JP6043192B2 - 耐摩耗性に優れた積層皮膜 - Google Patents
耐摩耗性に優れた積層皮膜 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0647—Boron nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Drilling Tools (AREA)
Description
[皮膜A]
組成式が(M1−aSia)(BxCyN1−x−y)(但し、Mは、第4族元素、第5族元素、第6族元素、およびAlよりなる群から選択される1種以上の元素であり、a,x,yはそれぞれ、Si,B,Cの原子比を示す)であり、
0.05≦a≦0.35、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。
[皮膜B]
組成式がL(BxCyN1−x−y)(但し、Lは、W、MoおよびVよりなる群から選択される1種以上の元素であり、x,yはそれぞれ、B,Cの原子比を示す)であり、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。
[皮膜A]
組成式が(M1−aSia)(BxCyN1−x−y)(但し、Mは、第4族元素、第5族元素、第6族元素、およびAlよりなる群から選択される1種以上の元素であり、a,x,yはそれぞれ、Si,B,Cの原子比を示す。以下同じ)であり、
0.05≦a≦0.35、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。
[皮膜B]
組成式がL(BxCyN1−x−y)(但し、Lは、W、MoおよびVよりなる群から選択される1種以上の元素であり、x,yはそれぞれ、B,Cの原子比を示す。以下同じ)であり、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。
本発明の積層皮膜は、上記規定量のSiを含み高硬度を示す皮膜Aと、摺動下において潤滑性の酸化物を形成する皮膜Bとを組み合せることによって、従来の硬質皮膜よりも耐摩耗性を向上できた点に特徴がある。
前記皮膜Aおよび皮膜Bの各機能を発揮させるには、各皮膜が一定以上の厚さを有し、独立した積層状態で存在する必要がある。皮膜A、皮膜Bの各々の膜厚は、1.5nm以上とすることが好ましく、より好ましくは2nm以上、更に好ましくは5nm以上、特に好ましくは10nm以上である。積層皮膜の全膜厚を例えば3μmとした場合、膜厚が1500nmの皮膜Aと、膜厚が1500nmの皮膜Bの2層構造の積層皮膜とすることもできる。しかし、皮膜Aによる高硬度化と皮膜Bによる潤滑膜の効果とを最大限に発揮させるには、積層皮膜が、皮膜Aと皮膜Bのそれぞれが2層以上交互に積層した構造を有していることが好ましい。この観点から、皮膜Aと皮膜Bの膜厚はそれぞれ、100nm以下であることが好ましい。より好ましくは50nm以下、更に好ましくは30nm以下である。
本発明は、前記積層皮膜の形成方法まで規定するものではなく、該積層皮膜は、物理気相成長法(PVD法)や化学気相成長法(CVD法)など公知の方法を用いて製造できる。基材との密着性確保等の観点から、PVD法を用いて製造することが好ましい。具体的には、スパッタリング法や真空蒸着法、イオンプレーティング法などが挙げられる。
実施例1では、皮膜A、皮膜Bの各組成が種々の積層皮膜(皮膜Aと皮膜Bの厚さは一定)を形成し、該組成が耐摩耗性に及ぼす影響について検討した。
上記切削工具表面に成膜したサンプルを用い、下記条件で切削試験を行い、一定距離経過後の境界部摩耗量(外周面摩耗量)を測定して、耐摩耗性を評価した。具体的には、外周面摩耗量が69μm以下の場合を耐摩耗性に優れていると評価した。尚、上記摩耗量は、好ましくは59μm以下、より好ましくは49μm以下である。これらの結果を表1に示す。
被削材:S50C(生材)
切削速度:100m/分
送り:0.24mm/回転
穴深さ:23mm
潤滑:外部給油、エマルジョン
評価条件:1000穴加工後の外周面摩耗量
実施例2では、皮膜Aと皮膜Bの皮膜組成を一定とし、サンプルごとに皮膜Aと皮膜Bの各厚さが異なる皮膜を形成し、この皮膜Aと皮膜Bの厚さが、切削性能に及ぼす影響について検討した。
実施例3では、皮膜Aと皮膜Bの皮膜組成、および皮膜Aの厚さを一定とし、サンプルごとに皮膜Bの厚さが異なる皮膜を形成し、皮膜Bの厚さが、切削性能に及ぼす影響について検討した。
被削材:SCM440(生材)
切削速度:75m/分
送り:0.24mm/回転
穴深さ:23mm
潤滑:外部給油、エマルジョン
評価条件:1000穴加工後の外周面摩耗
実施例4では、本発明の積層皮膜と基材との間に下地層(皮膜A・皮膜B以外の皮膜)を形成した場合の切削性能について検討した。
2 基板ステージ(回転盤)
3 回転テーブル
5 被処理体(基材)
6a,6b アーク蒸発源
6c,6d スパッタ蒸発源
7a,7b,7c,7d ヒータ
8a,8b アーク電源
8c,8d スパッタ電源
9a,9b,9c,9d マスフローコントローラー
10 バイアス電源
11 フィラメント型イオン源
12 フィラメント加熱用交流電源
13 放電用直流電源
Claims (5)
- 基材上に形成される積層皮膜であって、下記の皮膜Aと皮膜Bが各々1層以上積層されていることを特徴とする耐摩耗性に優れた積層皮膜。
[皮膜A]
組成式が(M1−aSia)(BxCyN1−x−y)(但し、Mは、Ti,Cr,Zr,TaおよびAlよりなる群から選択される1種以上の元素であり、a,x,yはそれぞれ、Si,B,Cの原子比を示し、MがTiとAlの組合せである場合は、M+Siに占めるAl量(原子比)は0.25以下である)であり、
0.05≦a≦0.35、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。
[皮膜B]
組成式がL(BxCyN1−x−y)(但し、Lは、W、MoおよびVよりなる群から選択される1種以上の元素であり、x,yはそれぞれ、B,Cの原子比を示す)であり、
0≦x≦0.15、および
0≦y≦0.5を満たす皮膜。 - 前記皮膜Aと前記皮膜Bの膜厚がいずれも1.5nm以上である請求項1に記載の積層皮膜。
- 前記皮膜Aと前記皮膜Bの膜厚がいずれも100nm以下である請求項1または2に記載の積層皮膜。
- 前記皮膜AにおけるMが、Tiのみ、またはTiとAlの組合せ(但し、M+Siに占めるAl量(原子比)は0.25以下)であり、かつ、前記皮膜BにおけるLがVである請求項1〜3のいずれかに記載の積層皮膜。
- 基材と、当該基材を被覆する請求項1〜4のいずれかに記載の積層皮膜とを備えていることを特徴とする切削工具。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013012636A JP6043192B2 (ja) | 2013-01-25 | 2013-01-25 | 耐摩耗性に優れた積層皮膜 |
EP14743313.0A EP2949776A4 (en) | 2013-01-25 | 2014-01-24 | LAMINATED COATING FOIL WITH EXCEPTIONAL ABRASIVE STRENGTH |
PCT/JP2014/051560 WO2014115846A1 (ja) | 2013-01-25 | 2014-01-24 | 耐摩耗性に優れた積層皮膜 |
US14/759,002 US9695514B2 (en) | 2013-01-25 | 2014-01-24 | Laminated coating having excellent abrasion resistance |
KR1020157019949A KR101727420B1 (ko) | 2013-01-25 | 2014-01-24 | 내마모성이 우수한 적층 피막 |
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JP2013012636A JP6043192B2 (ja) | 2013-01-25 | 2013-01-25 | 耐摩耗性に優れた積層皮膜 |
Publications (2)
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JP2014145091A JP2014145091A (ja) | 2014-08-14 |
JP6043192B2 true JP6043192B2 (ja) | 2016-12-14 |
Family
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JP2013012636A Active JP6043192B2 (ja) | 2013-01-25 | 2013-01-25 | 耐摩耗性に優れた積層皮膜 |
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Country | Link |
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US (1) | US9695514B2 (ja) |
EP (1) | EP2949776A4 (ja) |
JP (1) | JP6043192B2 (ja) |
KR (1) | KR101727420B1 (ja) |
WO (1) | WO2014115846A1 (ja) |
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WO2017110464A1 (ja) * | 2015-12-24 | 2017-06-29 | コニカミノルタ株式会社 | 成膜装置および成膜方法 |
EP3828308A1 (en) * | 2019-11-29 | 2021-06-02 | Toto Ltd. | Wet-area device and method for manufacturing wet-area device |
Family Cites Families (11)
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DE69319531T2 (de) * | 1992-10-12 | 1999-04-15 | Sumitomo Electric Industries, Ltd., Osaka | Ultradünnes Filmlaminat |
DE69527236T2 (de) * | 1994-09-16 | 2003-03-20 | Sumitomo Electric Industries, Ltd. | Mehrschichtfilm aus ultrafeinen Partikeln und harter Verbundwerkstoff für Werkzeuge, die diesen Film enthalten |
SE518145C2 (sv) * | 1997-04-18 | 2002-09-03 | Sandvik Ab | Multiskiktbelagt skärverktyg |
JP3996809B2 (ja) | 2002-07-11 | 2007-10-24 | 住友電工ハードメタル株式会社 | 被覆切削工具 |
CN100419117C (zh) * | 2004-02-02 | 2008-09-17 | 株式会社神户制钢所 | 硬质叠层被膜、其制造方法及成膜装置 |
JP4408231B2 (ja) * | 2004-03-11 | 2010-02-03 | 株式会社神戸製鋼所 | 硬質積層皮膜および硬質積層皮膜の形成方法 |
JP4699978B2 (ja) * | 2006-08-09 | 2011-06-15 | 株式会社神戸製鋼所 | 硬質皮膜被覆材 |
JP5483071B2 (ja) * | 2009-10-27 | 2014-05-07 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JP5483072B2 (ja) * | 2009-10-27 | 2014-05-07 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JP5804589B2 (ja) * | 2010-02-10 | 2015-11-04 | 日立金属株式会社 | 摺動特性に優れた被覆金型または鋳造用部材及びその製造方法 |
JP2012061554A (ja) * | 2010-09-16 | 2012-03-29 | Mitsubishi Materials Corp | 表面被覆切削工具 |
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2013
- 2013-01-25 JP JP2013012636A patent/JP6043192B2/ja active Active
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2014
- 2014-01-24 EP EP14743313.0A patent/EP2949776A4/en not_active Withdrawn
- 2014-01-24 WO PCT/JP2014/051560 patent/WO2014115846A1/ja active Application Filing
- 2014-01-24 KR KR1020157019949A patent/KR101727420B1/ko active IP Right Grant
- 2014-01-24 US US14/759,002 patent/US9695514B2/en active Active
Also Published As
Publication number | Publication date |
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KR101727420B1 (ko) | 2017-04-14 |
EP2949776A1 (en) | 2015-12-02 |
US9695514B2 (en) | 2017-07-04 |
US20150361562A1 (en) | 2015-12-17 |
KR20150100850A (ko) | 2015-09-02 |
EP2949776A4 (en) | 2016-08-24 |
WO2014115846A1 (ja) | 2014-07-31 |
JP2014145091A (ja) | 2014-08-14 |
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