JP5874904B2 - 液晶表示素子の製造方法 - Google Patents

液晶表示素子の製造方法 Download PDF

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Publication number
JP5874904B2
JP5874904B2 JP2011224238A JP2011224238A JP5874904B2 JP 5874904 B2 JP5874904 B2 JP 5874904B2 JP 2011224238 A JP2011224238 A JP 2011224238A JP 2011224238 A JP2011224238 A JP 2011224238A JP 5874904 B2 JP5874904 B2 JP 5874904B2
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Japan
Prior art keywords
liquid crystal
group
compound
carbon atoms
crystal display
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JP2011224238A
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English (en)
Japanese (ja)
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JP2012141576A (ja
Inventor
吉澤　純司
純司 吉澤
寛 片桐
寛 片桐
石川　暁
暁 石川
哲 平野
哲 平野
純 諫山
純 諫山
光紘 田近
光紘 田近
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JSR Corp
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JSR Corp
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geometry (AREA)
  • Silicon Polymers (AREA)
  • Liquid Crystal (AREA)
JP2011224238A 2010-12-15 2011-10-11 液晶表示素子の製造方法 Active JP5874904B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011224238A JP5874904B2 (ja) 2010-12-15 2011-10-11 液晶表示素子の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010279533 2010-12-15
JP2010279533 2010-12-15
JP2011224238A JP5874904B2 (ja) 2010-12-15 2011-10-11 液晶表示素子の製造方法

Publications (2)

Publication Number Publication Date
JP2012141576A JP2012141576A (ja) 2012-07-26
JP5874904B2 true JP5874904B2 (ja) 2016-03-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011224238A Active JP5874904B2 (ja) 2010-12-15 2011-10-11 液晶表示素子の製造方法

Country Status (4)

Country Link
JP (1) JP5874904B2 (zh)
KR (1) KR101887495B1 (zh)
CN (1) CN102540543B (zh)
TW (1) TWI563040B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2950137B1 (en) * 2013-01-25 2019-06-26 LG Chem, Ltd. Liquid crystal device
KR102018163B1 (ko) * 2013-02-07 2019-09-04 제이에스알 가부시끼가이샤 액정 배향제, 액정 배향막 그리고 액정 표시 소자 및 그의 제조 방법
CN105556380B (zh) * 2013-09-20 2017-03-22 Dic株式会社 液晶显示元件及其制造方法
WO2015087775A1 (ja) * 2013-12-11 2015-06-18 Dic株式会社 液晶表示素子及びその製造方法
JP6296320B2 (ja) * 2015-10-01 2018-03-20 Dic株式会社 液晶表示素子及びその製造方法
WO2017213809A1 (en) * 2016-06-10 2017-12-14 Dow Corning Corporation Non-linear side chain liquid crystal polyorganosiloxanes and methods for their preparation and use in electro-optic applications and devices
TWI742285B (zh) * 2017-06-06 2021-10-11 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜、積層體、硬化膜的製造方法及半導體裝置
CN112748648B (zh) * 2020-12-22 2022-07-29 北京遥测技术研究所 一种用于提升石英微机械三维结构对准精度的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05107544A (ja) 1991-10-14 1993-04-30 Nec Corp 液晶表示素子とその製造方法
EP1818354B1 (en) * 2006-01-30 2010-10-20 JSR Corporation Liquid crystal aligning agent, alignment film and liquid crystal display device
KR20100032324A (ko) * 2008-09-17 2010-03-25 삼성전자주식회사 액정 표시 장치 및 그 제조 방법
JP5668904B2 (ja) 2008-09-18 2015-02-12 Jsr株式会社 液晶配向剤および液晶表示素子
JP5354161B2 (ja) * 2008-10-17 2013-11-27 Ｊｓｒ株式会社 液晶配向剤および液晶表示素子
JP5454772B2 (ja) * 2008-11-17 2014-03-26 Ｊｓｒ株式会社 液晶配向剤、液晶配向膜およびその形成方法ならびに液晶表示素子
JP5311054B2 (ja) * 2009-02-19 2013-10-09 Ｊｓｒ株式会社 液晶配向剤、液晶表示素子およびその製造方法
TWI564339B (zh) * 2010-06-30 2017-01-01 Nissan Chemical Ind Ltd A polymerizable compound, a liquid crystal alignment agent, a liquid crystal alignment film, and a liquid crystal display device, and a method of manufacturing the liquid crystal display device

Also Published As

Publication number Publication date
CN102540543A (zh) 2012-07-04
TW201300470A (zh) 2013-01-01
CN102540543B (zh) 2016-05-18
KR101887495B1 (ko) 2018-08-10
TWI563040B (en) 2016-12-21
KR20120067304A (ko) 2012-06-25
JP2012141576A (ja) 2012-07-26

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