JP5809410B2 - マイクロ秒x線強度切換えのためのx線管 - Google Patents
マイクロ秒x線強度切換えのためのx線管 Download PDFInfo
- Publication number
- JP5809410B2 JP5809410B2 JP2010275191A JP2010275191A JP5809410B2 JP 5809410 B2 JP5809410 B2 JP 5809410B2 JP 2010275191 A JP2010275191 A JP 2010275191A JP 2010275191 A JP2010275191 A JP 2010275191A JP 5809410 B2 JP5809410 B2 JP 5809410B2
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- Prior art keywords
- emitter
- electron beam
- target
- injector
- extraction electrode
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/045—Electrodes for controlling the current of the cathode ray, e.g. control grids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/147—Spot size control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/153—Spot position control
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- X-Ray Techniques (AREA)
Description
12 ガントリ
14 X線源
16 X線
18 検出器アレイ
20 複数の検出器
22 患者
24 回転中心
26 制御機構
28 X線制御器
30 ガントリ・モータ制御器
32 データ取得システム
34 画像再構成器
36 コンピュータ
38 大容量記憶装置
40 コンソール
42 表示器
44 テーブル・モータ制御器
46 コンベヤ・システム/テーブル
48 ガントリ開口
50 X線管
52 入射器
53 入射器壁
54 真空壁
56 アノード/ターゲット
58 放出器
60 放出器支持体
64 電子ビーム
66 電圧源
68 高電圧フィードスルー
70 集束電極
72 管外被
74 引出し電極
76 電場
78 高電圧主電場
80 磁気アセンブリ
82 電子収集器
84 X線
86 X線窓
90 バイアス電圧源
92 制御電子回路モジュール
100 X線管
102 入射器
104 熱イオン電子源
106 電圧源
108 加熱電子ビーム
110 放出器
112 電子ビーム
Claims (10)
- ターゲット(56)に向けて電子ビーム(64)を放出する放出器(58)と、
該放出器(58)の周りに配設されて前記電子ビーム(64)を集束させる少なくとも一つの集束電極(70)と、
前記放出器(58)と前記ターゲットの間に配置される少なくとも一つの引出し電極(74)であって、前記少なくとも一つの引出し電極(74)と前記少なくとも一つの集束電極(70)との間に発生する電場(76)の強度を制御することにより、前記電子ビーム(64)の強度を制御する少なくとも一つの引出し電極(74)と
を備え、
前記少なくとも一つの引出し電極(74)が、前記電子ビーム(64)が通る開口部と、該開口部に配置され、前記少なくとも一つの集束電極(70)に向かって突出する円筒部とを備え、
強度の高い前記電子ビーム(64)を発生させるときに、前記少なくとも一つの引出し電極(74)に、前記放出器(58)に関して相対的に正となるようにバイアスが印加され、
前記電子ビーム(64)を遮断するときに、前記少なくとも一つの引出し電極(74)に、前記放出器(58)に関して相対的に負となるようにバイアスが印加される、
X線管(50)用の入射器(52)。 - 前記電子ビーム(64)を発生するように、前記放出器(58)に衝突する加熱電子ビーム(108)を発生する少なくとも一つの熱電子源(104)をさらに含んでいる請求項1に記載の入射器(52)。
- 前記放出器(58)を支持する放出器支持体(60)と、
前記放出器支持体(60)を支持し、前記少なくとも一つの集束電極(70)を封入し、前記少なくとも一つの引出し電極(74)を囲む入射器壁(53)と、
を備える、請求項1または2に記載の入射器(52)。 - 前記放出器(58)は、タングステン、トリウム入りタングステン、及び六ホウ化ランタンのいずれかを含んでいる、請求項1乃至3のいずれかに記載の入射器(52)。
- 前記放出器(58)は、曲面型放出器又は、平面型放出器である、請求項1乃至4のいずれかに記載の入射器(52)。
- 前記集束電極(70)は、前記放出器(58)に対して負の電圧にあるバイアスを印加される、請求項1乃至5のいずれかに記載の入射器(52)。
- 請求項1乃至6のいずれかに記載の入射器(52)と、
前記電子ビーム(64)により衝突されるとX線(84)を発生する前記ターゲット(56)と、
前記入射器(52)と前記ターゲット(56)との間に位置して、前記電子ビーム(64)を前記ターゲット(56)へ向けて集束、偏向及び/又は配置するのに指向的に作用する磁気アセンブリ(80)と
を備えたX線管(50)。 - 前記少なくとも一つの引出し電極(74)に印加されるバイアス電圧を供給するバイアス電圧電源(90)と、
前記少なくとも一つの引出し電極(74)に印加される前記バイアス電圧が少なくとも150ミリ秒の間隔で変化するように制御する制御電子回路モジュール(92)と、
を含む、請求項7に記載のX線管(50)。 - 前記ターゲット(56)から後方散乱された電子を収集する電子収集器(82)をさらに含んでいる請求項7または8に記載のX線管(50)。
- ガントリ(12)と、
該ガントリ(12)に結合されたX線管(50)であって、
管外被(72)と、
請求項1乃至6のいずれかに記載の入射器(52)と、
前記電子ビーム(64)により衝突されるとX線(84)を発生するターゲット(56)と、
前記入射器(52)と前記ターゲット(56)との間に位置して、前記電子ビーム(64)を前記ターゲット(56)へ向けて集束、偏向及び/又は配置するのに指向的に作用する磁気アセンブリ(80)と
を含んでいるX線管(50)と、
該X線管(50)に電力及びタイミング信号を供給するX線制御器(28)と、
撮像対象(22)からの減弱されたX線ビームを検出する1又は複数の検出器素子(20)と
を備えた計算機式断層写真法システム(10)。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/639,206 US8401151B2 (en) | 2009-12-16 | 2009-12-16 | X-ray tube for microsecond X-ray intensity switching |
US12/639,206 | 2009-12-16 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011129518A JP2011129518A (ja) | 2011-06-30 |
JP2011129518A5 JP2011129518A5 (ja) | 2014-01-30 |
JP5809410B2 true JP5809410B2 (ja) | 2015-11-10 |
Family
ID=44142902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010275191A Active JP5809410B2 (ja) | 2009-12-16 | 2010-12-10 | マイクロ秒x線強度切換えのためのx線管 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8401151B2 (ja) |
JP (1) | JP5809410B2 (ja) |
DE (1) | DE102010060869A1 (ja) |
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DE102011075453A1 (de) * | 2011-05-06 | 2012-11-08 | Siemens Aktiengesellschaft | Röntgenröhre und Verfahren zum Betrieb einer Röntgenröhre |
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2009
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2010
- 2010-11-29 DE DE102010060869A patent/DE102010060869A1/de not_active Withdrawn
- 2010-12-10 JP JP2010275191A patent/JP5809410B2/ja active Active
Also Published As
Publication number | Publication date |
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JP2011129518A (ja) | 2011-06-30 |
DE102010060869A1 (de) | 2011-06-22 |
US8401151B2 (en) | 2013-03-19 |
US20110142193A1 (en) | 2011-06-16 |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |