JP2012204759A5 - - Google Patents
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- Publication number
- JP2012204759A5 JP2012204759A5 JP2011070120A JP2011070120A JP2012204759A5 JP 2012204759 A5 JP2012204759 A5 JP 2012204759A5 JP 2011070120 A JP2011070120 A JP 2011070120A JP 2011070120 A JP2011070120 A JP 2011070120A JP 2012204759 A5 JP2012204759 A5 JP 2012204759A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- back surface
- cleaning
- unit
- surface cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 description 15
- 238000004140 cleaning Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000013256 coordination polymer Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011070120A JP5686647B2 (ja) | 2011-03-28 | 2011-03-28 | 基板保持装置、基板洗浄装置および基板処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011070120A JP5686647B2 (ja) | 2011-03-28 | 2011-03-28 | 基板保持装置、基板洗浄装置および基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012204759A JP2012204759A (ja) | 2012-10-22 |
| JP2012204759A5 true JP2012204759A5 (enExample) | 2014-01-16 |
| JP5686647B2 JP5686647B2 (ja) | 2015-03-18 |
Family
ID=47185355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011070120A Active JP5686647B2 (ja) | 2011-03-28 | 2011-03-28 | 基板保持装置、基板洗浄装置および基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5686647B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014130883A (ja) * | 2012-12-28 | 2014-07-10 | Ebara Corp | 基板洗浄装置及び基板洗浄方法 |
| JP6836432B2 (ja) * | 2017-03-22 | 2021-03-03 | 株式会社荏原製作所 | 基板処理装置および基板処理方法 |
| JP7172163B2 (ja) * | 2018-06-20 | 2022-11-16 | 日新電機株式会社 | 基板保持装置 |
| JP6811287B2 (ja) * | 2019-06-25 | 2021-01-13 | 株式会社Screenホールディングス | 基板処理装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI366222B (en) * | 2004-11-23 | 2012-06-11 | Lam Res Ag | Apparatus and method for wet treatment of wafers |
| JP2008147423A (ja) * | 2006-12-11 | 2008-06-26 | Seiko Epson Corp | 保持ピン及び保持装置 |
| JP5430873B2 (ja) * | 2008-04-16 | 2014-03-05 | 株式会社Sokudo | 基板洗浄装置およびそれを備えた基板処理装置 |
-
2011
- 2011-03-28 JP JP2011070120A patent/JP5686647B2/ja active Active
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