JP5921730B2 - ガラス基板の製造方法及びガラス基板製造装置 - Google Patents
ガラス基板の製造方法及びガラス基板製造装置 Download PDFInfo
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- JP5921730B2 JP5921730B2 JP2014561670A JP2014561670A JP5921730B2 JP 5921730 B2 JP5921730 B2 JP 5921730B2 JP 2014561670 A JP2014561670 A JP 2014561670A JP 2014561670 A JP2014561670 A JP 2014561670A JP 5921730 B2 JP5921730 B2 JP 5921730B2
- Authority
- JP
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- Prior art keywords
- molten glass
- glass
- gas phase
- phase space
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000011521 glass Substances 0.000 title claims description 246
- 239000000758 substrate Substances 0.000 title claims description 171
- 238000004519 manufacturing process Methods 0.000 title claims description 90
- 239000006060 molten glass Substances 0.000 claims description 530
- 229910052760 oxygen Inorganic materials 0.000 claims description 292
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 288
- 239000001301 oxygen Substances 0.000 claims description 288
- 239000007789 gas Substances 0.000 claims description 242
- 238000005352 clarification Methods 0.000 claims description 236
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 175
- 229910052751 metal Inorganic materials 0.000 claims description 141
- 239000002184 metal Substances 0.000 claims description 141
- 238000012545 processing Methods 0.000 claims description 133
- 238000009826 distribution Methods 0.000 claims description 82
- 238000000034 method Methods 0.000 claims description 43
- 239000006025 fining agent Substances 0.000 claims description 42
- 238000002844 melting Methods 0.000 claims description 40
- 230000008018 melting Effects 0.000 claims description 40
- 238000006722 reduction reaction Methods 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 32
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 31
- 229910001887 tin oxide Inorganic materials 0.000 claims description 31
- 230000008569 process Effects 0.000 claims description 30
- 239000002994 raw material Substances 0.000 claims description 22
- 238000005094 computer simulation Methods 0.000 claims description 21
- 239000006260 foam Substances 0.000 claims description 15
- 238000007670 refining Methods 0.000 claims description 15
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- 239000012071 phase Substances 0.000 description 136
- 238000010926 purge Methods 0.000 description 46
- 230000002829 reductive effect Effects 0.000 description 41
- 238000010438 heat treatment Methods 0.000 description 25
- 239000007788 liquid Substances 0.000 description 23
- 229910052697 platinum Inorganic materials 0.000 description 20
- 238000012546 transfer Methods 0.000 description 19
- 230000000694 effects Effects 0.000 description 18
- 238000003756 stirring Methods 0.000 description 17
- 238000011144 upstream manufacturing Methods 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 239000003513 alkali Substances 0.000 description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 10
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 10
- 230000000630 rising effect Effects 0.000 description 10
- 230000007547 defect Effects 0.000 description 9
- -1 platinum group metal oxide Chemical class 0.000 description 9
- 230000002776 aggregation Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000005357 flat glass Substances 0.000 description 8
- 239000011449 brick Substances 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 7
- 238000010309 melting process Methods 0.000 description 7
- 238000006479 redox reaction Methods 0.000 description 7
- 238000004088 simulation Methods 0.000 description 7
- 239000003039 volatile agent Substances 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000010583 slow cooling Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000001629 suppression Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000008395 clarifying agent Substances 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 229910018068 Li 2 O Inorganic materials 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- MQWCQFCZUNBTCM-UHFFFAOYSA-N 2-tert-butyl-6-(3-tert-butyl-2-hydroxy-5-methylphenyl)sulfanyl-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(SC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O MQWCQFCZUNBTCM-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000004931 aggregating effect Effects 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- GCPXMJHSNVMWNM-UHFFFAOYSA-N arsenous acid Chemical compound O[As](O)O GCPXMJHSNVMWNM-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007500 overflow downdraw method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 238000009849 vacuum degassing Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
- C03B5/2252—Refining under reduced pressure, e.g. with vacuum refiners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/167—Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
- C03B5/1672—Use of materials therefor
- C03B5/1675—Platinum group metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013268977 | 2013-12-26 | ||
JP2013268977 | 2013-12-26 | ||
JP2014073179 | 2014-03-31 | ||
JP2014073179 | 2014-03-31 | ||
PCT/JP2014/084587 WO2015099143A1 (ja) | 2013-12-26 | 2014-12-26 | ガラス基板の製造方法及びガラス基板製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5921730B2 true JP5921730B2 (ja) | 2016-05-24 |
JPWO2015099143A1 JPWO2015099143A1 (ja) | 2017-03-23 |
Family
ID=53478982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014561670A Active JP5921730B2 (ja) | 2013-12-26 | 2014-12-26 | ガラス基板の製造方法及びガラス基板製造装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5921730B2 (zh) |
KR (1) | KR101730743B1 (zh) |
CN (1) | CN105377774B (zh) |
TW (1) | TWI568696B (zh) |
WO (1) | WO2015099143A1 (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6630215B2 (ja) * | 2016-03-31 | 2020-01-15 | AvanStrate株式会社 | ガラス基板の製造方法、及び、ガラス基板の製造装置 |
JP6499250B2 (ja) * | 2016-09-30 | 2019-04-10 | AvanStrate株式会社 | ガラス基板の製造方法、およびガラス基板製造装置 |
JP6847620B2 (ja) * | 2016-09-30 | 2021-03-24 | AvanStrate株式会社 | ガラス基板の製造方法、およびガラス基板製造装置 |
US11505487B2 (en) | 2017-03-16 | 2022-11-22 | Corning Incorporated | Method for decreasing bubble lifetime on a glass melt surface |
KR102532702B1 (ko) * | 2017-09-05 | 2023-05-12 | 니폰 덴키 가라스 가부시키가이샤 | 무알칼리 유리 기판의 제조 방법 및 무알칼리 유리 기판 |
KR102143702B1 (ko) * | 2017-12-27 | 2020-08-12 | 아반스트레이트 가부시키가이샤 | 유리 기판의 제조 방법 및 유리 기판 제조 장치 |
JP2022507801A (ja) * | 2018-11-21 | 2022-01-18 | コーニング インコーポレイテッド | ガラス融液表面の気泡寿命を縮める方法 |
JP2022509624A (ja) * | 2018-11-28 | 2022-01-21 | コーニング インコーポレイテッド | ガラス製作プロセスにおいて気泡を制御する方法 |
CN115367999A (zh) * | 2022-09-21 | 2022-11-22 | 成都光明光电股份有限公司 | 间隙式光学玻璃生产方法及其装置 |
Citations (6)
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JP2011502934A (ja) * | 2007-11-08 | 2011-01-27 | コーニング インコーポレイテッド | ガラスの清澄化方法およびシステム |
WO2012014906A1 (ja) * | 2010-07-30 | 2012-02-02 | 旭硝子株式会社 | 溶融ガラスの減圧脱泡装置、溶融ガラスの減圧脱泡方法、ガラス製品の製造装置およびガラス製品の製造方法 |
JP2012132071A (ja) * | 2010-12-22 | 2012-07-12 | Tanaka Kikinzoku Kogyo Kk | 高温装置の揮発損失防止方法 |
JP2013010672A (ja) * | 2011-06-29 | 2013-01-17 | Avanstrate Inc | ガラス板製造装置、およびこの装置を用いたガラス板の製造方法 |
JP2013216531A (ja) * | 2012-04-06 | 2013-10-24 | Avanstrate Inc | ガラス板の製造方法及びガラス板の製造装置 |
JP2013539744A (ja) * | 2010-10-11 | 2013-10-28 | ヘレーウス マテリアルズ テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 白金及び白金合金からの蒸発速度の低下 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8269131B2 (en) | 2008-02-28 | 2012-09-18 | Corning Incorporated | Nickel-containing flanges for use in direct resistance heating of platinum-containing vessels |
JP5488865B2 (ja) * | 2009-03-03 | 2014-05-14 | 旭硝子株式会社 | ガラス溶融炉及びガラス溶融方法 |
TWI494283B (zh) * | 2010-02-25 | 2015-08-01 | Corning Inc | 製造玻璃物件之設備及方法 |
CN103118994B (zh) * | 2011-03-31 | 2016-03-16 | 安瀚视特控股株式会社 | 玻璃板制造方法 |
JP5840998B2 (ja) * | 2012-03-30 | 2016-01-06 | AvanStrate株式会社 | ガラス板の製造方法およびガラス板製造装置 |
-
2014
- 2014-12-26 KR KR1020157001898A patent/KR101730743B1/ko active IP Right Grant
- 2014-12-26 CN CN201480001963.1A patent/CN105377774B/zh active Active
- 2014-12-26 WO PCT/JP2014/084587 patent/WO2015099143A1/ja active Application Filing
- 2014-12-26 TW TW103145891A patent/TWI568696B/zh active
- 2014-12-26 JP JP2014561670A patent/JP5921730B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011502934A (ja) * | 2007-11-08 | 2011-01-27 | コーニング インコーポレイテッド | ガラスの清澄化方法およびシステム |
WO2012014906A1 (ja) * | 2010-07-30 | 2012-02-02 | 旭硝子株式会社 | 溶融ガラスの減圧脱泡装置、溶融ガラスの減圧脱泡方法、ガラス製品の製造装置およびガラス製品の製造方法 |
JP2013539744A (ja) * | 2010-10-11 | 2013-10-28 | ヘレーウス マテリアルズ テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 白金及び白金合金からの蒸発速度の低下 |
JP2012132071A (ja) * | 2010-12-22 | 2012-07-12 | Tanaka Kikinzoku Kogyo Kk | 高温装置の揮発損失防止方法 |
JP2013010672A (ja) * | 2011-06-29 | 2013-01-17 | Avanstrate Inc | ガラス板製造装置、およびこの装置を用いたガラス板の製造方法 |
JP2013216531A (ja) * | 2012-04-06 | 2013-10-24 | Avanstrate Inc | ガラス板の製造方法及びガラス板の製造装置 |
Also Published As
Publication number | Publication date |
---|---|
CN105377774A (zh) | 2016-03-02 |
KR20150092736A (ko) | 2015-08-13 |
TW201532992A (zh) | 2015-09-01 |
JPWO2015099143A1 (ja) | 2017-03-23 |
CN105377774B (zh) | 2019-04-05 |
TWI568696B (zh) | 2017-02-01 |
KR101730743B1 (ko) | 2017-04-26 |
WO2015099143A1 (ja) | 2015-07-02 |
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