JPS6419659A - Cluster ion beam source - Google Patents
Cluster ion beam sourceInfo
- Publication number
- JPS6419659A JPS6419659A JP62174393A JP17439387A JPS6419659A JP S6419659 A JPS6419659 A JP S6419659A JP 62174393 A JP62174393 A JP 62174393A JP 17439387 A JP17439387 A JP 17439387A JP S6419659 A JPS6419659 A JP S6419659A
- Authority
- JP
- Japan
- Prior art keywords
- cluster ion
- ion beam
- crucible
- beam source
- small
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 title abstract 5
- 238000010438 heat treatment Methods 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To make it possible to use an ionized electrode, an accelerating electrode and a heater for heating a crucible in common for different evaporable substances and to obtain a cluster ion beam source which is small and cheap by making only the crucible free in exchange. CONSTITUTION:A crucible shifting mechanism 3 to shift any one of plural crucibles 21-2n selectively to a position to heat is provided, which can generate cluster ion beams for plural kinds of substances selectively and form multi-layer easily by a cluster ion beam method. Further, since it can use an ionized electrode 5, an accelerating electrode 6 and a heater 4 for heating the crucible in common for plural crucibles 21-2n, a vacuum chamber for accommodating the cluster ion beam source need not be enlarged and a vacuum pump will do with small capacity and as a whole, a small and cheap vapor deposition device can be constituted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62174393A JPS6419659A (en) | 1987-07-13 | 1987-07-13 | Cluster ion beam source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62174393A JPS6419659A (en) | 1987-07-13 | 1987-07-13 | Cluster ion beam source |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6419659A true JPS6419659A (en) | 1989-01-23 |
Family
ID=15977806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62174393A Pending JPS6419659A (en) | 1987-07-13 | 1987-07-13 | Cluster ion beam source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6419659A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5300785A (en) * | 1990-10-04 | 1994-04-05 | Superion Limited | Apparatus for and method of producing ion beams |
JP2011249544A (en) * | 2010-05-26 | 2011-12-08 | Hyogo Prefecture | Cluster beam generator, substrate processing apparatus, cluster beam generation method and substrate processing method |
CN103789734A (en) * | 2014-01-27 | 2014-05-14 | 南京大学 | Method for realizing wide nano-particle beams by using neutral cluster beam nozzle assembly |
-
1987
- 1987-07-13 JP JP62174393A patent/JPS6419659A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5300785A (en) * | 1990-10-04 | 1994-04-05 | Superion Limited | Apparatus for and method of producing ion beams |
JP2011249544A (en) * | 2010-05-26 | 2011-12-08 | Hyogo Prefecture | Cluster beam generator, substrate processing apparatus, cluster beam generation method and substrate processing method |
CN103789734A (en) * | 2014-01-27 | 2014-05-14 | 南京大学 | Method for realizing wide nano-particle beams by using neutral cluster beam nozzle assembly |
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