JP2013098478A5 - - Google Patents

Download PDF

Info

Publication number
JP2013098478A5
JP2013098478A5 JP2011242336A JP2011242336A JP2013098478A5 JP 2013098478 A5 JP2013098478 A5 JP 2013098478A5 JP 2011242336 A JP2011242336 A JP 2011242336A JP 2011242336 A JP2011242336 A JP 2011242336A JP 2013098478 A5 JP2013098478 A5 JP 2013098478A5
Authority
JP
Japan
Prior art keywords
substrate
unit
cleaning
processing system
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011242336A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013098478A (ja
JP5689048B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2011242336A external-priority patent/JP5689048B2/ja
Priority to JP2011242336A priority Critical patent/JP5689048B2/ja
Priority to TW101133757A priority patent/TWI550686B/zh
Priority to TW101134699A priority patent/TWI524456B/zh
Priority to US13/663,179 priority patent/US9287145B2/en
Priority to US13/663,846 priority patent/US9460942B2/en
Priority to KR1020120123696A priority patent/KR101751551B1/ko
Priority to KR1020120123672A priority patent/KR101752513B1/ko
Priority to CN201710337989.9A priority patent/CN107180775B/zh
Priority to CN201210436221.4A priority patent/CN103094160B/zh
Priority to CN201710256275.5A priority patent/CN107256838B/zh
Priority to CN201210435430.7A priority patent/CN103094164B/zh
Publication of JP2013098478A publication Critical patent/JP2013098478A/ja
Publication of JP2013098478A5 publication Critical patent/JP2013098478A5/ja
Publication of JP5689048B2 publication Critical patent/JP5689048B2/ja
Application granted granted Critical
Priority to US15/252,422 priority patent/US9984905B2/en
Priority to US15/252,374 priority patent/US9984904B2/en
Priority to KR1020170079084A priority patent/KR102034344B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011242336A 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体 Active JP5689048B2 (ja)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP2011242336A JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
TW101133757A TWI550686B (zh) 2011-11-04 2012-09-14 基板處理系統、基板運送方法及電腦記憶媒體
TW101134699A TWI524456B (zh) 2011-11-04 2012-09-21 基板處理系統、基板運送方法、程式及電腦記憶媒體
US13/663,179 US9287145B2 (en) 2011-11-04 2012-10-29 Substrate treatment system, substrate transfer method, and a non-transitory computer storage medium
US13/663,846 US9460942B2 (en) 2011-11-04 2012-10-30 Substrate treatment system, substrate transfer method and computer storage medium
KR1020120123696A KR101751551B1 (ko) 2011-11-04 2012-11-02 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체
KR1020120123672A KR101752513B1 (ko) 2011-11-04 2012-11-02 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체
CN201210436221.4A CN103094160B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201710337989.9A CN107180775B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201710256275.5A CN107256838B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
CN201210435430.7A CN103094164B (zh) 2011-11-04 2012-11-05 基板处理系统和基板搬送方法
US15/252,422 US9984905B2 (en) 2011-11-04 2016-08-31 Substrate treatment system, substrate transfer method and computer storage medium
US15/252,374 US9984904B2 (en) 2011-11-04 2016-08-31 Substrate treatment system, substrate transfer method and computer storage medium
KR1020170079084A KR102034344B1 (ko) 2011-11-04 2017-06-22 기판 처리 시스템, 기판 반송 방법 및 컴퓨터 기억 매체

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011242336A JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体

Publications (3)

Publication Number Publication Date
JP2013098478A JP2013098478A (ja) 2013-05-20
JP2013098478A5 true JP2013098478A5 (https=) 2014-01-23
JP5689048B2 JP5689048B2 (ja) 2015-03-25

Family

ID=48620093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011242336A Active JP5689048B2 (ja) 2011-11-04 2011-11-04 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体

Country Status (1)

Country Link
JP (1) JP5689048B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5512633B2 (ja) * 2011-11-04 2014-06-04 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP5752827B2 (ja) * 2014-03-26 2015-07-22 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP6363249B2 (ja) * 2017-04-17 2018-07-25 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP7349240B2 (ja) * 2018-10-05 2023-09-22 東京エレクトロン株式会社 基板倉庫及び基板検査方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004022876A (ja) * 2002-06-18 2004-01-22 Nikon Corp クリーニング機構
JP4410121B2 (ja) * 2005-02-08 2010-02-03 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2008135583A (ja) * 2006-11-29 2008-06-12 Tokyo Electron Ltd 塗布膜形成装置および塗布膜形成方法
JP4331199B2 (ja) * 2006-11-29 2009-09-16 東京エレクトロン株式会社 液浸露光用塗布膜形成装置および塗布膜形成方法
JP5002471B2 (ja) * 2008-01-31 2012-08-15 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法、プログラム及びコンピュータ記憶媒体

Similar Documents

Publication Publication Date Title
JP2012151312A5 (https=)
JP2012023289A5 (https=)
JP2013098478A5 (https=)
JP2013030747A5 (ja) 基板処理装置、及び基板処理装置のデータ解析方法並びにプログラム
IL221269A0 (en) Data processing apparatus and method for transferring workload between source and destination processing curcuitry
JP2006287178A5 (https=)
JP2012141287A5 (https=)
JP2012104593A5 (https=)
WO2015044696A8 (en) Computer architecture and processing method
JP2013125788A5 (https=)
JP2012145474A5 (https=)
KR101397124B9 (ko) 기판지지프레임 및 이를 포함하는 기판처리장치, 이를이용한 기판의 로딩 및 언로딩 방법
JP2011066342A5 (https=)
JP2018104799A5 (https=)
JP6587211B2 (ja) ガラス板の製造方法
JP2009278138A5 (https=)
JP2011238808A5 (https=)
FR2942533B1 (fr) Dispositif et procede d'inspection de plaquettes semi-conductrices
JP6200190B2 (ja) 放射性廃棄物検査装置および放射性廃棄物検査方法
JP2014138063A5 (https=)
JP2012222086A5 (https=)
TW200631070A (en) Method of inspecting substrate processing apparatus, and storage medium storing inspection program for executing the method
FR2977073B1 (fr) Procede de transfert d'une couche de semi-conducteur, et substrat comprenant une structure de confinement
JP2013003576A5 (https=)
JP2011128646A5 (https=)