JP5852619B2 - 非晶質炭素含有皮膜 - Google Patents
非晶質炭素含有皮膜 Download PDFInfo
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- JP5852619B2 JP5852619B2 JP2013196793A JP2013196793A JP5852619B2 JP 5852619 B2 JP5852619 B2 JP 5852619B2 JP 2013196793 A JP2013196793 A JP 2013196793A JP 2013196793 A JP2013196793 A JP 2013196793A JP 5852619 B2 JP5852619 B2 JP 5852619B2
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- 229910003481 amorphous carbon Inorganic materials 0.000 title claims description 151
- 238000000576 coating method Methods 0.000 title claims description 11
- 239000011248 coating agent Substances 0.000 title claims description 10
- 239000010410 layer Substances 0.000 claims description 129
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 45
- 239000000463 material Substances 0.000 claims description 34
- 238000005520 cutting process Methods 0.000 claims description 24
- 229910000831 Steel Inorganic materials 0.000 claims description 22
- 239000010959 steel Substances 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- 239000011247 coating layer Substances 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 238000005430 electron energy loss spectroscopy Methods 0.000 claims description 12
- 238000004458 analytical method Methods 0.000 claims description 9
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 7
- 238000001228 spectrum Methods 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims description 4
- 238000004611 spectroscopical analysis Methods 0.000 claims description 2
- 239000011368 organic material Substances 0.000 description 7
- 229910003460 diamond Inorganic materials 0.000 description 6
- 239000010432 diamond Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000012778 molding material Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000000619 electron energy-loss spectrum Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- -1 ferrous metals Chemical class 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000011195 cermet Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002173 cutting fluid Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001678 elastic recoil detection analysis Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 239000013212 metal-organic material Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/046—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
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- Carbon And Carbon Compounds (AREA)
Description
記
前記電子エネルギー損失分光分析により測定された電子エネルギー損失分光スペクトルを、次の(1)〜(6)の6つのガウス関数の和であると仮定し、この電子エネルギー損失分光スペクトルをピーク分離した際、Jのピーク強度をIJ、Lのピーク強度をILとしたとき、IJ/ILをXと定義する。
(1)277〜287eVにピークを持つJ
(2)283〜293eVにピークを持つK
(3)289〜299eVにピークを持つL
(4)295〜305eVにピークを持つM
(5)311〜321eVにピークを持つN
(6)325〜335eVにピークを持つP
Claims (4)
- 超硬合金、鉄鋼若しくはセラミックスのいずれかの基材に被覆される膜厚が0.1μm以上1.5μm以下の非晶質炭素含有皮膜であって、膜厚が夫々0.05μm以上の非晶質炭素皮膜層[A]と非晶質炭素皮膜層[B]とが、前記非晶質炭素皮膜層[A]が基材側に、前記非晶質炭素皮膜層[B]が表層側に配置されるように積層して構成され、前記非晶質炭素含有皮膜の断面に電子線を照射して電子エネルギー損失分光分析を行なった場合、下記のように定義するXが、前記非晶質炭素皮膜層[B]より前記非晶質炭素皮膜層[A]の方が大きく、この非晶質炭素皮膜層[A]のXが0.3〜0.5であり、最表層に非晶質炭素皮膜層[C]が設けられ、前記非晶質炭素含有皮膜の断面に電子線を照射して電子エネルギー損失分光分析を行なった場合、前記非晶質炭素皮膜層[C]のXが、前記非晶質炭素皮膜層[B]のXより小さく、前記非晶質炭素含有皮膜は水素を含有せず(不可避不純物を除く)、最下層に金属皮膜層[D]が設けられ、この金属皮膜層[D]は周期表の4a,5a若しくは6a族元素のいずれか1つの金属または2つ以上の金属で構成され、この金属皮膜層[D]の膜厚は0.01μm以上0.1μm以下に設定され、この金属皮膜層[D]の上に前記非晶質炭素皮膜層[A]が設けられていることを特徴とする非晶質炭素含有皮膜。
記
前記電子エネルギー損失分光分析により測定された電子エネルギー損失分光スペクトルを、次の(1)〜(6)の6つのガウス関数の和であると仮定し、この電子エネルギー損失分光スペクトルをピーク分離した際、Jのピーク強度をIJ、Lのピーク強度をILとしたとき、IJ/ILをXと定義する。
(1)277〜287eVにピークを持つJ
(2)283〜293eVにピークを持つK
(3)289〜299eVにピークを持つL
(4)295〜305eVにピークを持つM
(5)311〜321eVにピークを持つN
(6)325〜335eVにピークを持つP - 請求項1記載の非晶質炭素含有皮膜において、前記金属皮膜層[D]はZrで構成されていることを特徴とする非晶質炭素含有皮膜。
- 請求項1,2いずれか1項に記載の非晶質炭素含有皮膜において、前記基材は超硬合金製の切削工具であることを特徴とする非晶質炭素含有皮膜。
- 請求項1,2いずれか1項に記載の非晶質炭素含有皮膜において、前記基材は超硬合金製のルーターであることを特徴とする非晶質炭素含有皮膜。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013196793A JP5852619B2 (ja) | 2013-09-24 | 2013-09-24 | 非晶質炭素含有皮膜 |
EP14185029.7A EP2851451B1 (en) | 2013-09-24 | 2014-09-16 | Amorphous-carbon-containing film |
CN201410482607.8A CN104451540A (zh) | 2013-09-24 | 2014-09-19 | 含非晶碳被膜 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2013196793A JP5852619B2 (ja) | 2013-09-24 | 2013-09-24 | 非晶質炭素含有皮膜 |
Publications (2)
Publication Number | Publication Date |
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JP2015063714A JP2015063714A (ja) | 2015-04-09 |
JP5852619B2 true JP5852619B2 (ja) | 2016-02-03 |
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Application Number | Title | Priority Date | Filing Date |
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JP2013196793A Active JP5852619B2 (ja) | 2013-09-24 | 2013-09-24 | 非晶質炭素含有皮膜 |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2851451B1 (ja) |
JP (1) | JP5852619B2 (ja) |
CN (1) | CN104451540A (ja) |
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WO2023280951A1 (en) * | 2021-07-07 | 2023-01-12 | Lion Alternative Energy PLC | Method and device for producing layered nanocarbon structures |
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US20100211180A1 (en) * | 2006-03-21 | 2010-08-19 | Jet Engineering, Inc. | Tetrahedral Amorphous Carbon Coated Medical Devices |
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