UST988002I4 - Apparatus for forming a vacuum evaporating layer on a substrate - Google Patents
Apparatus for forming a vacuum evaporating layer on a substrate Download PDFInfo
- Publication number
- UST988002I4 UST988002I4 US05/931,441 US93144178A UST988002I4 US T988002 I4 UST988002 I4 US T988002I4 US 93144178 A US93144178 A US 93144178A US T988002 I4 UST988002 I4 US T988002I4
- Authority
- US
- United States
- Prior art keywords
- source material
- evaporator element
- substrate
- supply receptacle
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Abstract
An evaporator element is positioned within a hermetic enclosure having therein a desired atmosphere. A supply receptacle containing a source material is located at a position higher than the evaporator element. A source material heater is positioned adjacent the supply receptacle for melting the source material. A duct is inclined from the supply receptacle to the evaporator element to substantially continuously supply molten source material from the supply receptacle to the evaporator element. An evaporation heater adjacent the evaporator element substantially momentarily evaporates the molten source material as it is supplied to the evaporator element, without any substantial accumulation of the molten source material in the evaporator element. A substrate is positioned so as to have deposited thereon a layer of source material evaporated from the evaporator element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/931,441 UST988002I4 (en) | 1977-08-03 | 1978-08-07 | Apparatus for forming a vacuum evaporating layer on a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US82192977A | 1977-08-03 | 1977-08-03 | |
US05/931,441 UST988002I4 (en) | 1977-08-03 | 1978-08-07 | Apparatus for forming a vacuum evaporating layer on a substrate |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US82192977A Continuation-In-Part | 1977-08-03 | 1977-08-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
UST988002I4 true UST988002I4 (en) | 1979-11-06 |
Family
ID=27124604
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/931,441 Pending UST988002I4 (en) | 1977-08-03 | 1978-08-07 | Apparatus for forming a vacuum evaporating layer on a substrate |
Country Status (1)
Country | Link |
---|---|
US (1) | UST988002I4 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130186339A1 (en) * | 2010-12-27 | 2013-07-25 | Posco | Dry Coating Apparatus |
US20130276706A1 (en) * | 2012-04-23 | 2013-10-24 | Samsung Sdi Co., Ltd. | Deposition apparatus |
US10196736B2 (en) | 2012-12-21 | 2019-02-05 | Posco | Heating apparatus, and coating device comprising same |
US20220349044A1 (en) * | 2020-04-09 | 2022-11-03 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Device for vapor depositing metal |
-
1978
- 1978-08-07 US US05/931,441 patent/UST988002I4/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130186339A1 (en) * | 2010-12-27 | 2013-07-25 | Posco | Dry Coating Apparatus |
US9732423B2 (en) * | 2010-12-27 | 2017-08-15 | Posco | Dry coating apparatus |
US20130276706A1 (en) * | 2012-04-23 | 2013-10-24 | Samsung Sdi Co., Ltd. | Deposition apparatus |
US10196736B2 (en) | 2012-12-21 | 2019-02-05 | Posco | Heating apparatus, and coating device comprising same |
US20220349044A1 (en) * | 2020-04-09 | 2022-11-03 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Device for vapor depositing metal |
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