JP5805851B2 - リソグラフィシステムにおいて基板を処理する方法 - Google Patents

リソグラフィシステムにおいて基板を処理する方法 Download PDF

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Publication number
JP5805851B2
JP5805851B2 JP2014506911A JP2014506911A JP5805851B2 JP 5805851 B2 JP5805851 B2 JP 5805851B2 JP 2014506911 A JP2014506911 A JP 2014506911A JP 2014506911 A JP2014506911 A JP 2014506911A JP 5805851 B2 JP5805851 B2 JP 5805851B2
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substrate
unit
robot
load lock
clamped
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Expired - Fee Related
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Japanese (ja)
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JP2014513429A5 (enExample
JP2014513429A (ja
Inventor
クイパー、ビンセント・シルベスター
スロット、アーウィン
ファン・ケルビンック、マルセル・ニコラース・ヤコブス
デ・ボア、ギード
デ・ヨン、ヘンドリク・ヤン
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マッパー・リソグラフィー・アイピー・ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • H10P72/0458—
    • H10P72/0474—
    • H10P72/3304—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014506911A 2011-04-28 2012-05-01 リソグラフィシステムにおいて基板を処理する方法 Expired - Fee Related JP5805851B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161480163P 2011-04-28 2011-04-28
US61/480,163 2011-04-28
PCT/EP2012/057955 WO2012146788A1 (en) 2011-04-28 2012-05-01 Method of processing a substrate in a lithography system

Publications (3)

Publication Number Publication Date
JP2014513429A JP2014513429A (ja) 2014-05-29
JP2014513429A5 JP2014513429A5 (enExample) 2015-03-12
JP5805851B2 true JP5805851B2 (ja) 2015-11-10

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JP2014506911A Expired - Fee Related JP5805851B2 (ja) 2011-04-28 2012-05-01 リソグラフィシステムにおいて基板を処理する方法
JP2014506912A Active JP5787331B2 (ja) 2011-04-28 2012-05-01 リソグラフィシステムにおいて基板を搬送するための装置

Family Applications After (1)

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JP2014506912A Active JP5787331B2 (ja) 2011-04-28 2012-05-01 リソグラフィシステムにおいて基板を搬送するための装置

Country Status (7)

Country Link
US (4) US8936994B2 (enExample)
EP (1) EP2702452B1 (enExample)
JP (2) JP5805851B2 (enExample)
KR (4) KR101607618B1 (enExample)
CN (3) CN106896650A (enExample)
TW (2) TWI486723B (enExample)
WO (2) WO2012146788A1 (enExample)

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Also Published As

Publication number Publication date
KR20160047590A (ko) 2016-05-02
CN103649837A (zh) 2014-03-19
EP2702452B1 (en) 2016-08-03
US20130034421A1 (en) 2013-02-07
US20160004173A1 (en) 2016-01-07
US9575418B2 (en) 2017-02-21
CN106919006A (zh) 2017-07-04
TWI514089B (zh) 2015-12-21
WO2012146789A1 (en) 2012-11-01
KR20140041501A (ko) 2014-04-04
JP2014513429A (ja) 2014-05-29
US20130044305A1 (en) 2013-02-21
CN106896650A (zh) 2017-06-27
TW201250402A (en) 2012-12-16
USRE48903E1 (en) 2022-01-25
KR101892460B1 (ko) 2018-08-28
CN106919006B (zh) 2020-03-13
US9176397B2 (en) 2015-11-03
CN103649837B (zh) 2017-04-12
EP2702452A1 (en) 2014-03-05
KR20180031082A (ko) 2018-03-27
KR101614475B1 (ko) 2016-04-21
WO2012146788A1 (en) 2012-11-01
KR101607618B1 (ko) 2016-04-11
TW201250403A (en) 2012-12-16
US8936994B2 (en) 2015-01-20
TWI486723B (zh) 2015-06-01
JP5787331B2 (ja) 2015-09-30
KR20140025495A (ko) 2014-03-04
JP2014514769A (ja) 2014-06-19

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