JPS6419659A - Cluster ion beam source - Google Patents

Cluster ion beam source

Info

Publication number
JPS6419659A
JPS6419659A JP62174393A JP17439387A JPS6419659A JP S6419659 A JPS6419659 A JP S6419659A JP 62174393 A JP62174393 A JP 62174393A JP 17439387 A JP17439387 A JP 17439387A JP S6419659 A JPS6419659 A JP S6419659A
Authority
JP
Japan
Prior art keywords
cluster ion
ion beam
crucible
beam source
small
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62174393A
Other languages
Japanese (ja)
Inventor
Tomoko Miyaura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP62174393A priority Critical patent/JPS6419659A/en
Publication of JPS6419659A publication Critical patent/JPS6419659A/en
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To make it possible to use an ionized electrode, an accelerating electrode and a heater for heating a crucible in common for different evaporable substances and to obtain a cluster ion beam source which is small and cheap by making only the crucible free in exchange. CONSTITUTION:A crucible shifting mechanism 3 to shift any one of plural crucibles 21-2n selectively to a position to heat is provided, which can generate cluster ion beams for plural kinds of substances selectively and form multi-layer easily by a cluster ion beam method. Further, since it can use an ionized electrode 5, an accelerating electrode 6 and a heater 4 for heating the crucible in common for plural crucibles 21-2n, a vacuum chamber for accommodating the cluster ion beam source need not be enlarged and a vacuum pump will do with small capacity and as a whole, a small and cheap vapor deposition device can be constituted.
JP62174393A 1987-07-13 1987-07-13 Cluster ion beam source Pending JPS6419659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62174393A JPS6419659A (en) 1987-07-13 1987-07-13 Cluster ion beam source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62174393A JPS6419659A (en) 1987-07-13 1987-07-13 Cluster ion beam source

Publications (1)

Publication Number Publication Date
JPS6419659A true JPS6419659A (en) 1989-01-23

Family

ID=15977806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62174393A Pending JPS6419659A (en) 1987-07-13 1987-07-13 Cluster ion beam source

Country Status (1)

Country Link
JP (1) JPS6419659A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300785A (en) * 1990-10-04 1994-04-05 Superion Limited Apparatus for and method of producing ion beams
JP2011249544A (en) * 2010-05-26 2011-12-08 Hyogo Prefecture Cluster beam generator, substrate processing apparatus, cluster beam generation method and substrate processing method
CN103789734A (en) * 2014-01-27 2014-05-14 南京大学 Method for realizing wide nano-particle beams by using neutral cluster beam nozzle assembly

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300785A (en) * 1990-10-04 1994-04-05 Superion Limited Apparatus for and method of producing ion beams
JP2011249544A (en) * 2010-05-26 2011-12-08 Hyogo Prefecture Cluster beam generator, substrate processing apparatus, cluster beam generation method and substrate processing method
CN103789734A (en) * 2014-01-27 2014-05-14 南京大学 Method for realizing wide nano-particle beams by using neutral cluster beam nozzle assembly

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