KR101691242B1 - 다중 모드 이미징 - Google Patents

다중 모드 이미징 Download PDF

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Publication number
KR101691242B1
KR101691242B1 KR1020117019837A KR20117019837A KR101691242B1 KR 101691242 B1 KR101691242 B1 KR 101691242B1 KR 1020117019837 A KR1020117019837 A KR 1020117019837A KR 20117019837 A KR20117019837 A KR 20117019837A KR 101691242 B1 KR101691242 B1 KR 101691242B1
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South Korea
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image
illumination
images
inspection system
optical inspection
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KR20120058443A (ko
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타미르 마르갈리트
나프탈리 아부다람
람 오론
아미르 노이
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오르보테크 엘티디.
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Input (AREA)
KR1020117019837A 2009-03-24 2010-03-23 다중 모드 이미징 Active KR101691242B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/409,788 2009-03-24
US12/409,788 US8144973B2 (en) 2009-03-24 2009-03-24 Multi-modal imaging
PCT/IL2010/000238 WO2010109455A1 (en) 2009-03-24 2010-03-23 Multi-modal imaging

Publications (2)

Publication Number Publication Date
KR20120058443A KR20120058443A (ko) 2012-06-07
KR101691242B1 true KR101691242B1 (ko) 2016-12-29

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KR1020117019837A Active KR101691242B1 (ko) 2009-03-24 2010-03-23 다중 모드 이미징

Country Status (7)

Country Link
US (1) US8144973B2 (enExample)
JP (2) JP6013181B2 (enExample)
KR (1) KR101691242B1 (enExample)
CN (1) CN102341692B (enExample)
IL (1) IL214416A (enExample)
TW (1) TWI484163B (enExample)
WO (1) WO2010109455A1 (enExample)

Cited By (3)

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KR20180087090A (ko) 2017-01-24 2018-08-01 주식회사 래온 검사 기준 화상을 통한 자동 조명 설정 방식의 머신 비전 시스템 및 동작 방법
KR20180087089A (ko) 2017-01-24 2018-08-01 주식회사 래온 인쇄회로기판의 결함을 검사하는 장치 및 방법
KR20190114072A (ko) * 2018-03-28 2019-10-10 삼성디스플레이 주식회사 광학식 검사 장치 및 광학식 검사 방법

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TWI484154B (zh) * 2012-02-24 2015-05-11 光學檢測裝置及其運作方法
TWI477766B (zh) 2012-12-18 2015-03-21 Ind Tech Res Inst 檢測裝置以及檢測方法
DE102013212495A1 (de) * 2013-06-27 2014-12-31 Robert Bosch Gmbh Verfahren und Vorrichtung zur Inspektion einer konturierten Fläche,insbesondere des Unterbodens eines Kraftfahrzeugs
KR101473569B1 (ko) * 2013-07-03 2014-12-26 주식회사 앤비젼 라인스캔 카메라를 이용한 결함 검사 장치 및 그 방법
TWI504886B (zh) * 2013-12-26 2015-10-21 Machvision Inc 印刷電路板之防焊層裂縫現象及異色現象的檢測方法及檢測設備
FR3031859B1 (fr) * 2015-01-16 2018-04-20 Areva Np Reconstitution de scene par assemblage d'images
US10041889B2 (en) * 2016-08-01 2018-08-07 The Boeing Company System and method for high speed surface and subsurface FOD and defect detection
US11178801B2 (en) 2017-07-12 2021-11-16 Mycronic AB Method and system for determining component illumination settings
US10558778B2 (en) * 2018-04-03 2020-02-11 International Business Machines Corporation Document implementation tool for PCB refinement
US10546088B2 (en) * 2018-04-03 2020-01-28 International Business Machines Corporation Document implementation tool for PCB refinement
KR102112053B1 (ko) * 2018-08-01 2020-05-18 주식회사 뷰온 이미지 센서를 이용한 표면결함 검사장치 및 검사방법
US11651492B2 (en) * 2019-07-12 2023-05-16 Bruker Nano, Inc. Methods and systems for manufacturing printed circuit board based on x-ray inspection
WO2021049326A1 (ja) * 2019-09-13 2021-03-18 コニカミノルタ株式会社 表面欠陥判別装置、外観検査装置及びプログラム
CN112683925A (zh) * 2019-10-17 2021-04-20 神讯电脑(昆山)有限公司 物件表面可能缺陷的影像检测扫描方法及其系统
TWI724590B (zh) * 2019-10-25 2021-04-11 精信精密工業股份有限公司 自動缺陷檢測系統及檢測方法
TWI765337B (zh) * 2019-12-13 2022-05-21 旺矽科技股份有限公司 雷射晶片檢測方法及設備
KR102216999B1 (ko) * 2020-09-28 2021-02-18 주식회사 하이브비젼 라인 스캔용 논-램버시안 표면 검사 시스템
US11734812B2 (en) * 2021-03-18 2023-08-22 UnitX, Inc. Fused imaging device and method
WO2023119883A1 (ja) * 2021-12-24 2023-06-29 富士フイルム株式会社 検査装置、印刷システム、検査システム及びキュアシステム、基板の製造方法及びプログラム
JP2023122140A (ja) * 2022-02-22 2023-09-01 株式会社Ｓｃｒｅｅｎホールディングス 教師データ生成装置、教師データ生成方法およびプログラム
TWI891285B (zh) * 2024-03-15 2025-07-21 由田新技股份有限公司 多重自動光學複判系統以及多重自動光學複判方法
US20250347978A1 (en) * 2024-05-10 2025-11-13 Perceptron, Inc. Liquid lens shutter synchronization for optical profilometry
CN119845907B (zh) * 2025-02-17 2025-12-16 西藏自然科学博物馆 一种用于遗址三维影像采集与沉浸式生成方法及系统

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US5517234A (en) 1993-10-26 1996-05-14 Gerber Systems Corporation Automatic optical inspection system having a weighted transition database
JP2000241362A (ja) * 1999-02-18 2000-09-08 Spectra Physics Visiontech Oy 表面品質検査装置及びその方法
JP2001304835A (ja) * 2000-04-26 2001-10-31 Toshiba Eng Co Ltd 凹凸測定用照明装置、凹凸測定装置、欠陥検査用照明装置、欠陥検査装置およびその照明方法
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180087090A (ko) 2017-01-24 2018-08-01 주식회사 래온 검사 기준 화상을 통한 자동 조명 설정 방식의 머신 비전 시스템 및 동작 방법
KR20180087089A (ko) 2017-01-24 2018-08-01 주식회사 래온 인쇄회로기판의 결함을 검사하는 장치 및 방법
KR20190114072A (ko) * 2018-03-28 2019-10-10 삼성디스플레이 주식회사 광학식 검사 장치 및 광학식 검사 방법
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Also Published As

Publication number Publication date
JP6259422B2 (ja) 2018-01-10
KR20120058443A (ko) 2012-06-07
JP2012521559A (ja) 2012-09-13
TWI484163B (zh) 2015-05-11
CN102341692B (zh) 2016-05-04
JP6013181B2 (ja) 2016-10-25
TW201105957A (en) 2011-02-16
CN102341692A (zh) 2012-02-01
US8144973B2 (en) 2012-03-27
JP2016006422A (ja) 2016-01-14
IL214416A (en) 2015-10-29
US20100245813A1 (en) 2010-09-30
IL214416A0 (en) 2011-09-27
WO2010109455A1 (en) 2010-09-30

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