JP5901656B2 - 太陽電池およびその製造方法｛ｓｏｌａｒｃｅｌｌａｎｄｍａｎｕｆａｃｔｕｒｉｎｇｍｅｔｈｏｄｏｆｔｈｅｓａｍｅ｝ - Google Patents

太陽電池およびその製造方法｛ｓｏｌａｒｃｅｌｌａｎｄｍａｎｕｆａｃｔｕｒｉｎｇｍｅｔｈｏｄｏｆｔｈｅｓａｍｅ｝ Download PDF

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JP5901656B2
JP5901656B2 JP2013550372A JP2013550372A JP5901656B2 JP 5901656 B2 JP5901656 B2 JP 5901656B2 JP 2013550372 A JP2013550372 A JP 2013550372A JP 2013550372 A JP2013550372 A JP 2013550372A JP 5901656 B2 JP5901656 B2 JP 5901656B2
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Prior art keywords
layer
back electrode
solar cell
electrode layer
substrate
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Expired - Fee Related
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JP2013550372A
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Japanese (ja)
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JP2014503127A (ja
JP2014503127A5 (enExample
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クン リー、ドン
クン リー、ドン
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LG Innotek Co Ltd
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LG Innotek Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/167—Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • H10F19/35—Structures for the connecting of adjacent photovoltaic cells, e.g. interconnections or insulating spacers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H10F77/1694—Thin semiconductor films on metallic or insulating substrates the films including Group I-III-VI materials, e.g. CIS or CIGS
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Photovoltaic Devices (AREA)
JP2013550372A 2011-01-24 2011-10-06 太陽電池およびその製造方法｛ｓｏｌａｒｃｅｌｌａｎｄｍａｎｕｆａｃｔｕｒｉｎｇｍｅｔｈｏｄｏｆｔｈｅｓａｍｅ｝ Expired - Fee Related JP5901656B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020110006989A KR101173401B1 (ko) 2011-01-24 2011-01-24 태양전지 및 그의 제조방법
KR10-2011-0006989 2011-01-24
PCT/KR2011/007397 WO2012102451A1 (en) 2011-01-24 2011-10-06 Solar cell and manufacturing method of the same

Publications (3)

Publication Number Publication Date
JP2014503127A JP2014503127A (ja) 2014-02-06
JP2014503127A5 JP2014503127A5 (enExample) 2014-11-13
JP5901656B2 true JP5901656B2 (ja) 2016-04-13

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JP2013550372A Expired - Fee Related JP5901656B2 (ja) 2011-01-24 2011-10-06 太陽電池およびその製造方法｛ｓｏｌａｒｃｅｌｌａｎｄｍａｎｕｆａｃｔｕｒｉｎｇｍｅｔｈｏｄｏｆｔｈｅｓａｍｅ｝

Country Status (6)

Country Link
US (1) US20130000700A1 (enExample)
EP (1) EP2656395A4 (enExample)
JP (1) JP5901656B2 (enExample)
KR (1) KR101173401B1 (enExample)
CN (1) CN103098231B (enExample)
WO (1) WO2012102451A1 (enExample)

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US7634584B2 (en) 2005-04-27 2009-12-15 Solarflare Communications, Inc. Packet validation in virtual network interface architecture
US20140124028A1 (en) * 2011-06-10 2014-05-08 Kyoung-Bo Kim Solar cell substrate, method for manufacturing same, and solar cell using same
US8763018B2 (en) 2011-08-22 2014-06-24 Solarflare Communications, Inc. Modifying application behaviour
US9391840B2 (en) 2012-05-02 2016-07-12 Solarflare Communications, Inc. Avoiding delayed data
US9391841B2 (en) 2012-07-03 2016-07-12 Solarflare Communications, Inc. Fast linkup arbitration
US9246039B2 (en) 2012-10-12 2016-01-26 International Business Machines Corporation Solar cell with reduced absorber thickness and reduced back surface recombination
CN103904233B (zh) * 2012-12-25 2016-04-20 海洋王照明科技股份有限公司 一种有机电致发光器件及其制备方法
US9426124B2 (en) 2013-04-08 2016-08-23 Solarflare Communications, Inc. Locked down network interface
US10742604B2 (en) 2013-04-08 2020-08-11 Xilinx, Inc. Locked down network interface
EP2809033B1 (en) 2013-05-30 2018-03-21 Solarflare Communications Inc Packet capture in a network
KR20140141791A (ko) * 2013-05-30 2014-12-11 삼성에스디아이 주식회사 태양전지 및 이의 제조방법
US10394751B2 (en) 2013-11-06 2019-08-27 Solarflare Communications, Inc. Programmed input/output mode
US20150206994A1 (en) * 2014-01-23 2015-07-23 Tsmc Solar Ltd. Solar cell front contact with thickness gradient
US9876049B2 (en) 2014-12-05 2018-01-23 Seiko Epson Corporation Photoelectric conversion device, method for manufacturing photoelectric conversion device, and electronic apparatus
CN106024937A (zh) * 2016-06-23 2016-10-12 盐城普兰特新能源有限公司 一种cigs基薄膜太阳能电池及其制备方法
KR102089558B1 (ko) * 2018-07-11 2020-03-16 주식회사 프런티어에너지솔루션 페로브스카이트 태양 전지 모듈
KR102182618B1 (ko) * 2018-07-12 2020-11-24 (주)프런티어에너지솔루션 페로브스카이트 태양 전지 모듈 및 페로브스카이트 태양 전지 모듈 제조 방법

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DE4442824C1 (de) * 1994-12-01 1996-01-25 Siemens Ag Solarzelle mit Chalkopyrit-Absorberschicht
JP2002319686A (ja) * 2001-04-23 2002-10-31 Matsushita Electric Ind Co Ltd 集積型薄膜太陽電池の製造方法
US8828479B2 (en) * 2004-04-09 2014-09-09 Honda Motor Co., Ltd. Process for producing light absorbing layer for chalcopyrite type thin-film solar cell
JP4681352B2 (ja) * 2005-05-24 2011-05-11 本田技研工業株式会社 カルコパイライト型太陽電池
JP4730740B2 (ja) * 2006-01-30 2011-07-20 本田技研工業株式会社 太陽電池およびその製造方法
US8389852B2 (en) * 2006-02-22 2013-03-05 Guardian Industries Corp. Electrode structure for use in electronic device and method of making same
KR101047941B1 (ko) * 2007-10-31 2011-07-11 주식회사 엘지화학 Ｃｉ(ｇ)ｓ 태양전지 후면 전극의 제조방법
KR20100006205A (ko) * 2008-07-09 2010-01-19 (주)텔리오솔라코리아 Ｃｉｇｓ 태양전지 모듈 및 그 제조방법
EP2200097A1 (en) * 2008-12-16 2010-06-23 Saint-Gobain Glass France S.A. Method of manufacturing a photovoltaic device and system for patterning an object
JP4782855B2 (ja) * 2009-03-12 2011-09-28 昭和シェル石油株式会社 化合物系薄膜太陽電池、及びその製造方法
TWI520367B (zh) * 2010-02-09 2016-02-01 陶氏全球科技公司 具透明導電阻擋層之光伏打裝置
JP5602700B2 (ja) * 2010-11-02 2014-10-08 富士フイルム株式会社 光電変換素子およびその製造方法

Also Published As

Publication number Publication date
EP2656395A4 (en) 2017-06-21
CN103098231A (zh) 2013-05-08
CN103098231B (zh) 2016-08-03
JP2014503127A (ja) 2014-02-06
US20130000700A1 (en) 2013-01-03
WO2012102451A1 (en) 2012-08-02
EP2656395A1 (en) 2013-10-30
KR101173401B1 (ko) 2012-08-10
KR20120085573A (ko) 2012-08-01

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