JP5904734B2 - グラフェン発光素子及びその製造方法 - Google Patents

グラフェン発光素子及びその製造方法 Download PDF

Info

Publication number
JP5904734B2
JP5904734B2 JP2011202388A JP2011202388A JP5904734B2 JP 5904734 B2 JP5904734 B2 JP 5904734B2 JP 2011202388 A JP2011202388 A JP 2011202388A JP 2011202388 A JP2011202388 A JP 2011202388A JP 5904734 B2 JP5904734 B2 JP 5904734B2
Authority
JP
Japan
Prior art keywords
graphene
type
active
emitting device
light emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011202388A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012064944A5 (cg-RX-API-DMAC7.html
JP2012064944A (ja
Inventor
ウォング スン−ウォン
ウォング スン−ウォン
コウ ゲウン−ウー
コウ ゲウン−ウー
シム スン−ヒュン
シム スン−ヒュン
チュング フン−ジェ
チュング フン−ジェ
ハン−キュ−ソン
ソネ チェオル−ソー
ソネ チェオル−ソー
リー ジン−ヒュン
リー ジン−ヒュン
コウ ヒュン−デュク
コウ ヒュン−デュク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020110092511A external-priority patent/KR101850538B1/ko
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JP2012064944A publication Critical patent/JP2012064944A/ja
Publication of JP2012064944A5 publication Critical patent/JP2012064944A5/ja
Application granted granted Critical
Publication of JP5904734B2 publication Critical patent/JP5904734B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6741Group IV materials, e.g. germanium or silicon carbide
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/826Materials of the light-emitting regions comprising only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211Fullerenes, e.g. C60

Landscapes

  • Led Devices (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Led Device Packages (AREA)
  • Luminescent Compositions (AREA)
JP2011202388A 2010-09-16 2011-09-15 グラフェン発光素子及びその製造方法 Active JP5904734B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20100091259 2010-09-16
KR10-2010-0091259 2010-09-16
KR10-2011-0092511 2011-09-14
KR1020110092511A KR101850538B1 (ko) 2010-09-16 2011-09-14 그래핀 발광소자 및 그 제조방법

Publications (3)

Publication Number Publication Date
JP2012064944A JP2012064944A (ja) 2012-03-29
JP2012064944A5 JP2012064944A5 (cg-RX-API-DMAC7.html) 2012-12-20
JP5904734B2 true JP5904734B2 (ja) 2016-04-20

Family

ID=45816920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011202388A Active JP5904734B2 (ja) 2010-09-16 2011-09-15 グラフェン発光素子及びその製造方法

Country Status (3)

Country Link
US (1) US9166099B2 (cg-RX-API-DMAC7.html)
JP (1) JP5904734B2 (cg-RX-API-DMAC7.html)
CN (1) CN102403430B (cg-RX-API-DMAC7.html)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5772307B2 (ja) * 2011-07-04 2015-09-02 富士通株式会社 電子装置およびその製造方法
CN105600776B (zh) * 2011-08-18 2018-03-30 株式会社半导体能源研究所 形成石墨烯及氧化石墨烯盐的方法、以及氧化石墨烯盐
WO2013059708A2 (en) 2011-10-21 2013-04-25 University Of Utah Research Foundation Homogeneous multiple band gap devices
US9202945B2 (en) * 2011-12-23 2015-12-01 Nokia Technologies Oy Graphene-based MIM diode and associated methods
CN102751407A (zh) * 2012-06-27 2012-10-24 中国科学院半导体研究所 应用石墨烯薄膜作为载流子注入层的垂直结构发光二极管
CN102751408A (zh) * 2012-06-27 2012-10-24 中国科学院半导体研究所 应用石墨烯薄膜作为载流子注入层的发光二极管
CN102801101B (zh) * 2012-07-26 2014-12-10 华为技术有限公司 一种石墨烯发光器、使用所述石墨烯发光器的散热装置以及光传输网络节点
JP5991520B2 (ja) * 2012-07-31 2016-09-14 国立研究開発法人産業技術総合研究所 グラフェン積層体の形成方法
KR101396432B1 (ko) * 2012-08-02 2014-05-21 경희대학교 산학협력단 반도체 소자 및 그의 제조 방법
US20150243826A1 (en) * 2012-08-28 2015-08-27 Northeastern University Tunable heterojunction for multifunctional electronics and photovoltaics
KR101430140B1 (ko) 2012-11-28 2014-08-13 성균관대학교산학협력단 인-도핑된 그래핀을 이용한 전계효과 트랜지스터, 그의 제조 방법, 인-도핑된 그래핀, 및 그의 제조 방법
US8580658B1 (en) 2012-12-21 2013-11-12 Solan, LLC Methods for fabricating graphene device topography and devices formed therefrom
US8853061B1 (en) 2013-03-15 2014-10-07 Solan, LLC Methods for manufacturing nonplanar graphite-based devices having multiple bandgaps
KR101517995B1 (ko) * 2013-03-29 2015-05-07 경희대학교 산학협력단 그래핀에 의하여 광증폭된 발광 소자 및 이의 제조방법
JP2016525997A (ja) 2013-05-02 2016-09-01 ウィリアム・マーシュ・ライス・ユニバーシティ 石炭とコークスからグラフェン量子ドットを生成する方法
KR101487729B1 (ko) * 2013-07-03 2015-01-29 코닝정밀소재 주식회사 광전소자용 기판 및 이를 포함하는 광전소자
US10092882B2 (en) * 2013-12-10 2018-10-09 University Of South Carolina Ultrathin, graphene-based membranes for water treatment and methods of their formation and use
CN105016328B (zh) * 2014-04-25 2017-06-06 中国科学院物理研究所 一种在碳化硅衬底上生长p型石墨烯的方法
CN106536404A (zh) * 2014-05-26 2017-03-22 威廉马歇莱思大学 石墨烯量子点‑聚合物复合材料及其制备方法
JP6636459B2 (ja) 2014-05-27 2020-01-29 シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッドSilanna Uv Technologies Pte Ltd 半導体構造と超格子とを用いた高度電子デバイス
US11322643B2 (en) 2014-05-27 2022-05-03 Silanna UV Technologies Pte Ltd Optoelectronic device
WO2015181648A1 (en) 2014-05-27 2015-12-03 The Silanna Group Pty Limited An optoelectronic device
CN106415854B (zh) 2014-05-27 2019-10-01 斯兰纳Uv科技有限公司 包括n型和p型超晶格的电子装置
CN104124348B (zh) * 2014-07-04 2016-08-24 清华大学 颜色可调的石墨烯基薄膜电致发光器件及其制备方法
WO2016105481A2 (en) * 2014-12-24 2016-06-30 The Trustees Of Columbia University In The City Of New York Light emission from electrically biased graphene
GB201501342D0 (en) * 2015-01-27 2015-03-11 Univ Lancaster Improvements relating to the authentication of physical entities
US10892327B2 (en) 2015-09-14 2021-01-12 University College Cork Semi-metal rectifying junction
CN105303985B (zh) * 2015-11-24 2019-02-26 深圳市华星光电技术有限公司 石墨烯显示器及其显示驱动方法
CN105449067B (zh) * 2015-12-31 2017-12-19 白德旭 一种石墨烯led芯片及其制备方法
CN105607346A (zh) * 2016-03-28 2016-05-25 深圳市华星光电技术有限公司 一种石墨烯背光模组及液晶显示装置
TWI593134B (zh) * 2016-05-19 2017-07-21 Method and structure for manufacturing graphene quantum dot on light-emitting diode
CN105789469B (zh) * 2016-05-30 2017-12-29 京东方科技集团股份有限公司 一种发光单元及制作方法、显示面板及显示装置
CN105869574B (zh) * 2016-06-07 2017-03-29 京东方科技集团股份有限公司 一种像素驱动电路及其驱动方法、阵列基板及显示装置
CN106197687B (zh) * 2016-07-19 2019-03-05 中国科学院重庆绿色智能技术研究院 一种基于石墨烯量子点的微测辐射热计
CN106374022B (zh) * 2016-10-18 2018-07-24 广东东邦科技有限公司 基于多层石墨烯量子碳基材料的光源器件及其制备方法
CN106876539B (zh) * 2017-02-17 2019-04-05 深圳市华星光电技术有限公司 石墨烯发光晶体管及其制作方法、主动石墨烯发光显示器
CN109326726B (zh) 2017-07-31 2021-03-16 Tcl科技集团股份有限公司 Qled器件及其制备方法
US10304967B1 (en) 2018-03-02 2019-05-28 Texas Instruments Incorporated Integration of graphene and boron nitride hetero-structure device over semiconductor layer
KR102187443B1 (ko) * 2019-06-03 2020-12-08 한국과학기술원 광소자 및 그의 제조방법
CN110323668B (zh) * 2019-07-05 2020-12-11 清华大学 一种红外窄带辐射器
CN111524993B (zh) * 2020-03-17 2022-05-10 湖北云邦科技有限公司 一种基于量子碳膜的pn结二极管结构及制作方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3748726B2 (ja) * 1999-01-28 2006-02-22 シャープ株式会社 量子細線の製造方法
US7795600B2 (en) * 2006-03-24 2010-09-14 Goldeneye, Inc. Wavelength conversion chip for use with light emitting diodes and method for making same
WO2008023399A1 (en) 2006-08-21 2008-02-28 Fujitsu Limited n-TYPE SEMICONDUCTOR CARBON NANOTUBES, PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF SEMICONDUCTOR DEVICES
WO2008108383A1 (ja) * 2007-03-02 2008-09-12 Nec Corporation グラフェンを用いる半導体装置及びその製造方法
KR101392451B1 (ko) * 2007-06-14 2014-05-08 삼성전자주식회사 그래핀을 이용한 적외선 발광소자
JP2009182173A (ja) * 2008-01-31 2009-08-13 Fujitsu Ltd グラフェントランジスタ及び電子機器
KR101440542B1 (ko) 2008-06-26 2014-09-16 한국과학기술원 전도성 그라핀을 이용한 바이오센서 및 그 제조방법
WO2010006080A2 (en) 2008-07-08 2010-01-14 Chien-Min Sung Graphene and hexagonal boron nitride planes and associated methods
JP5124373B2 (ja) 2008-07-11 2013-01-23 株式会社日立製作所 電子デバイス,受光・発光デバイス、それを用いた電子集積回路および光集積回路
JP5453045B2 (ja) * 2008-11-26 2014-03-26 株式会社日立製作所 グラフェン層が成長された基板およびそれを用いた電子・光集積回路装置
US8278643B2 (en) * 2010-02-02 2012-10-02 Searete Llc Doped graphene electronic materials
US8236626B2 (en) * 2010-04-15 2012-08-07 The Board Of Trustees Of The Leland Stanford Junior University Narrow graphene nanoribbons from carbon nanotubes

Also Published As

Publication number Publication date
CN102403430B (zh) 2016-08-03
CN102403430A (zh) 2012-04-04
JP2012064944A (ja) 2012-03-29
US20120068152A1 (en) 2012-03-22
US9166099B2 (en) 2015-10-20

Similar Documents

Publication Publication Date Title
JP5904734B2 (ja) グラフェン発光素子及びその製造方法
KR101850538B1 (ko) 그래핀 발광소자 및 그 제조방법
CN108064420B (zh) 异质结及由其衍生的电子器件
Gao et al. Synthesis and development of graphene–inorganic semiconductor nanocomposites
Xu et al. Recent progress in fabrication techniques of graphene nanoribbons
Qiao et al. Light-emitting diodes fabricated from small-size ZnO quantum dots
US20120261644A1 (en) Structure and method of making graphene nanoribbons
Eo et al. Enhanced DC-operated electroluminescence of forwardly aligned p/MQW/n InGaN nanorod LEDs via DC offset-AC dielectrophoresis
KR20130009141A (ko) 광전자소자
Sun et al. Molecular doping of blue phosphorene: a first-principles investigation
Lee et al. Dielectrophoretic assembly of GaN nanowires for UV sensor applications
Yang et al. Quantum dots in two-dimensional perovskite matrices for efficient near-infrared light emission
KR20120067157A (ko) 발광소자 및 그 제조방법
Ye et al. Multicolor graphene nanoribbon/semiconductor nanowire heterojunction light-emitting diodes
KR101283538B1 (ko) 표면 플라즈몬 공명을 이용하여 발광 특성이 향상된 발광소자
Fu et al. Monolayer transition metal disulfide: Synthesis, characterization and applications
Cook et al. Inkjet-printed imbedded graphene nanoplatelet/zinc oxide bulk heterojunctions nanocomposite films for ultraviolet photodetection
KR20130022087A (ko) 발광 소자 및 그 제조 방법
Chen et al. N-ZnO nanorod arrays/p-GaN light-emitting diodes with graphene transparent electrode
JP2009283303A (ja) カーボンナノチューブ発光素子、及び、その製造方法
KR102027042B1 (ko) 육방정계 질화붕소 내부에 형성된 그래핀 양자점 배열 및 그 제조방법, 그를 포함하는 전자 소자
US20050017251A1 (en) IR-light emitters based on SWNT's (single walled carbon nanotubes), semiconducting SWNTs-light emitting diodes and lasers
Deka et al. p-Type and n-type azobenzene nanocluster immobilized graphene oxide nanocomposite
Abid et al. Intriguing optoelectronic and visible-light activated photocatalytic properties of 2D AlN/GaN and TMDCs (MX2; M= Mo/W, X= S/Se) monolayers and their bilayer vdWs heterostructures
Meng et al. Novel GaN-based nanocomposites: Effective band structure and optical property tuning by tensile strain or external field

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20120814

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120910

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20130321

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140716

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150518

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150526

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150825

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151013

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160113

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160308

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160315

R150 Certificate of patent or registration of utility model

Ref document number: 5904734

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250