフィ装置

Country Status (4)

Country Link
US (1) US9658174B2 (enExample)
JP (1) JP6025211B2 (enExample)
DE (1) DE102014117251A1 (enExample)
GB (1) GB2521907B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
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US11703465B2 (en) 2020-09-02 2023-07-18 Kioxia Corporation Apparatus for inspecting semiconductor device and method for inspecting semiconductor device

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11703465B2 (en) 2020-09-02 2023-07-18 Kioxia Corporation Apparatus for inspecting semiconductor device and method for inspecting semiconductor device

Also Published As

Publication number Publication date
GB2521907B (en) 2020-03-11
GB2521907A (en) 2015-07-08
DE102014117251A1 (de) 2015-05-28
GB201419384D0 (en) 2014-12-17
US20150146858A1 (en) 2015-05-28
JP2015105831A (ja) 2015-06-08
US9658174B2 (en) 2017-05-23

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