JP5961429B2 - 露光描画装置及び露光描画方法 - Google Patents

露光描画装置及び露光描画方法 Download PDF

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Publication number
JP5961429B2
JP5961429B2 JP2012082561A JP2012082561A JP5961429B2 JP 5961429 B2 JP5961429 B2 JP 5961429B2 JP 2012082561 A JP2012082561 A JP 2012082561A JP 2012082561 A JP2012082561 A JP 2012082561A JP 5961429 B2 JP5961429 B2 JP 5961429B2
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JP
Japan
Prior art keywords
exposure
substrate
unit
mark forming
exposed
Prior art date
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Application number
JP2012082561A
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English (en)
Japanese (ja)
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JP2013213852A (ja
Inventor
橋口　昭浩
昭浩 橋口
浩明 菊池
浩明 菊池
弘則 鶴井
弘則 鶴井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Original Assignee
Adtec Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP2012082561A priority Critical patent/JP5961429B2/ja
Priority to CN201380016100.7A priority patent/CN104185817B/zh
Priority to PCT/JP2013/050242 priority patent/WO2013145798A1/ja
Priority to KR1020147025492A priority patent/KR102024617B1/ko
Priority to TW102103172A priority patent/TWI570519B/zh
Publication of JP2013213852A publication Critical patent/JP2013213852A/ja
Application granted granted Critical
Publication of JP5961429B2 publication Critical patent/JP5961429B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/166—Alignment or registration; Control of registration
JP2012082561A 2012-03-30 2012-03-30 露光描画装置及び露光描画方法 Active JP5961429B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012082561A JP5961429B2 (ja) 2012-03-30 2012-03-30 露光描画装置及び露光描画方法
CN201380016100.7A CN104185817B (zh) 2012-03-30 2013-01-09 曝光描绘装置和曝光描绘方法
PCT/JP2013/050242 WO2013145798A1 (ja) 2012-03-30 2013-01-09 露光描画装置及び露光描画方法
KR1020147025492A KR102024617B1 (ko) 2012-03-30 2013-01-09 노광 묘화 장치 및 노광 묘화 방법
TW102103172A TWI570519B (zh) 2012-03-30 2013-01-28 曝光微影裝置以及曝光微影方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012082561A JP5961429B2 (ja) 2012-03-30 2012-03-30 露光描画装置及び露光描画方法

Publications (2)

Publication Number Publication Date
JP2013213852A JP2013213852A (ja) 2013-10-17
JP5961429B2 true JP5961429B2 (ja) 2016-08-02

Family

ID=49259084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012082561A Active JP5961429B2 (ja) 2012-03-30 2012-03-30 露光描画装置及び露光描画方法

Country Status (5)

Country Link
JP (1) JP5961429B2 (ko)
KR (1) KR102024617B1 (ko)
CN (1) CN104185817B (ko)
TW (1) TWI570519B (ko)
WO (1) WO2013145798A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014071157A (ja) * 2012-09-27 2014-04-21 Fujifilm Corp 露光描画装置、露光描画システム、プログラム及び露光描画方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6465591B2 (ja) 2014-08-27 2019-02-06 株式会社オーク製作所 描画装置
CN105607430B (zh) * 2015-12-30 2017-07-07 深圳市鑫富宝科技有限公司 软板自动曝光机
CN109466189A (zh) * 2018-12-21 2019-03-15 昆山森特斯印刷技术有限公司 套印定位设备及具有该套印定位设备的套印定位系统
JP7386742B2 (ja) 2020-03-24 2023-11-27 株式会社Ｓｃｒｅｅｎホールディングス 露光装置
JP7458950B2 (ja) 2020-09-23 2024-04-01 株式会社Ｓｃｒｅｅｎホールディングス 描画システム

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6701197B2 (en) * 2000-11-08 2004-03-02 Orbotech Ltd. System and method for side to side registration in a printed circuit imager
SG118239A1 (en) * 2003-04-24 2006-01-27 Asml Netherlands Bv Lithographic processing method and device manufactured thereby
JP2005014012A (ja) * 2003-06-24 2005-01-20 Pentax Corp 描画装置および描画方法
TWI357095B (en) * 2003-10-27 2012-01-21 Samsung Electronics Co Ltd Lithography equipment
JP4882354B2 (ja) * 2004-12-01 2012-02-22 株式会社ニコン アライメント調整方法、アライメントマークの形成方法、基材、及び透過型光学素子の製造方法
JP2006293314A (ja) * 2005-02-08 2006-10-26 Fuji Photo Film Co Ltd 画像形成装置および画像形成方法
JP2006276206A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 露光装置および露光方法
JP4922071B2 (ja) * 2007-05-28 2012-04-25 株式会社オーク製作所 露光描画装置
TWI373694B (en) * 2007-08-09 2012-10-01 Nanya Technology Corp Exposure methiod
JP2009099939A (ja) * 2007-09-25 2009-05-07 Dainippon Screen Mfg Co Ltd アライメントマーク形成装置
JP5452889B2 (ja) * 2008-06-04 2014-03-26 株式会社オーク製作所 描画装置
NL2004531A (nl) * 2009-05-29 2010-11-30 Asml Netherlands Bv Apparatus and method for providing resist alignment marks in a double patterning lithographic process.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014071157A (ja) * 2012-09-27 2014-04-21 Fujifilm Corp 露光描画装置、露光描画システム、プログラム及び露光描画方法

Also Published As

Publication number Publication date
KR20150003161A (ko) 2015-01-08
CN104185817A (zh) 2014-12-03
CN104185817B (zh) 2016-05-18
WO2013145798A1 (ja) 2013-10-03
JP2013213852A (ja) 2013-10-17
TW201339767A (zh) 2013-10-01
TWI570519B (zh) 2017-02-11
KR102024617B1 (ko) 2019-09-24

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