JP5991070B2 - フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 - Google Patents
フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 Download PDFInfo
- Publication number
- JP5991070B2 JP5991070B2 JP2012178055A JP2012178055A JP5991070B2 JP 5991070 B2 JP5991070 B2 JP 5991070B2 JP 2012178055 A JP2012178055 A JP 2012178055A JP 2012178055 A JP2012178055 A JP 2012178055A JP 5991070 B2 JP5991070 B2 JP 5991070B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorine gas
- electrolytic cells
- electrolytic
- gas
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011737 fluorine Substances 0.000 title claims description 142
- 229910052731 fluorine Inorganic materials 0.000 title claims description 142
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 141
- 238000000034 method Methods 0.000 title claims description 15
- 238000005868 electrolysis reaction Methods 0.000 claims description 23
- 238000001514 detection method Methods 0.000 claims description 19
- 230000007423 decrease Effects 0.000 claims description 14
- 150000002222 fluorine compounds Chemical class 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000003247 decreasing effect Effects 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 173
- 150000003839 salts Chemical class 0.000 description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 20
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 19
- 238000012937 correction Methods 0.000 description 16
- 239000006227 byproduct Substances 0.000 description 14
- 238000000746 purification Methods 0.000 description 14
- 239000002994 raw material Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- 238000004364 calculation method Methods 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000012159 carrier gas Substances 0.000 description 7
- 238000013461 design Methods 0.000 description 7
- 238000005192 partition Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004904 shortening Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 231100000681 Certain safety factor Toxicity 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/20—Fluorine
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012178055A JP5991070B2 (ja) | 2012-08-10 | 2012-08-10 | フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 |
| PCT/JP2013/069596 WO2014024660A1 (ja) | 2012-08-10 | 2013-07-19 | フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 |
| TW102128157A TW201413059A (zh) | 2012-08-10 | 2013-08-06 | 氟氣生成裝置及氟氣生成裝置之控制方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012178055A JP5991070B2 (ja) | 2012-08-10 | 2012-08-10 | フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014034726A JP2014034726A (ja) | 2014-02-24 |
| JP2014034726A5 JP2014034726A5 (OSRAM) | 2015-07-09 |
| JP5991070B2 true JP5991070B2 (ja) | 2016-09-14 |
Family
ID=50067894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012178055A Active JP5991070B2 (ja) | 2012-08-10 | 2012-08-10 | フッ素ガス生成装置及びフッ素ガス生成装置の制御方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5991070B2 (OSRAM) |
| TW (1) | TW201413059A (OSRAM) |
| WO (1) | WO2014024660A1 (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6605884B2 (ja) * | 2014-09-02 | 2019-11-13 | 株式会社東芝 | 水素製造システム及び水素製造方法 |
| WO2021122323A1 (en) * | 2019-12-20 | 2021-06-24 | Avantium Knowledge Centre B.V. | Formation of formic acid with the help of indium-containing catalytic electrode |
| DE102020115711A1 (de) | 2020-06-15 | 2021-12-16 | Thyssenkrupp Uhde Chlorine Engineers Gmbh | Verfahren zur bedarfsabhängigen Regelung einer elektrochemischen Anlage |
| CN111850597B (zh) * | 2020-06-15 | 2022-08-05 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种电化学氟化外循环电解系统 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005194564A (ja) * | 2004-01-06 | 2005-07-21 | Sumitomo Chemical Co Ltd | 電気分解生成物の製造方法 |
| JP2010189675A (ja) * | 2009-02-16 | 2010-09-02 | Toyo Tanso Kk | 気体発生装置および気体発生方法 |
| JP5720112B2 (ja) * | 2010-04-16 | 2015-05-20 | セントラル硝子株式会社 | フッ素ガス生成装置 |
| KR101028804B1 (ko) * | 2010-07-07 | 2011-04-12 | 주식회사 이앤이 | 브라운 가스 제조 장치 및 브라운 가스 제조 방법 |
-
2012
- 2012-08-10 JP JP2012178055A patent/JP5991070B2/ja active Active
-
2013
- 2013-07-19 WO PCT/JP2013/069596 patent/WO2014024660A1/ja not_active Ceased
- 2013-08-06 TW TW102128157A patent/TW201413059A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014024660A1 (ja) | 2014-02-13 |
| TW201413059A (zh) | 2014-04-01 |
| JP2014034726A (ja) | 2014-02-24 |
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