JP5689048B2 - 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体 - Google Patents

基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体 Download PDF

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Publication number
JP5689048B2
JP5689048B2 JP2011242336A JP2011242336A JP5689048B2 JP 5689048 B2 JP5689048 B2 JP 5689048B2 JP 2011242336 A JP2011242336 A JP 2011242336A JP 2011242336 A JP2011242336 A JP 2011242336A JP 5689048 B2 JP5689048 B2 JP 5689048B2
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JP
Japan
Prior art keywords
substrate
wafer
unit
cleaning
transfer
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JP2011242336A
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English (en)
Japanese (ja)
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JP2013098478A (ja
JP2013098478A5 (https=
Inventor
雅弘 中原田
雅弘 中原田
洋司 酒田
洋司 酒田
卓 榎木田
卓 榎木田
中島　常長
常長 中島
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Tokyo Electron Ltd
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Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2011242336A priority Critical patent/JP5689048B2/ja
Priority to TW101133757A priority patent/TWI550686B/zh
Priority to TW101134699A priority patent/TWI524456B/zh
Priority to US13/663,179 priority patent/US9287145B2/en
Priority to US13/663,846 priority patent/US9460942B2/en
Priority to KR1020120123672A priority patent/KR101752513B1/ko
Priority to KR1020120123696A priority patent/KR101751551B1/ko
Priority to CN201710337989.9A priority patent/CN107180775B/zh
Priority to CN201210436221.4A priority patent/CN103094160B/zh
Priority to CN201710256275.5A priority patent/CN107256838B/zh
Priority to CN201210435430.7A priority patent/CN103094164B/zh
Publication of JP2013098478A publication Critical patent/JP2013098478A/ja
Publication of JP2013098478A5 publication Critical patent/JP2013098478A5/ja
Application granted granted Critical
Publication of JP5689048B2 publication Critical patent/JP5689048B2/ja
Priority to US15/252,422 priority patent/US9984905B2/en
Priority to US15/252,374 priority patent/US9984904B2/en
Priority to KR1020170079084A priority patent/KR102034344B1/ko
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2011242336A 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体 Active JP5689048B2 (ja)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP2011242336A JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
TW101133757A TWI550686B (zh) 2011-11-04 2012-09-14 基板處理系統、基板運送方法及電腦記憶媒體
TW101134699A TWI524456B (zh) 2011-11-04 2012-09-21 基板處理系統、基板運送方法、程式及電腦記憶媒體
US13/663,179 US9287145B2 (en) 2011-11-04 2012-10-29 Substrate treatment system, substrate transfer method, and a non-transitory computer storage medium
US13/663,846 US9460942B2 (en) 2011-11-04 2012-10-30 Substrate treatment system, substrate transfer method and computer storage medium
KR1020120123696A KR101751551B1 (ko) 2011-11-04 2012-11-02 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체
KR1020120123672A KR101752513B1 (ko) 2011-11-04 2012-11-02 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체
CN201210436221.4A CN103094160B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201710337989.9A CN107180775B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201710256275.5A CN107256838B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201210435430.7A CN103094164B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
US15/252,422 US9984905B2 (en) 2011-11-04 2016-08-31 Substrate treatment system, substrate transfer method and computer storage medium
US15/252,374 US9984904B2 (en) 2011-11-04 2016-08-31 Substrate treatment system, substrate transfer method and computer storage medium
KR1020170079084A KR102034344B1 (ko) 2011-11-04 2017-06-22 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011242336A JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体

Publications (3)

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JP2013098478A JP2013098478A (ja) 2013-05-20
JP2013098478A5 JP2013098478A5 (https=) 2014-01-23
JP5689048B2 true JP5689048B2 (ja) 2015-03-25

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JP2011242336A Active JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体

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JP (1) JP5689048B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5512633B2 (ja) * 2011-11-04 2014-06-04 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP5752827B2 (ja) * 2014-03-26 2015-07-22 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP6363249B2 (ja) * 2017-04-17 2018-07-25 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP7349240B2 (ja) * 2018-10-05 2023-09-22 東京エレクトロン株式会社 基板倉庫及び基板検査方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004022876A (ja) * 2002-06-18 2004-01-22 Nikon Corp クリーニング機構
JP4410121B2 (ja) * 2005-02-08 2010-02-03 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2008135583A (ja) * 2006-11-29 2008-06-12 Tokyo Electron Ltd 塗布膜形成装置および塗布膜形成方法
JP4331199B2 (ja) * 2006-11-29 2009-09-16 東京エレクトロン株式会社 液浸露光用塗布膜形成装置および塗布膜形成方法
JP5002471B2 (ja) * 2008-01-31 2012-08-15 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法、プログラム及びコンピュータ記憶媒体

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