JP5740485B2 - 乾式コーティング装置 - Google Patents
乾式コーティング装置 Download PDFInfo
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- JP5740485B2 JP5740485B2 JP2013547323A JP2013547323A JP5740485B2 JP 5740485 B2 JP5740485 B2 JP 5740485B2 JP 2013547323 A JP2013547323 A JP 2013547323A JP 2013547323 A JP2013547323 A JP 2013547323A JP 5740485 B2 JP5740485 B2 JP 5740485B2
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- 239000011248 coating agent Substances 0.000 title claims description 151
- 238000000576 coating method Methods 0.000 title claims description 151
- 239000000463 material Substances 0.000 claims description 33
- 238000007789 sealing Methods 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 21
- 238000007740 vapor deposition Methods 0.000 claims description 19
- 238000004804 winding Methods 0.000 claims description 19
- 239000000498 cooling water Substances 0.000 claims description 17
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 239000010453 quartz Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 230000006698 induction Effects 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 239000000112 cooling gas Substances 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 2
- 239000002184 metal Substances 0.000 description 88
- 229910052751 metal Inorganic materials 0.000 description 88
- 229910000831 Steel Inorganic materials 0.000 description 24
- 239000010959 steel Substances 0.000 description 24
- 238000005339 levitation Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 238000001816 cooling Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 3
- 239000000306 component Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000013021 overheating Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000012811 non-conductive material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Description
をさらに含むことがより好ましい。
Claims (8)
- 供給されたコーティング物質の加熱−蒸発を通じて発生した蒸着蒸気を進行するコーティング対象物にコーティングするように真空雰囲気内に提供されるコーティング部と、
前記コーティング部でコーティング物質の加熱−蒸発ができるように大気下に提供される熱源部と、
前記熱源部は、電磁気力を通じたコーティング物質の浮揚−加熱を媒介にして蒸着蒸気を発生させる電磁気コイルを含み、
前記真空雰囲気内のコーティング部と大気下の電磁気コイルを分離するように真空チャンバまたは真空チャンバに連結されたフランジと連結されるコーティング部と電磁気コイルの分離手段と、
前記コーティング部と電磁気コイルの分離手段は、真空チャンバまたは真空チャンバに連結されたフランジとシーリング型締結手段を媒介にして真空を保持するように連結され、内側に前記コーティング部に備えられた蒸着蒸気発生部が配置される絶縁フランジと、を含んで構成された乾式コーティング装置。 - 前記コーティング対象物がシーリング搬送ロ−ルを媒介にして通過し、内部には前記コーティング部が提供され、真空雰囲気が保持される真空チャンバを含み、
前記コーティング部に真空チャンバを通じて連結されるコーティング物質供給部と、
をさらに含むことを特徴とする請求項1に記載の乾式コーティング装置。 - 前記コーティング部は、前記コーティング部と電磁気コイルの分離手段を介して電磁気コイルが外側に巻線され、内側に供給された前記コーティング物質が電磁気力で浮揚−加熱される蒸着蒸気発生部と、
前記蒸着蒸気発生部と連結される蒸着蒸気誘導部と蒸着蒸気噴射部のうち少なくとも蒸着蒸気噴射部と、
を含んで構成された請求項1に記載の乾式コーティング装置。 - 前記絶縁フランジは、前記シーリング型締結手段を媒介にして真空チャンバまたは真空チャンバ側のフランジとシーリング状態で連結される絶縁フランジ水平部と、
前記絶縁フランジ水平部の中央に備えられ、前記蒸着蒸気発生部が所定間隔を保持して配置され、前記熱源部に備えられた電磁気コイルが巻線される絶縁フランジ中空部と、
を含んで構成されたことを特徴とする請求項1に記載の乾式コーティング装置。 - 前記絶縁フランジは石英で形成され、前記シーリング型締結手段は前記絶縁フランジに巻線された電磁気コイルの巻線部の半径より大きく離隔されたことを特徴とする請求項4に記載の乾式コーティング装置。
- 前記シーリング型締結手段は、前記絶縁フランジ水平部と密着し、シーリング部材が備えられた真空チャンバまたは真空チャンバ側のフランジに弾性体を介して組み立てられるフランジ組み立て具を含み、
前記フランジ組み立て具には冷却媒体通路が備えられたことを特徴とする請求項4に記載の乾式コーティング装置。 - 真空チャンバまたは真空チャンバ側のフランジの上部にさらに提供され、内部に第2冷却媒体通路が備えられる第2組み立て具がさらに備えられ、
前記熱源部の電磁気コイルの周りは冷却気体雰囲気が提供されるか、電磁気コイルの内部に冷却水が循環されることを特徴とする請求項6記載の乾式コーティング装置。 - 前記コーティング物質供給部は、前記コーティング部に固体または液状のコーティング物質を供給するように真空チャンバ外部で真空チャンバを通じてコーティング部と連結され、
前記コーティング物質供給部とコーティング部の周りには一つ以上の加熱手段がさらに配置されたことを特徴とする請求項2に記載の乾式コーティング装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2010-0136124 | 2010-12-27 | ||
KR1020100136124A KR101207719B1 (ko) | 2010-12-27 | 2010-12-27 | 건식 코팅 장치 |
PCT/KR2011/010112 WO2012091390A2 (en) | 2010-12-27 | 2011-12-26 | Dry coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014501335A JP2014501335A (ja) | 2014-01-20 |
JP5740485B2 true JP5740485B2 (ja) | 2015-06-24 |
Family
ID=46383669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2013547323A Active JP5740485B2 (ja) | 2010-12-27 | 2011-12-26 | 乾式コーティング装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9732423B2 (ja) |
EP (1) | EP2659022B1 (ja) |
JP (1) | JP5740485B2 (ja) |
KR (1) | KR101207719B1 (ja) |
CN (1) | CN103237917B (ja) |
WO (1) | WO2012091390A2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2012081738A1 (en) * | 2010-12-13 | 2012-06-21 | Posco | Continuous coating apparatus |
KR101461738B1 (ko) * | 2012-12-21 | 2014-11-14 | 주식회사 포스코 | 가열장치 및 이를 포함하는 코팅 시스템 |
CN103046007B (zh) * | 2012-12-25 | 2015-10-28 | 王奉瑾 | 微波激发pvd镀膜设备 |
US9527107B2 (en) * | 2013-01-11 | 2016-12-27 | International Business Machines Corporation | Method and apparatus to apply material to a surface |
CN105829573B (zh) * | 2013-12-19 | 2018-08-24 | Posco公司 | 加热装置及包括该装置的涂覆机 |
EP3124648B1 (de) * | 2015-07-31 | 2018-03-28 | Hilberg & Partner GmbH | Verdampfersystem sowie verdampfungsverfahren für die beschichtung eines bandförmigen substrats |
CN109234700A (zh) * | 2018-08-30 | 2019-01-18 | 杭州锦上行镜业有限公司 | 一种汽车后视镜镜片的真空镀膜装置 |
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-
2010
- 2010-12-27 KR KR1020100136124A patent/KR101207719B1/ko active IP Right Grant
-
2011
- 2011-12-26 CN CN201180058259.6A patent/CN103237917B/zh active Active
- 2011-12-26 EP EP11852254.9A patent/EP2659022B1/en active Active
- 2011-12-26 JP JP2013547323A patent/JP5740485B2/ja active Active
- 2011-12-26 US US13/824,566 patent/US9732423B2/en active Active
- 2011-12-26 WO PCT/KR2011/010112 patent/WO2012091390A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US20130186339A1 (en) | 2013-07-25 |
WO2012091390A2 (en) | 2012-07-05 |
US9732423B2 (en) | 2017-08-15 |
EP2659022B1 (en) | 2017-05-24 |
KR20120074158A (ko) | 2012-07-05 |
EP2659022A2 (en) | 2013-11-06 |
EP2659022A4 (en) | 2014-06-11 |
CN103237917A (zh) | 2013-08-07 |
JP2014501335A (ja) | 2014-01-20 |
WO2012091390A3 (en) | 2012-08-23 |
CN103237917B (zh) | 2015-09-02 |
KR101207719B1 (ko) | 2012-12-03 |
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