JP5744112B2 - パターン形成体の製造方法 - Google Patents

パターン形成体の製造方法 Download PDF

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Publication number
JP5744112B2
JP5744112B2 JP2013122812A JP2013122812A JP5744112B2 JP 5744112 B2 JP5744112 B2 JP 5744112B2 JP 2013122812 A JP2013122812 A JP 2013122812A JP 2013122812 A JP2013122812 A JP 2013122812A JP 5744112 B2 JP5744112 B2 JP 5744112B2
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JP
Japan
Prior art keywords
compound
free energy
surface free
resin composition
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013122812A
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English (en)
Japanese (ja)
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JP2014240137A5 (enExample
JP2014240137A (ja
Inventor
牧八 伊藤
牧八 伊藤
亮介 遠藤
亮介 遠藤
キョンソン ユン
キョンソン ユン
近藤　洋文
洋文 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Dexerials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2013122812A priority Critical patent/JP5744112B2/ja
Application filed by Dexerials Corp filed Critical Dexerials Corp
Priority to EP14810216.3A priority patent/EP3009264B1/en
Priority to TW103119639A priority patent/TWI610794B/zh
Priority to KR1020167000395A priority patent/KR102198983B1/ko
Priority to CN201480033453.2A priority patent/CN105555533B/zh
Priority to PCT/JP2014/065065 priority patent/WO2014199910A1/ja
Priority to US14/897,478 priority patent/US10545404B2/en
Publication of JP2014240137A publication Critical patent/JP2014240137A/ja
Publication of JP2014240137A5 publication Critical patent/JP2014240137A5/ja
Application granted granted Critical
Publication of JP5744112B2 publication Critical patent/JP5744112B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C03C17/324—Polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Composite Materials (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013122812A 2013-06-11 2013-06-11 パターン形成体の製造方法 Active JP5744112B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2013122812A JP5744112B2 (ja) 2013-06-11 2013-06-11 パターン形成体の製造方法
TW103119639A TWI610794B (zh) 2013-06-11 2014-06-06 圖案形成體之製造方法
KR1020167000395A KR102198983B1 (ko) 2013-06-11 2014-06-06 패턴 형성체의 제조 방법
CN201480033453.2A CN105555533B (zh) 2013-06-11 2014-06-06 图案形成体的制造方法
EP14810216.3A EP3009264B1 (en) 2013-06-11 2014-06-06 Method for manufacturing pattern-formed body
PCT/JP2014/065065 WO2014199910A1 (ja) 2013-06-11 2014-06-06 パターン形成体の製造方法
US14/897,478 US10545404B2 (en) 2013-06-11 2014-06-06 Method for manufacturing pattern-formed body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013122812A JP5744112B2 (ja) 2013-06-11 2013-06-11 パターン形成体の製造方法

Publications (3)

Publication Number Publication Date
JP2014240137A JP2014240137A (ja) 2014-12-25
JP2014240137A5 JP2014240137A5 (enExample) 2015-03-26
JP5744112B2 true JP5744112B2 (ja) 2015-07-01

Family

ID=52022206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013122812A Active JP5744112B2 (ja) 2013-06-11 2013-06-11 パターン形成体の製造方法

Country Status (7)

Country Link
US (1) US10545404B2 (enExample)
EP (1) EP3009264B1 (enExample)
JP (1) JP5744112B2 (enExample)
KR (1) KR102198983B1 (enExample)
CN (1) CN105555533B (enExample)
TW (1) TWI610794B (enExample)
WO (1) WO2014199910A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015115384A (ja) * 2013-12-10 2015-06-22 デクセリアルズ株式会社 パターン形成体

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6381971B2 (ja) * 2014-05-30 2018-08-29 デクセリアルズ株式会社 表面自由エネルギー転写用光硬化性樹脂組成物、及びこれを用いた基板の製造方法
JP6453622B2 (ja) * 2014-11-21 2019-01-16 デクセリアルズ株式会社 配線基板の製造方法、及び配線基板
US10477694B2 (en) 2015-07-30 2019-11-12 Dexerials Corporation Wiring board manufacturing method and wiring board
US12148979B2 (en) * 2020-02-13 2024-11-19 Asahi Kasei Kabushiki Kaisha Transparent antenna and RF tag

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1231099C (zh) * 2002-04-11 2005-12-07 长兴化学工业股份有限公司 用于印刷电路板的绝缘材料及用其制造印刷电路板的方法
US7749684B2 (en) * 2002-08-28 2010-07-06 Dai Nippon Printing Co., Ltd. Method for manufacturing conductive pattern forming body
JP2005052686A (ja) 2003-08-01 2005-03-03 Nitto Denko Corp パターン塗布方法、光学フィルム及び画像表示装置
JP2005189631A (ja) * 2003-12-26 2005-07-14 Kuraray Co Ltd 光学シート及びその製造方法並びにレンチキュラーレンズシート及びその製造方法
JP4876564B2 (ja) 2005-12-16 2012-02-15 凸版印刷株式会社 転写用凹版を用いた遮光性隔壁の形成方法
JP5309436B2 (ja) * 2006-10-16 2013-10-09 日立化成株式会社 樹脂製微細構造物、その製造方法及び重合性樹脂組成物
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
KR20110027817A (ko) * 2008-06-30 2011-03-16 노파르티스 아게 Ｍｇｌｕｒ 조절제를 포함하는 파킨슨병 치료용 조합물
JP5656431B2 (ja) 2009-03-31 2015-01-21 富士フイルム株式会社 反射防止フィルム、偏光板、画像表示装置、及び低屈折率層形成用塗布組成物
JP2011014829A (ja) * 2009-07-06 2011-01-20 Ricoh Co Ltd パターン化膜およびその形成方法
TWI433882B (zh) * 2010-04-05 2014-04-11 Mitsubishi Rayon Co 活性能量線硬化性樹脂組成物與使用該組成物之奈米凹凸構造體及其製造方法、以及具備奈米凹凸構造體的撥水性物品

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015115384A (ja) * 2013-12-10 2015-06-22 デクセリアルズ株式会社 パターン形成体

Also Published As

Publication number Publication date
CN105555533A (zh) 2016-05-04
KR20160018721A (ko) 2016-02-17
EP3009264B1 (en) 2018-02-21
TW201511925A (zh) 2015-04-01
EP3009264A4 (en) 2017-01-11
EP3009264A1 (en) 2016-04-20
JP2014240137A (ja) 2014-12-25
US20160124305A1 (en) 2016-05-05
TWI610794B (zh) 2018-01-11
CN105555533B (zh) 2017-06-30
KR102198983B1 (ko) 2021-01-07
US10545404B2 (en) 2020-01-28
WO2014199910A1 (ja) 2014-12-18

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