JP5767395B2 - 新規な化合物半導体及びその活用 - Google Patents
新規な化合物半導体及びその活用 Download PDFInfo
- Publication number
- JP5767395B2 JP5767395B2 JP2014503613A JP2014503613A JP5767395B2 JP 5767395 B2 JP5767395 B2 JP 5767395B2 JP 2014503613 A JP2014503613 A JP 2014503613A JP 2014503613 A JP2014503613 A JP 2014503613A JP 5767395 B2 JP5767395 B2 JP 5767395B2
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- JP
- Japan
- Prior art keywords
- thermoelectric conversion
- compound semiconductor
- present
- chemical formula
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000001875 compounds Chemical class 0.000 title description 53
- 239000004065 semiconductor Substances 0.000 title description 52
- 238000006243 chemical reaction Methods 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 27
- 239000000126 substance Substances 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 229910020599 Co 3 O 4 Inorganic materials 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000872 buffer Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
- C01G51/006—Compounds containing, besides cobalt, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/002—Compounds containing, besides selenium or tellurium, more than one other element, with -O- and -OH not being considered as anions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G30/00—Compounds of antimony
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/853—Thermoelectric active materials comprising inorganic compositions comprising arsenic, antimony or bismuth
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
- C01P2002/52—Solid solutions containing elements as dopants
- C01P2002/54—Solid solutions containing elements as dopants one element only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0045348 | 2011-05-13 | ||
KR10-2011-0045349 | 2011-05-13 | ||
KR20110045348 | 2011-05-13 | ||
KR20110045349 | 2011-05-13 | ||
KR20110049609 | 2011-05-25 | ||
KR10-2011-0049609 | 2011-05-25 | ||
KR10-2012-0050259 | 2012-05-11 | ||
KR1020120050259A KR101380945B1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
PCT/KR2012/003727 WO2012157905A1 (ko) | 2011-05-13 | 2012-05-11 | 신규한 화합물 반도체 및 그 활용 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014516901A JP2014516901A (ja) | 2014-07-17 |
JP5767395B2 true JP5767395B2 (ja) | 2015-08-19 |
Family
ID=47177144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014503613A Active JP5767395B2 (ja) | 2011-05-13 | 2012-05-11 | 新規な化合物半導体及びその活用 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8496856B2 (de) |
EP (1) | EP2708502B1 (de) |
JP (1) | JP5767395B2 (de) |
KR (1) | KR101380945B1 (de) |
CN (1) | CN103502143B (de) |
TW (1) | TWI469930B (de) |
WO (1) | WO2012157905A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2708498B1 (de) * | 2011-05-13 | 2017-08-16 | LG Chem, Ltd. | Neuer verbundhalbleiter und verwendung dafür |
WO2012157916A1 (ko) * | 2011-05-13 | 2012-11-22 | 주식회사 엘지화학 | 신규한 화합물 반도체 및 그 활용 |
JP6467740B2 (ja) * | 2016-11-22 | 2019-02-13 | パナソニックIpマネジメント株式会社 | 熱電変換素子およびその製造方法 |
KR102003352B1 (ko) * | 2017-03-15 | 2019-07-23 | 주식회사 엘지화학 | 신규한 화합물 반도체 및 그 활용 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02199006A (ja) * | 1989-01-30 | 1990-08-07 | Agency Of Ind Science & Technol | 1/2/5の組成を有する多元系金属カルコゲナイド |
JP2003173826A (ja) * | 2001-12-05 | 2003-06-20 | Mitsubishi Paper Mills Ltd | 半導体電極の作製方法、並びにそれを用いた光電変換素子 |
JP4625905B2 (ja) * | 2003-12-05 | 2011-02-02 | 独立行政法人産業技術総合研究所 | 不均一反応を用いた低サイズ分布および蛍光性半導体ナノ粒子の低温合成法 |
US7462217B2 (en) * | 2003-12-08 | 2008-12-09 | E.I. Du Pont De Nemours And Company | Method of preparation for the high performance thermoelectric material indium-cobalt-antimony |
US7723607B2 (en) * | 2004-04-14 | 2010-05-25 | E.I. Du Pont De Nemours And Company | High performance thermoelectric materials and their method of preparation |
US7648552B2 (en) * | 2004-07-23 | 2010-01-19 | Gm Global Technology Operations, Inc. | Filled skutterudites for advanced thermoelectric applications |
JP5055747B2 (ja) * | 2004-11-10 | 2012-10-24 | 大日本印刷株式会社 | 金属酸化物膜の製造方法 |
EP1938343A4 (de) * | 2005-10-17 | 2010-07-28 | Agency Science Tech & Res | Neuartiges magnetisches phasenänderungsmaterial |
CA2637618C (en) * | 2006-02-16 | 2015-03-31 | Brigham Young University | Preparation of uniform nanoparticles of ultra-high purity metal oxides, mixed metal oxides, metals, and metal alloys |
KR100910173B1 (ko) * | 2007-09-10 | 2009-07-30 | 충주대학교 산학협력단 | CoSb3 스커테루다이트계 열전재료 및 그 제조방법 |
EP2242121B1 (de) * | 2008-01-23 | 2018-10-24 | Furukawa Co., Ltd. | Thermoelektrisches wandlermaterial und thermoelektrisches wandlermodul |
JP2009253301A (ja) * | 2008-04-04 | 2009-10-29 | Samsung Electronics Co Ltd | ジカルコゲナイド熱電材料 |
KR20090110090A (ko) * | 2008-04-17 | 2009-10-21 | 엘지전자 주식회사 | 초음파를 이용한 인듐 셀레나이드 나노화합물의 제조방법및 이를 포함하는 화합물 반도체 태양전지 |
JP5414700B2 (ja) * | 2008-08-29 | 2014-02-12 | エルジー・ケム・リミテッド | 新規な熱電変換材料及びその製造方法、並びにそれを用いた熱電変換素子 |
CN101397612B (zh) * | 2008-10-21 | 2011-05-25 | 同济大学 | 一种方钴矿基热电块体材料的制备方法 |
WO2010135622A1 (en) * | 2009-05-21 | 2010-11-25 | E. I. Du Pont De Nemours And Company | Copper zinc tin chalcogenide nanoparticles |
KR101042575B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Fe-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
KR101042574B1 (ko) * | 2009-08-11 | 2011-06-20 | 충주대학교 산학협력단 | In-Co-Ni-Sb 계 스커테루다이트 열전재료 및 그 제조방법 |
EP2708498B1 (de) * | 2011-05-13 | 2017-08-16 | LG Chem, Ltd. | Neuer verbundhalbleiter und verwendung dafür |
WO2012157916A1 (ko) * | 2011-05-13 | 2012-11-22 | 주식회사 엘지화학 | 신규한 화합물 반도체 및 그 활용 |
-
2012
- 2012-05-11 JP JP2014503613A patent/JP5767395B2/ja active Active
- 2012-05-11 EP EP12786138.3A patent/EP2708502B1/de active Active
- 2012-05-11 WO PCT/KR2012/003727 patent/WO2012157905A1/ko active Application Filing
- 2012-05-11 KR KR1020120050259A patent/KR101380945B1/ko active IP Right Grant
- 2012-05-11 CN CN201280020543.9A patent/CN103502143B/zh active Active
- 2012-05-14 TW TW101117049A patent/TWI469930B/zh active
- 2012-09-14 US US13/617,010 patent/US8496856B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20120127302A (ko) | 2012-11-21 |
WO2012157905A1 (ko) | 2012-11-22 |
EP2708502B1 (de) | 2017-07-26 |
CN103502143B (zh) | 2016-01-20 |
EP2708502A1 (de) | 2014-03-19 |
CN103502143A (zh) | 2014-01-08 |
EP2708502A4 (de) | 2015-03-18 |
US8496856B2 (en) | 2013-07-30 |
JP2014516901A (ja) | 2014-07-17 |
TW201305060A (zh) | 2013-02-01 |
TWI469930B (zh) | 2015-01-21 |
KR101380945B1 (ko) | 2014-04-01 |
US20130009107A1 (en) | 2013-01-10 |
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