JP5848320B2 - 円筒基材、原盤、及び原盤の製造方法 - Google Patents

円筒基材、原盤、及び原盤の製造方法 Download PDF

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Publication number
JP5848320B2
JP5848320B2 JP2013264358A JP2013264358A JP5848320B2 JP 5848320 B2 JP5848320 B2 JP 5848320B2 JP 2013264358 A JP2013264358 A JP 2013264358A JP 2013264358 A JP2013264358 A JP 2013264358A JP 5848320 B2 JP5848320 B2 JP 5848320B2
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JP
Japan
Prior art keywords
master
base material
cylindrical base
cylindrical
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013264358A
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English (en)
Japanese (ja)
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JP2015120611A (ja
JP2015120611A5 (enExample
Inventor
穣 村本
穣 村本
正尚 菊池
正尚 菊池
俊一 梶谷
俊一 梶谷
孝聡 音羽
孝聡 音羽
高橋　康弘
康弘 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Dexerials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2013264358A priority Critical patent/JP5848320B2/ja
Application filed by Dexerials Corp filed Critical Dexerials Corp
Priority to KR1020157035938A priority patent/KR101635338B1/ko
Priority to PCT/JP2014/082171 priority patent/WO2015093308A1/ja
Priority to US15/026,509 priority patent/US10207470B2/en
Priority to DE112014004375.3T priority patent/DE112014004375B4/de
Priority to TW103142131A priority patent/TWI530467B/zh
Priority to CN201480043133.5A priority patent/CN105408265B/zh
Priority to CN201711174780.1A priority patent/CN107894691A/zh
Publication of JP2015120611A publication Critical patent/JP2015120611A/ja
Publication of JP2015120611A5 publication Critical patent/JP2015120611A5/ja
Application granted granted Critical
Publication of JP5848320B2 publication Critical patent/JP5848320B2/ja
Priority to US15/950,596 priority patent/US11090886B2/en
Priority to US17/393,963 priority patent/US12097675B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/24—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length
    • B29C41/28—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length by depositing flowable material on an endless belt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2909/00—Use of inorganic materials not provided for in groups B29K2803/00 - B29K2807/00, as mould material
    • B29K2909/08—Glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Ophthalmology & Optometry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Materials For Photolithography (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
JP2013264358A 2013-12-20 2013-12-20 円筒基材、原盤、及び原盤の製造方法 Active JP5848320B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2013264358A JP5848320B2 (ja) 2013-12-20 2013-12-20 円筒基材、原盤、及び原盤の製造方法
CN201711174780.1A CN107894691A (zh) 2013-12-20 2014-12-04 圆筒基体材料、原盘及原盘的制造方法
US15/026,509 US10207470B2 (en) 2013-12-20 2014-12-04 Cylindrical base, master and master manufacturing method
DE112014004375.3T DE112014004375B4 (de) 2013-12-20 2014-12-04 Zylindrische Basis, Master, Verfahren zur Herstellung eines Masters und Verfahren zur Herstellung eines optischen Elements
TW103142131A TWI530467B (zh) 2013-12-20 2014-12-04 A method for manufacturing a cylindrical substrate, a master disk and a master disk
CN201480043133.5A CN105408265B (zh) 2013-12-20 2014-12-04 圆筒基体材料、原盘及原盘的制造方法
KR1020157035938A KR101635338B1 (ko) 2013-12-20 2014-12-04 원통 기재, 원반 및 원반의 제조 방법
PCT/JP2014/082171 WO2015093308A1 (ja) 2013-12-20 2014-12-04 円筒基材、原盤、及び原盤の製造方法
US15/950,596 US11090886B2 (en) 2013-12-20 2018-04-11 Cylindrical base, master and master manufacturing method
US17/393,963 US12097675B2 (en) 2013-12-20 2021-08-04 Cylindrical base, master and master manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013264358A JP5848320B2 (ja) 2013-12-20 2013-12-20 円筒基材、原盤、及び原盤の製造方法

Publications (3)

Publication Number Publication Date
JP2015120611A JP2015120611A (ja) 2015-07-02
JP2015120611A5 JP2015120611A5 (enExample) 2015-10-29
JP5848320B2 true JP5848320B2 (ja) 2016-01-27

Family

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JP2013264358A Active JP5848320B2 (ja) 2013-12-20 2013-12-20 円筒基材、原盤、及び原盤の製造方法

Country Status (7)

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US (3) US10207470B2 (enExample)
JP (1) JP5848320B2 (enExample)
KR (1) KR101635338B1 (enExample)
CN (2) CN105408265B (enExample)
DE (1) DE112014004375B4 (enExample)
TW (1) TWI530467B (enExample)
WO (1) WO2015093308A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6818479B2 (ja) 2016-09-16 2021-01-20 デクセリアルズ株式会社 原盤の製造方法
WO2019165435A1 (en) * 2018-02-26 2019-08-29 Carpe Diem Technologies, Inc. System and method for constructing a roller-type nanoimprint lithography (rnil) master
TWI822997B (zh) * 2020-05-08 2023-11-21 光群雷射科技股份有限公司 無縫全像圖圖案轉移方法
CN113625526A (zh) * 2020-05-08 2021-11-09 光群雷射科技股份有限公司 无缝全像图图案转移方法
DE102023122606A1 (de) * 2023-08-23 2025-02-27 scia Systems GmbH Optische Linse und Verfahren zum Ionenätzen einer gekrümmten Oberfläche eines Substrats

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4478322B2 (ja) * 2000-11-30 2010-06-09 信越石英株式会社 光学用合成石英ガラスの熱処理用容器および熱処理方法
US20020122902A1 (en) 2000-11-30 2002-09-05 Tetsuji Ueda Blank for an optical member as well as vessel and method of producing the same
JP4366193B2 (ja) * 2002-04-15 2009-11-18 長瀬産業株式会社 スタンパ原盤の製造方法及びスタンパの製造方法
JP2004308822A (ja) * 2003-04-09 2004-11-04 Ntn Corp 円筒ころ軸受
JP2005064143A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器
WO2009148138A1 (ja) * 2008-06-05 2009-12-10 旭硝子株式会社 ナノインプリント用モールド、その製造方法および表面に微細凹凸構造を有する樹脂成形体ならびにワイヤグリッド型偏光子の製造方法
JP4596072B2 (ja) * 2008-12-26 2010-12-08 ソニー株式会社 微細加工体の製造方法、およびエッチング装置
JP5257131B2 (ja) * 2009-02-23 2013-08-07 ソニー株式会社 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法
JP5338536B2 (ja) * 2009-07-16 2013-11-13 コニカミノルタ株式会社 微細な凹凸パターンを有するフィルム構造体、太陽エネルギー収集用プリズムシート及び立体視ディスプレイ用光学フィルム
JP5664471B2 (ja) * 2010-06-28 2015-02-04 信越化学工業株式会社 半導体用合成石英ガラス基板の製造方法
WO2013077266A1 (ja) * 2011-11-22 2013-05-30 旭化成株式会社 熱反応型レジスト材料、モールドの製造方法、モールド、現像方法およびパターン形成材料
DE102012000418A1 (de) 2011-12-23 2013-06-27 J-Plasma Gmbh Verfahren zum Herstellen von Stablinsen und Vorrichtung hierfür

Also Published As

Publication number Publication date
TW201529505A (zh) 2015-08-01
US12097675B2 (en) 2024-09-24
CN107894691A (zh) 2018-04-10
DE112014004375T5 (de) 2016-06-09
US20180281239A1 (en) 2018-10-04
US20160214282A1 (en) 2016-07-28
JP2015120611A (ja) 2015-07-02
KR20160009066A (ko) 2016-01-25
KR101635338B1 (ko) 2016-06-30
DE112014004375B4 (de) 2017-03-16
CN105408265A (zh) 2016-03-16
US11090886B2 (en) 2021-08-17
US10207470B2 (en) 2019-02-19
TWI530467B (zh) 2016-04-21
WO2015093308A1 (ja) 2015-06-25
US20210387429A1 (en) 2021-12-16
CN105408265B (zh) 2018-03-27

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