JP6013181B2 - マルチモード・イメージング - Google Patents
マルチモード・イメージング Download PDFInfo
- Publication number
- JP6013181B2 JP6013181B2 JP2012501500A JP2012501500A JP6013181B2 JP 6013181 B2 JP6013181 B2 JP 6013181B2 JP 2012501500 A JP2012501500 A JP 2012501500A JP 2012501500 A JP2012501500 A JP 2012501500A JP 6013181 B2 JP6013181 B2 JP 6013181B2
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- JP
- Japan
- Prior art keywords
- image
- images
- illumination
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Input (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/409,788 US8144973B2 (en) | 2009-03-24 | 2009-03-24 | Multi-modal imaging |
| US12/409,788 | 2009-03-24 | ||
| PCT/IL2010/000238 WO2010109455A1 (en) | 2009-03-24 | 2010-03-23 | Multi-modal imaging |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015126670A Division JP6259422B2 (ja) | 2009-03-24 | 2015-06-24 | マルチモード・イメージング |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012521559A JP2012521559A (ja) | 2012-09-13 |
| JP6013181B2 true JP6013181B2 (ja) | 2016-10-25 |
Family
ID=42780217
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012501500A Active JP6013181B2 (ja) | 2009-03-24 | 2010-03-23 | マルチモード・イメージング |
| JP2015126670A Active JP6259422B2 (ja) | 2009-03-24 | 2015-06-24 | マルチモード・イメージング |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015126670A Active JP6259422B2 (ja) | 2009-03-24 | 2015-06-24 | マルチモード・イメージング |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8144973B2 (enExample) |
| JP (2) | JP6013181B2 (enExample) |
| KR (1) | KR101691242B1 (enExample) |
| CN (1) | CN102341692B (enExample) |
| IL (1) | IL214416A (enExample) |
| TW (1) | TWI484163B (enExample) |
| WO (1) | WO2010109455A1 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI484154B (zh) * | 2012-02-24 | 2015-05-11 | 光學檢測裝置及其運作方法 | |
| TWI477766B (zh) * | 2012-12-18 | 2015-03-21 | Ind Tech Res Inst | 檢測裝置以及檢測方法 |
| DE102013212495A1 (de) * | 2013-06-27 | 2014-12-31 | Robert Bosch Gmbh | Verfahren und Vorrichtung zur Inspektion einer konturierten Fläche,insbesondere des Unterbodens eines Kraftfahrzeugs |
| KR101473569B1 (ko) * | 2013-07-03 | 2014-12-26 | 주식회사 앤비젼 | 라인스캔 카메라를 이용한 결함 검사 장치 및 그 방법 |
| TWI504886B (zh) * | 2013-12-26 | 2015-10-21 | Machvision Inc | 印刷電路板之防焊層裂縫現象及異色現象的檢測方法及檢測設備 |
| FR3031859B1 (fr) * | 2015-01-16 | 2018-04-20 | Areva Np | Reconstitution de scene par assemblage d'images |
| KR101906139B1 (ko) | 2017-01-24 | 2018-10-10 | 주식회사 래온 | 검사 기준 화상을 통한 자동 조명 설정 방식의 머신 비전 시스템 및 동작 방법 |
| KR101906137B1 (ko) | 2017-01-24 | 2018-10-10 | 주식회사 래온 | 인쇄회로기판의 결함을 검사하는 장치 및 방법 |
| US11178801B2 (en) | 2017-07-12 | 2021-11-16 | Mycronic AB | Method and system for determining component illumination settings |
| KR102678467B1 (ko) * | 2018-03-28 | 2024-06-27 | 삼성디스플레이 주식회사 | 광학식 검사 장치 및 광학식 검사 방법 |
| US10558778B2 (en) * | 2018-04-03 | 2020-02-11 | International Business Machines Corporation | Document implementation tool for PCB refinement |
| US10546088B2 (en) * | 2018-04-03 | 2020-01-28 | International Business Machines Corporation | Document implementation tool for PCB refinement |
| KR102112053B1 (ko) * | 2018-08-01 | 2020-05-18 | 주식회사 뷰온 | 이미지 센서를 이용한 표면결함 검사장치 및 검사방법 |
| US11651492B2 (en) * | 2019-07-12 | 2023-05-16 | Bruker Nano, Inc. | Methods and systems for manufacturing printed circuit board based on x-ray inspection |
| KR102684368B1 (ko) * | 2019-09-13 | 2024-07-11 | 코니카 미놀타 가부시키가이샤 | 표면 결함 판별 장치, 외관 검사 장치 및 프로그램 |
| CN112683925A (zh) * | 2019-10-17 | 2021-04-20 | 神讯电脑(昆山)有限公司 | 物件表面可能缺陷的影像检测扫描方法及其系统 |
| TWI724590B (zh) * | 2019-10-25 | 2021-04-11 | 精信精密工業股份有限公司 | 自動缺陷檢測系統及檢測方法 |
| TWI765337B (zh) | 2019-12-13 | 2022-05-21 | 旺矽科技股份有限公司 | 雷射晶片檢測方法及設備 |
| KR102216999B1 (ko) * | 2020-09-28 | 2021-02-18 | 주식회사 하이브비젼 | 라인 스캔용 논-램버시안 표면 검사 시스템 |
| US11734812B2 (en) * | 2021-03-18 | 2023-08-22 | UnitX, Inc. | Fused imaging device and method |
| WO2023119883A1 (ja) * | 2021-12-24 | 2023-06-29 | 富士フイルム株式会社 | 検査装置、印刷システム、検査システム及びキュアシステム、基板の製造方法及びプログラム |
| JP2023122140A (ja) * | 2022-02-22 | 2023-09-01 | 株式会社Screenホールディングス | 教師データ生成装置、教師データ生成方法およびプログラム |
| TWI891285B (zh) * | 2024-03-15 | 2025-07-21 | 由田新技股份有限公司 | 多重自動光學複判系統以及多重自動光學複判方法 |
| US20250347978A1 (en) * | 2024-05-10 | 2025-11-13 | Perceptron, Inc. | Liquid lens shutter synchronization for optical profilometry |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3347645C1 (de) * | 1983-12-30 | 1985-10-10 | Dr.-Ing. Ludwig Pietzsch Gmbh & Co, 7505 Ettlingen | Verfahren und Einrichtung zum opto-elektronischen Pruefen eines Flaechenmusters an einem Objekt |
| US5227839A (en) * | 1991-06-24 | 1993-07-13 | Etec Systems, Inc. | Small field scanner |
| JPH05107032A (ja) * | 1991-10-16 | 1993-04-27 | Matsushita Electric Ind Co Ltd | 実装基板外観検査方法 |
| US5495337A (en) * | 1991-11-06 | 1996-02-27 | Machine Vision Products, Inc. | Method of visualizing minute particles |
| US5517234A (en) * | 1993-10-26 | 1996-05-14 | Gerber Systems Corporation | Automatic optical inspection system having a weighted transition database |
| FR2726299A1 (fr) * | 1994-11-02 | 1996-05-03 | Scanera Sc | Dispositif d'inspection de textiles |
| US5784484A (en) * | 1995-03-30 | 1998-07-21 | Nec Corporation | Device for inspecting printed wiring boards at different resolutions |
| US6031931A (en) * | 1996-03-15 | 2000-02-29 | Sony Corporation | Automated visual inspection apparatus |
| US5991055A (en) * | 1996-09-23 | 1999-11-23 | Hewlett-Packard Company | Underpulsed scanner with variable scan speed, P. W. M. color balance, scan modes and column reversal |
| US5969372A (en) * | 1997-10-14 | 1999-10-19 | Hewlett-Packard Company | Film scanner with dust and scratch correction by use of dark-field illumination |
| US6208750B1 (en) * | 1998-07-07 | 2001-03-27 | Applied Materials, Inc. | Method for detecting particles using illumination with several wavelengths |
| WO2000026640A1 (en) * | 1998-11-05 | 2000-05-11 | Cyberoptics Corporation | Electronics assembly apparatus with improved imaging system |
| US6327374B1 (en) * | 1999-02-18 | 2001-12-04 | Thermo Radiometrie Oy | Arrangement and method for inspection of surface quality |
| IL131284A (en) * | 1999-08-05 | 2003-05-29 | Orbotech Ltd | Illumination for inspecting surfaces of articles |
| US7039228B1 (en) * | 1999-11-19 | 2006-05-02 | Rudolph Technologies, Inc. | System and method for three-dimensional surface inspection |
| US6433561B1 (en) * | 1999-12-14 | 2002-08-13 | Kla-Tencor Corporation | Methods and apparatus for optimizing semiconductor inspection tools |
| JP2001304835A (ja) * | 2000-04-26 | 2001-10-31 | Toshiba Eng Co Ltd | 凹凸測定用照明装置、凹凸測定装置、欠陥検査用照明装置、欠陥検査装置およびその照明方法 |
| US6654115B2 (en) * | 2001-01-18 | 2003-11-25 | Orbotech Ltd. | System and method for multi-dimensional optical inspection |
| US7231080B2 (en) * | 2001-02-13 | 2007-06-12 | Orbotech Ltd. | Multiple optical input inspection system |
| US20020186878A1 (en) * | 2001-06-07 | 2002-12-12 | Hoon Tan Seow | System and method for multiple image analysis |
| US7009163B2 (en) * | 2001-06-22 | 2006-03-07 | Orbotech Ltd. | High-sensitivity optical scanning using memory integration |
| US6862491B2 (en) * | 2002-05-22 | 2005-03-01 | Applied Materials Israel, Ltd. | System and method for process variation monitor |
| US6781687B2 (en) * | 2002-09-26 | 2004-08-24 | Orbotech Ltd. | Illumination and image acquisition system |
| WO2004061430A2 (en) * | 2002-12-16 | 2004-07-22 | Beltronics Inc. | Method for optimizing inspection speed in low level and fluorescent light applications without sacrificing signal to noise ratio, resolution, or focus quality |
| JP4166587B2 (ja) * | 2003-01-24 | 2008-10-15 | 株式会社サキコーポレーション | 外観検査装置および体積検査方法 |
| US7130036B1 (en) * | 2003-09-16 | 2006-10-31 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of an entire wafer surface using multiple detection channels |
| DE102004004761A1 (de) * | 2004-01-30 | 2005-09-08 | Leica Microsystems Semiconductor Gmbh | Vorrichtung und Verfahren zur Inspektion eines Wafers |
| TWM266446U (en) * | 2004-09-27 | 2005-06-01 | Kubotek Corp | Optical inspection system |
| US7397552B2 (en) * | 2004-09-27 | 2008-07-08 | Applied Materials, Israel, Ltd. | Optical inspection with alternating configurations |
| US7355689B2 (en) * | 2005-01-31 | 2008-04-08 | Applied Materials, Inc. | Automatic optical inspection using multiple objectives |
| JP2006329919A (ja) * | 2005-05-30 | 2006-12-07 | Sumitomo Metal Mining Co Ltd | 照明装置、該照明装置を用いた画像処理装置および画像処理方法 |
| JP4778755B2 (ja) * | 2005-09-09 | 2011-09-21 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びこれを用いた装置 |
| US7676077B2 (en) * | 2005-11-18 | 2010-03-09 | Kla-Tencor Technologies Corp. | Methods and systems for utilizing design data in combination with inspection data |
| US7570796B2 (en) * | 2005-11-18 | 2009-08-04 | Kla-Tencor Technologies Corp. | Methods and systems for utilizing design data in combination with inspection data |
| JP2008026212A (ja) * | 2006-07-24 | 2008-02-07 | Ushio Inc | パターン検査装置 |
| TW200823448A (en) * | 2006-11-28 | 2008-06-01 | Univ Chung Hua | Automated optical inspection system and the method thereof |
| JP4987511B2 (ja) * | 2007-03-05 | 2012-07-25 | 倉敷紡績株式会社 | プリント配線板の検査装置 |
-
2009
- 2009-03-24 US US12/409,788 patent/US8144973B2/en active Active
-
2010
- 2010-03-23 CN CN201080010615.2A patent/CN102341692B/zh active Active
- 2010-03-23 KR KR1020117019837A patent/KR101691242B1/ko active Active
- 2010-03-23 WO PCT/IL2010/000238 patent/WO2010109455A1/en not_active Ceased
- 2010-03-23 TW TW099108481A patent/TWI484163B/zh active
- 2010-03-23 JP JP2012501500A patent/JP6013181B2/ja active Active
-
2011
- 2011-08-02 IL IL214416A patent/IL214416A/en active IP Right Grant
-
2015
- 2015-06-24 JP JP2015126670A patent/JP6259422B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6259422B2 (ja) | 2018-01-10 |
| JP2012521559A (ja) | 2012-09-13 |
| IL214416A (en) | 2015-10-29 |
| KR20120058443A (ko) | 2012-06-07 |
| KR101691242B1 (ko) | 2016-12-29 |
| TW201105957A (en) | 2011-02-16 |
| WO2010109455A1 (en) | 2010-09-30 |
| US8144973B2 (en) | 2012-03-27 |
| TWI484163B (zh) | 2015-05-11 |
| CN102341692A (zh) | 2012-02-01 |
| US20100245813A1 (en) | 2010-09-30 |
| JP2016006422A (ja) | 2016-01-14 |
| CN102341692B (zh) | 2016-05-04 |
| IL214416A0 (en) | 2011-09-27 |
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