JP5686647B2 - 基板保持装置、基板洗浄装置および基板処理装置 - Google Patents

基板保持装置、基板洗浄装置および基板処理装置 Download PDF

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Publication number
JP5686647B2
JP5686647B2 JP2011070120A JP2011070120A JP5686647B2 JP 5686647 B2 JP5686647 B2 JP 5686647B2 JP 2011070120 A JP2011070120 A JP 2011070120A JP 2011070120 A JP2011070120 A JP 2011070120A JP 5686647 B2 JP5686647 B2 JP 5686647B2
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JP2012204759A (ja
JP2012204759A5 (enExample
Inventor
達彦 江間
達彦 江間
啓介 江原
啓介 江原
秀文 澤井
秀文 澤井
耕二 西山
耕二 西山
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Toshiba Corp
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Toshiba Corp
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  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011070120A 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置 Active JP5686647B2 (ja)

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JP2011070120A JP5686647B2 (ja) 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置

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JP2011070120A JP5686647B2 (ja) 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置

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JP2012204759A JP2012204759A (ja) 2012-10-22
JP2012204759A5 JP2012204759A5 (enExample) 2014-01-16
JP5686647B2 true JP5686647B2 (ja) 2015-03-18

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014130883A (ja) * 2012-12-28 2014-07-10 Ebara Corp 基板洗浄装置及び基板洗浄方法
JP6836432B2 (ja) * 2017-03-22 2021-03-03 株式会社荏原製作所 基板処理装置および基板処理方法
JP7172163B2 (ja) * 2018-06-20 2022-11-16 日新電機株式会社 基板保持装置
JP6811287B2 (ja) * 2019-06-25 2021-01-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI366222B (en) * 2004-11-23 2012-06-11 Lam Res Ag Apparatus and method for wet treatment of wafers
JP2008147423A (ja) * 2006-12-11 2008-06-26 Seiko Epson Corp 保持ピン及び保持装置
JP5430873B2 (ja) * 2008-04-16 2014-03-05 株式会社Ｓｏｋｕｄｏ 基板洗浄装置およびそれを備えた基板処理装置

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