JPS5537429A - Production of optical thin film - Google Patents

Production of optical thin film

Info

Publication number
JPS5537429A
JPS5537429A JP10874178A JP10874178A JPS5537429A JP S5537429 A JPS5537429 A JP S5537429A JP 10874178 A JP10874178 A JP 10874178A JP 10874178 A JP10874178 A JP 10874178A JP S5537429 A JPS5537429 A JP S5537429A
Authority
JP
Japan
Prior art keywords
materials
evaporated
stage
electron beams
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10874178A
Other languages
Japanese (ja)
Other versions
JPS61601B2 (en
Inventor
Seiji Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Original Assignee
Horiba Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd filed Critical Horiba Ltd
Priority to JP10874178A priority Critical patent/JPS5537429A/en
Publication of JPS5537429A publication Critical patent/JPS5537429A/en
Publication of JPS61601B2 publication Critical patent/JPS61601B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Abstract

PURPOSE:To form a homogeneous optical thin film without causing a fractionating effect by frranging equally or unequally a plurality of vacuum-deposition materials with different refractive indexes on a stage and by turning the stage to successively irradiate the materials with electron beams and to evaporate the materials while always stabilizing the evaporation. CONSTITUTION:Vacuum-deposition materials with different refractive indexes, e.g. TiO212a and MgF212b are arranged in crucible 10 on a stage to be irradated with electron beams (d). Next rotary stand 9 is turned to successively irradiate materials 12a, 12b with beams (d), whereby the materials are evaporated and deposited on sample substrate 4 and film thickness monitoring substrate 7. By this method the materials are evaporated with single electronic gun filament 11, so stable vapor currents are scattered from evaporation source 2. Since the materials are successively irradiated with electron beams, they are evaporated almost simultaneously and deposited on substrate 4, causing no fractionating effect even if they are different in vapor press.
JP10874178A 1978-09-04 1978-09-04 Production of optical thin film Granted JPS5537429A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10874178A JPS5537429A (en) 1978-09-04 1978-09-04 Production of optical thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10874178A JPS5537429A (en) 1978-09-04 1978-09-04 Production of optical thin film

Publications (2)

Publication Number Publication Date
JPS5537429A true JPS5537429A (en) 1980-03-15
JPS61601B2 JPS61601B2 (en) 1986-01-09

Family

ID=14492335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10874178A Granted JPS5537429A (en) 1978-09-04 1978-09-04 Production of optical thin film

Country Status (1)

Country Link
JP (1) JPS5537429A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273202A (en) * 1985-09-27 1987-04-03 Hamamatsu Photonics Kk Production of thin optical film
JPS647005A (en) * 1987-06-30 1989-01-11 Toshiba Glass Kk Reflecting mirror made of multi-layered films
DE4005848A1 (en) * 1989-02-23 1990-09-06 Fuji Electric Co Ltd STORAGE COOLING DEVICE FOR A WATER TURBINE
JPH042764A (en) * 1990-04-18 1992-01-07 Sharp Corp Production of thin-film el element

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62129601U (en) * 1986-02-05 1987-08-17

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273202A (en) * 1985-09-27 1987-04-03 Hamamatsu Photonics Kk Production of thin optical film
JPS647005A (en) * 1987-06-30 1989-01-11 Toshiba Glass Kk Reflecting mirror made of multi-layered films
DE4005848A1 (en) * 1989-02-23 1990-09-06 Fuji Electric Co Ltd STORAGE COOLING DEVICE FOR A WATER TURBINE
DE4005848C2 (en) * 1989-02-23 1994-03-03 Fuji Electric Co Ltd Bearing cooling device for a water turbine
JPH042764A (en) * 1990-04-18 1992-01-07 Sharp Corp Production of thin-film el element

Also Published As

Publication number Publication date
JPS61601B2 (en) 1986-01-09

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