JP5634626B2 - 直流電源装置、直流電源装置の制御方法 - Google Patents

直流電源装置、直流電源装置の制御方法 Download PDF

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Publication number
JP5634626B2
JP5634626B2 JP2013555675A JP2013555675A JP5634626B2 JP 5634626 B2 JP5634626 B2 JP 5634626B2 JP 2013555675 A JP2013555675 A JP 2013555675A JP 2013555675 A JP2013555675 A JP 2013555675A JP 5634626 B2 JP5634626 B2 JP 5634626B2
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Prior art keywords
control
circuit
voltage
short
current
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Japanese (ja)
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JPWO2014038060A1 (ja
Inventor
譲原　逸男
逸男 譲原
俊幸 安達
俊幸 安達
真一 小玉
真一 小玉
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Kyosan Electric Manufacturing Co Ltd
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Kyosan Electric Manufacturing Co Ltd
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32027—DC powered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32045—Circuits specially adapted for controlling the glow discharge
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M3/00—Conversion of DC power input into DC power output
    • H02M3/22—Conversion of DC power input into DC power output with intermediate conversion into AC
    • H02M3/24—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters
    • H02M3/28—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC
    • H02M3/325—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal
    • H02M3/335—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal using semiconductor devices only
    • H02M3/33569—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal using semiconductor devices only having several active switching elements
    • H02M3/33573—Full-bridge at primary side of an isolation transformer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00—Details of apparatus for conversion
    • H02M1/0067—Converter structures employing plural converter units, other than for parallel operation of the units on a single load
    • H02M1/007—Plural converter units in cascade
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M3/00—Conversion of DC power input into DC power output
    • H02M3/22—Conversion of DC power input into DC power output with intermediate conversion into AC
    • H02M3/24—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters
    • H02M3/28—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC
    • H02M3/325—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal
    • H02M3/335—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal using semiconductor devices only
    • H02M3/33507—Conversion of DC power input into DC power output with intermediate conversion into AC by static converters using discharge tubes with control electrode or semiconductor devices with control electrode to produce the intermediate AC using devices of a triode or a transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of the output voltage or current, e.g. flyback converters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/22—DC, AC or pulsed generators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/001—Arrangements for beam delivery or irradiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inverter Devices (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Dc-Dc Converters (AREA)
JP2013555675A 2012-09-07 2012-09-07 直流電源装置、直流電源装置の制御方法 Active JP5634626B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/072854 WO2014038060A1 (ja) 2012-09-07 2012-09-07 直流電源装置、直流電源装置の制御方法

Publications (2)

Publication Number Publication Date
JP5634626B2 true JP5634626B2 (ja) 2014-12-03
JPWO2014038060A1 JPWO2014038060A1 (ja) 2016-08-08

Family

ID=50236709

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Application Number Title Priority Date Filing Date
JP2013555675A Active JP5634626B2 (ja) 2012-09-07 2012-09-07 直流電源装置、直流電源装置の制御方法

Country Status (10)

Country Link
US (1) US9137885B2 (OSRAM)
EP (1) EP2879471B1 (OSRAM)
JP (1) JP5634626B2 (OSRAM)
KR (1) KR101579416B1 (OSRAM)
CN (1) CN104604337B (OSRAM)
DE (1) DE12884110T1 (OSRAM)
IN (1) IN2014KN03106A (OSRAM)
PL (1) PL2879471T3 (OSRAM)
TW (1) TWI491317B (OSRAM)
WO (1) WO2014038060A1 (OSRAM)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9160240B2 (en) * 2012-09-05 2015-10-13 Kyosan Electric Mfg. Co., Ltd. DC power supply device, and control method for DC power supply device
JP5729732B2 (ja) * 2013-09-27 2015-06-03 株式会社京三製作所 直流電源装置、直流電源装置の制御方法
DE102015117892A1 (de) * 2015-10-21 2017-04-27 Dr. Ing. H.C. F. Porsche Aktiengesellschaft Verfahren zum Auf- oder Entladen einer Fahrzeugbatterie
GB2548209B (en) * 2016-03-07 2018-03-21 Intelligent Growth Solutions Ltd Controllable power and lighting system
KR20220044878A (ko) 2016-06-15 2022-04-11 와틀로 일렉트릭 매뉴팩츄어링 컴파니 열시스템용 전력 변환기
CN109563799B (zh) * 2016-08-17 2021-06-08 三菱电机株式会社 阻挡放电型点火装置
JP6606038B2 (ja) * 2016-09-06 2019-11-13 株式会社東芝 出力電圧制御回路
WO2019077700A1 (ja) * 2017-10-18 2019-04-25 日立ジョンソンコントロールズ空調株式会社 電力変換装置および冷凍空調機器
PL233868B1 (pl) * 2017-12-29 2019-12-31 Politechnika Lubelska Układ i sposób zasilania reaktora plazmowego ze ślizgającym się wyładowaniem
KR102242234B1 (ko) * 2019-05-08 2021-04-20 주식회사 뉴파워 프라즈마 고주파 제너레이터 및 그의 동작 방법
CN111865111B (zh) * 2020-07-22 2024-02-20 新风光电子科技股份有限公司 大功率ac/dc变换等离子体点火器驱动电路及方法
KR102796631B1 (ko) * 2021-11-16 2025-04-16 주식회사 뉴파워 프라즈마 임피던스 매칭 장치 및 이를 포함하는 플라즈마 발생 장치
WO2023155969A1 (de) * 2022-02-15 2023-08-24 Universität Stuttgart Schaltungsanordnung für eine plasmaquelle zur erzeugung von plasma bei atmosphärendruck

Citations (6)

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Publication number Priority date Publication date Assignee Title
JP2002173772A (ja) * 2000-12-05 2002-06-21 Ricoh Co Ltd スパッタリング装置
JP2005050711A (ja) * 2003-07-30 2005-02-24 Eye Lighting Syst Corp 放電灯点灯装置
JP2005094827A (ja) * 2003-09-12 2005-04-07 Shunsuke Hosokawa 高電圧電源パルス電源
JP2006006053A (ja) * 2004-06-18 2006-01-05 Shihen Tech Corp 直流電源装置
WO2010098779A1 (en) * 2009-02-27 2010-09-02 Mks Instruments, Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
JP2010225308A (ja) * 2009-03-19 2010-10-07 Kanazawa Univ 誘導熱プラズマ発生方法及び装置

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JPS63268470A (ja) * 1987-04-27 1988-11-07 Mitsubishi Electric Corp 電力変換器
US5418707A (en) * 1992-04-13 1995-05-23 The United States Of America As Represented By The United States Department Of Energy High voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs
JPH11229138A (ja) 1998-02-09 1999-08-24 Murata Mfg Co Ltd スパッタ装置
KR100488448B1 (ko) * 2001-11-29 2005-05-11 엘지전자 주식회사 플라즈마 디스플레이 패널의 서스테인펄스 발생장치
WO2006099759A2 (de) * 2005-03-24 2006-09-28 Oerlikon Trading Ag, Trübbach Vakuumplasmagenerator
JP5086043B2 (ja) * 2007-11-30 2012-11-28 日立アプライアンス株式会社 電力変換装置および電力変換装置の制御方法
JP5429771B2 (ja) * 2008-05-26 2014-02-26 株式会社アルバック スパッタリング方法
TW201031276A (en) 2009-02-06 2010-08-16 Creating Nano Technologies Inc Resonant inverter and plasma driving system icluding the same
JP2010255061A (ja) 2009-04-27 2010-11-11 Canon Anelva Corp スパッタリング装置及びスパッタリング処理方法
JP5153003B2 (ja) * 2009-08-19 2013-02-27 ウシオ電機株式会社 高圧放電ランプ点灯装置およびプロジェクタ
WO2012023276A1 (ja) 2010-08-18 2012-02-23 株式会社アルバック 直流電源装置
US9379643B2 (en) * 2010-12-23 2016-06-28 The Regents Of The University Of Colorado, A Body Corporate Electrosurgical generator controller for regulation of electrosurgical generator output power
US20130038216A1 (en) * 2012-01-19 2013-02-14 Alvin Hao Remote controlled electronic ballast with digital display

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002173772A (ja) * 2000-12-05 2002-06-21 Ricoh Co Ltd スパッタリング装置
JP2005050711A (ja) * 2003-07-30 2005-02-24 Eye Lighting Syst Corp 放電灯点灯装置
JP2005094827A (ja) * 2003-09-12 2005-04-07 Shunsuke Hosokawa 高電圧電源パルス電源
JP2006006053A (ja) * 2004-06-18 2006-01-05 Shihen Tech Corp 直流電源装置
WO2010098779A1 (en) * 2009-02-27 2010-09-02 Mks Instruments, Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
JP2010225308A (ja) * 2009-03-19 2010-10-07 Kanazawa Univ 誘導熱プラズマ発生方法及び装置

Also Published As

Publication number Publication date
TWI491317B (zh) 2015-07-01
PL2879471T3 (pl) 2017-09-29
WO2014038060A1 (ja) 2014-03-13
KR101579416B1 (ko) 2015-12-21
TW201412199A (zh) 2014-03-16
US20150195896A1 (en) 2015-07-09
JPWO2014038060A1 (ja) 2016-08-08
EP2879471B1 (en) 2017-05-10
US9137885B2 (en) 2015-09-15
IN2014KN03106A (OSRAM) 2015-05-08
EP2879471A4 (en) 2016-07-06
KR20150038625A (ko) 2015-04-08
EP2879471A1 (en) 2015-06-03
CN104604337A (zh) 2015-05-06
DE12884110T1 (de) 2015-09-24
CN104604337B (zh) 2016-05-18

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