TWI563040B - Method of manufacturing liquid crystal display element, liquid crystal display element and polymer composition - Google Patents
Method of manufacturing liquid crystal display element, liquid crystal display element and polymer compositionInfo
- Publication number
- TWI563040B TWI563040B TW100146095A TW100146095A TWI563040B TW I563040 B TWI563040 B TW I563040B TW 100146095 A TW100146095 A TW 100146095A TW 100146095 A TW100146095 A TW 100146095A TW I563040 B TWI563040 B TW I563040B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- crystal display
- display element
- polymer composition
- manufacturing
- Prior art date
Links
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Geometry (AREA)
- Silicon Polymers (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010279533 | 2010-12-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201300470A TW201300470A (en) | 2013-01-01 |
TWI563040B true TWI563040B (en) | 2016-12-21 |
Family
ID=46347784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100146095A TWI563040B (en) | 2010-12-15 | 2011-12-14 | Method of manufacturing liquid crystal display element, liquid crystal display element and polymer composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5874904B2 (en) |
KR (1) | KR101887495B1 (en) |
CN (1) | CN102540543B (en) |
TW (1) | TWI563040B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2950137B1 (en) * | 2013-01-25 | 2019-06-26 | LG Chem, Ltd. | Liquid crystal device |
KR102018163B1 (en) * | 2013-02-07 | 2019-09-04 | 제이에스알 가부시끼가이샤 | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display device and menufacturing method thereof |
CN105556380B (en) * | 2013-09-20 | 2017-03-22 | Dic株式会社 | Liquid crystal display element and manufacturing method thereof |
WO2015087775A1 (en) * | 2013-12-11 | 2015-06-18 | Dic株式会社 | Liquid crystal display element and method for producing same |
JP6296320B2 (en) * | 2015-10-01 | 2018-03-20 | Dic株式会社 | Liquid crystal display element and manufacturing method thereof |
WO2017213809A1 (en) * | 2016-06-10 | 2017-12-14 | Dow Corning Corporation | Non-linear side chain liquid crystal polyorganosiloxanes and methods for their preparation and use in electro-optic applications and devices |
TWI742285B (en) * | 2017-06-06 | 2021-10-11 | 日商富士軟片股份有限公司 | Photosensitive resin composition, cured film, laminate, cured film manufacturing method and semiconductor device |
CN112748648B (en) * | 2020-12-22 | 2022-07-29 | 北京遥测技术研究所 | Method for improving alignment precision of three-dimensional structure of quartz micro-machine |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010032946A2 (en) * | 2008-09-17 | 2010-03-25 | Samsung Electronics Co., Ltd. | Alignment material, alignment layer, liquid crystal display device and manufacturing method thereof |
CN101812304A (en) * | 2009-02-19 | 2010-08-25 | Jsr株式会社 | Liquid crystal aligning agent, liquid crystal display device and manufacture method thereof |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05107544A (en) | 1991-10-14 | 1993-04-30 | Nec Corp | Liquid crystal display element and its production |
EP1818354B1 (en) * | 2006-01-30 | 2010-10-20 | JSR Corporation | Liquid crystal aligning agent, alignment film and liquid crystal display device |
JP5668904B2 (en) | 2008-09-18 | 2015-02-12 | Jsr株式会社 | Liquid crystal aligning agent and liquid crystal display element |
JP5354161B2 (en) * | 2008-10-17 | 2013-11-27 | Jsr株式会社 | Liquid crystal aligning agent and liquid crystal display element |
JP5454772B2 (en) * | 2008-11-17 | 2014-03-26 | Jsr株式会社 | Liquid crystal aligning agent, liquid crystal aligning film, method for forming the same, and liquid crystal display element |
TWI564339B (en) * | 2010-06-30 | 2017-01-01 | Nissan Chemical Ind Ltd | A polymerizable compound, a liquid crystal alignment device, a liquid crystal alignment film, and a liquid crystal display device, and a method of manufacturing the liquid crystal display device |
-
2011
- 2011-10-11 JP JP2011224238A patent/JP5874904B2/en active Active
- 2011-12-14 CN CN201110430841.2A patent/CN102540543B/en active Active
- 2011-12-14 TW TW100146095A patent/TWI563040B/en active
- 2011-12-15 KR KR1020110135163A patent/KR101887495B1/en active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010032946A2 (en) * | 2008-09-17 | 2010-03-25 | Samsung Electronics Co., Ltd. | Alignment material, alignment layer, liquid crystal display device and manufacturing method thereof |
CN101812304A (en) * | 2009-02-19 | 2010-08-25 | Jsr株式会社 | Liquid crystal aligning agent, liquid crystal display device and manufacture method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN102540543A (en) | 2012-07-04 |
TW201300470A (en) | 2013-01-01 |
CN102540543B (en) | 2016-05-18 |
KR101887495B1 (en) | 2018-08-10 |
KR20120067304A (en) | 2012-06-25 |
JP5874904B2 (en) | 2016-03-02 |
JP2012141576A (en) | 2012-07-26 |
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