JP5948691B1 - 成形型、成形型の製造方法及び複製品の製造方法 - Google Patents
成形型、成形型の製造方法及び複製品の製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 47
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 77
- 238000001020 plasma etching Methods 0.000 claims abstract description 57
- 238000005530 etching Methods 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000000034 method Methods 0.000 claims abstract description 32
- 239000007789 gas Substances 0.000 claims abstract description 31
- 229910018503 SF6 Inorganic materials 0.000 claims abstract description 23
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229960000909 sulfur hexafluoride Drugs 0.000 claims abstract description 23
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- 230000002265 prevention Effects 0.000 claims abstract description 5
- 238000000465 moulding Methods 0.000 claims description 27
- 238000007493 shaping process Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 18
- 238000005323 electroforming Methods 0.000 claims description 7
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 5
- 239000012528 membrane Substances 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- 230000001172 regenerating effect Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000002310 reflectometry Methods 0.000 description 6
- 238000000992 sputter etching Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- -1 oxygen ions Chemical class 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2905/00—Use of metals, their alloys or their compounds, as mould material
- B29K2905/08—Transition metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32412—Plasma immersion ion implantation
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Surface Treatment Of Optical Elements (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
本発明の第1の態様の第4の実施形態の成形型の製造方法は、六フッ化硫黄と酸素との混合ガスの代わりに、四フッ化炭素またはトリフルオロメタンと酸素との混合ガスを使用する。
Claims (9)
- 成形型の製造方法であって、
反応性イオンエッチング装置内に、六フッ化硫黄と反応する半導体または金属の基材を配置し、
六フッ化硫黄と酸素との混合ガスを導入し、プラズマドライエッチングプロセスにおいて、該基材の表面に酸化物を点在させ、該酸化物をエッチング防止マスクとして、六フッ化硫黄によって該基材の表面にエッチングを進行させることにより該基材の表面に、微細凹凸構造を形成し、
その後、該微細凹凸構造の凸部の形状を調整するように該微細凹凸構造にイオンビームを照射することを含む成形型の製造方法。 - さらに、イオンビームを照射して該微細凹凸構造の凸部の形状を調整した後に、電鋳によって該微細凹凸構造を再生することを含む請求項1に記載の成形型の製造方法。
- イオンビームを照射する際に、該基材の表面に対するイオンビームの角度が0度から20度の範囲である請求項1または2に記載の成形型の製造方法。
- 該基材が基板または膜として形成されている請求項1から3のいずれかに記載の成形型の製造方法。
- 六フッ化硫黄と酸素との混合ガスの代わりに、四フッ化炭素またはトリフルオロメタンと酸素との混合ガスを使用する請求項1から4のいずれかに記載の成形型の製造方法。
- 光学素子用の成形型を製造する請求項1から5のいずれかに記載の成形型の製造方法。
- 反射防止構造用の成形型を製造する請求項1から5のいずれかに記載の成形型の製造方法。
- 可視光域の光の反射防止構造用の成形型を製造する請求項1から5のいずれかに記載の成形型の製造方法。
- 請求項1から8のいずれかの方法によって成形型を製造し、
該成形型を使用して成形によって複製品を製造する複製品の製造方法。
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PCT/JP2015/075073 WO2017037918A1 (ja) | 2015-09-03 | 2015-09-03 | 成形型、成形型の製造方法及び複製品の製造方法 |
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JP5948691B1 true JP5948691B1 (ja) | 2016-07-06 |
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US (1) | US10363687B2 (ja) |
JP (1) | JP5948691B1 (ja) |
CN (1) | CN107848151B (ja) |
DE (1) | DE112015006873B4 (ja) |
WO (1) | WO2017037918A1 (ja) |
Cited By (1)
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JP2019072885A (ja) * | 2017-10-13 | 2019-05-16 | 株式会社エンプラス | ドライエッチング法による成形型の製造方法 |
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DE102018108074A1 (de) * | 2018-04-05 | 2019-10-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verwendung eines Bauteils mit mikrostrukturierter Oberfläche als Fließbett für diskrete Mengen einer Flüssigkeit |
DE102018108053A1 (de) * | 2018-04-05 | 2019-10-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Mikrostrukturierter Gegenstand |
WO2020250300A1 (ja) * | 2019-06-11 | 2020-12-17 | ナルックス株式会社 | 表面に微細凹凸構造を備えたプラスチック素子の製造方法 |
CN111517274B (zh) * | 2020-04-29 | 2022-03-29 | 中国科学院光电技术研究所 | 一种曲面衬底上微纳结构图形高精度刻蚀传递方法 |
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JP2006068926A (ja) * | 2004-08-31 | 2006-03-16 | Alps Electric Co Ltd | 樹脂製光学部品用の成形型の製造方法 |
WO2007020967A1 (ja) * | 2005-08-19 | 2007-02-22 | Kiichi Takamoto | マイクロレンズ用金型およびその製法 |
JP2010272801A (ja) * | 2009-05-25 | 2010-12-02 | Hitachi Maxell Ltd | 表面加工方法、及びこの方法により製造されるインプリント用モルド |
JP2013077617A (ja) * | 2011-09-29 | 2013-04-25 | Toppan Printing Co Ltd | 低反射構造を成型するための原版の製造方法および原版 |
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JP5027347B2 (ja) * | 2010-04-28 | 2012-09-19 | シャープ株式会社 | 型および型の製造方法 |
CN201807659U (zh) * | 2010-09-30 | 2011-04-27 | 鑫鸿交通工业(安徽)有限公司 | 上模具、下模具和模具组件 |
US20150192702A1 (en) | 2012-11-16 | 2015-07-09 | Nalux Co., Ltd. | Mold, optical element and method for manufacturing the same |
DE112013005487B4 (de) | 2012-11-16 | 2022-07-07 | Nalux Co., Ltd. | Verfahren zur Herstellung einer Form für eine Antireflexionsstruktur und einer Form für ein optisches Gitter |
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- 2015-09-03 WO PCT/JP2015/075073 patent/WO2017037918A1/ja active Application Filing
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- 2015-09-03 DE DE112015006873.2T patent/DE112015006873B4/de active Active
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Patent Citations (4)
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JP2006068926A (ja) * | 2004-08-31 | 2006-03-16 | Alps Electric Co Ltd | 樹脂製光学部品用の成形型の製造方法 |
WO2007020967A1 (ja) * | 2005-08-19 | 2007-02-22 | Kiichi Takamoto | マイクロレンズ用金型およびその製法 |
JP2010272801A (ja) * | 2009-05-25 | 2010-12-02 | Hitachi Maxell Ltd | 表面加工方法、及びこの方法により製造されるインプリント用モルド |
JP2013077617A (ja) * | 2011-09-29 | 2013-04-25 | Toppan Printing Co Ltd | 低反射構造を成型するための原版の製造方法および原版 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019072885A (ja) * | 2017-10-13 | 2019-05-16 | 株式会社エンプラス | ドライエッチング法による成形型の製造方法 |
JP6993837B2 (ja) | 2017-10-13 | 2022-02-04 | 株式会社エンプラス | ドライエッチング法による成形型の製造方法 |
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US20180154556A1 (en) | 2018-06-07 |
WO2017037918A1 (ja) | 2017-03-09 |
DE112015006873B4 (de) | 2023-08-31 |
JPWO2017037918A1 (ja) | 2017-08-31 |
CN107848151B (zh) | 2020-03-03 |
US10363687B2 (en) | 2019-07-30 |
DE112015006873T5 (de) | 2018-05-17 |
CN107848151A (zh) | 2018-03-27 |
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