JPS6421973A - Device for manufacturing superconductive material - Google Patents

Device for manufacturing superconductive material

Info

Publication number
JPS6421973A
JPS6421973A JP62179636A JP17963687A JPS6421973A JP S6421973 A JPS6421973 A JP S6421973A JP 62179636 A JP62179636 A JP 62179636A JP 17963687 A JP17963687 A JP 17963687A JP S6421973 A JPS6421973 A JP S6421973A
Authority
JP
Japan
Prior art keywords
substrate
source
oxide
holder
another
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62179636A
Other languages
Japanese (ja)
Inventor
Hiroki Yamaki
Yasunori Ando
Kiyoshi Ogata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP62179636A priority Critical patent/JPS6421973A/en
Publication of JPS6421973A publication Critical patent/JPS6421973A/en
Pending legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)

Abstract

PURPOSE:To obtain a device, by which an oxide ceramic superconducting thin film can be manufactured with high reproducibility and easily, by a method wherein a plurality of evaporation sources different from one another and an oxygen ion source are disposed in an array on the bottom part of a vacuum chamber and a substrate is contrived so as to pass through in order over them and the like. CONSTITUTION:A plurality of evaporation source 1-3 different from one another and an oxygen ion source 4 are disposed in an array on the bottom part of a vacuum chamber 10 and moreover, the upper part of the chamber 10 is provided with a substrate holder 6 and a substrate 8 is mounted to the lower surface of the holder 6. The holder 6 is constituted in a movable design in such a way that the substrate 8 passes through in order over the above sources 1-3 and source 4 and moreover, the above sources 1-3 and source 4 are partitioned from one another by partitions 5. For example, the above evaporation sources 1-3 are constituted in such a way that an electron beam from an electron beam irradiating unit 14 is scanned and a group IIIa metal and/or its oxide, a group IIa metal and/or its oxide and copper and/or a copper oxide are respectively evaporated.
JP62179636A 1987-07-16 1987-07-16 Device for manufacturing superconductive material Pending JPS6421973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62179636A JPS6421973A (en) 1987-07-16 1987-07-16 Device for manufacturing superconductive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62179636A JPS6421973A (en) 1987-07-16 1987-07-16 Device for manufacturing superconductive material

Publications (1)

Publication Number Publication Date
JPS6421973A true JPS6421973A (en) 1989-01-25

Family

ID=16069229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62179636A Pending JPS6421973A (en) 1987-07-16 1987-07-16 Device for manufacturing superconductive material

Country Status (1)

Country Link
JP (1) JPS6421973A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
JP2000503351A (en) * 1996-11-01 2000-03-21 テファ デュンシヒトテヒニク ゲーエムベーハー Equipment for manufacturing thin oxide coatings
JP2003522831A (en) * 2000-02-09 2003-07-29 コンダクタス，インコーポレイテッド Apparatus and method for thin film deposition
JP2009518537A (en) * 2005-12-02 2009-05-07 スーパーコンダクター テクノロジーズ，インク． High throughput deposition system for growing oxide thin films by reactive co-evaporation
JP2010106339A (en) * 2008-10-31 2010-05-13 Shincron:Kk Film deposition method and film deposition apparatus
WO2013047605A1 (en) * 2011-09-30 2013-04-04 株式会社シンクロン Film formation method and film formation apparatus
JP5638147B2 (en) * 2011-09-30 2014-12-10 株式会社シンクロン Film forming method and film forming apparatus
CN113493899A (en) * 2020-04-06 2021-10-12 Tos株式会社 Chamber separated type outer film growing device
US11434584B2 (en) * 2020-03-16 2022-09-06 T.O.S Co., Ltd. Apparatus for growing single crystal metal-oxide EPI wafer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
US5284824A (en) * 1988-03-16 1994-02-08 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
JP2000503351A (en) * 1996-11-01 2000-03-21 テファ デュンシヒトテヒニク ゲーエムベーハー Equipment for manufacturing thin oxide coatings
JP2003522831A (en) * 2000-02-09 2003-07-29 コンダクタス，インコーポレイテッド Apparatus and method for thin film deposition
JP2009518537A (en) * 2005-12-02 2009-05-07 スーパーコンダクター テクノロジーズ，インク． High throughput deposition system for growing oxide thin films by reactive co-evaporation
JP2010106339A (en) * 2008-10-31 2010-05-13 Shincron:Kk Film deposition method and film deposition apparatus
WO2013047605A1 (en) * 2011-09-30 2013-04-04 株式会社シンクロン Film formation method and film formation apparatus
JP5638147B2 (en) * 2011-09-30 2014-12-10 株式会社シンクロン Film forming method and film forming apparatus
US11434584B2 (en) * 2020-03-16 2022-09-06 T.O.S Co., Ltd. Apparatus for growing single crystal metal-oxide EPI wafer
CN113493899A (en) * 2020-04-06 2021-10-12 Tos株式会社 Chamber separated type outer film growing device

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