JP5621723B2 - 投写光学系及びこれを備えるプロジェクター - Google Patents

投写光学系及びこれを備えるプロジェクター Download PDF

Info

Publication number
JP5621723B2
JP5621723B2 JP2011147999A JP2011147999A JP5621723B2 JP 5621723 B2 JP5621723 B2 JP 5621723B2 JP 2011147999 A JP2011147999 A JP 2011147999A JP 2011147999 A JP2011147999 A JP 2011147999A JP 5621723 B2 JP5621723 B2 JP 5621723B2
Authority
JP
Japan
Prior art keywords
group
lens
light modulation
optical system
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011147999A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013015652A5 (enExample
JP2013015652A (ja
Inventor
信 大谷
信 大谷
栄時 守国
栄時 守国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2011147999A priority Critical patent/JP5621723B2/ja
Priority to US13/529,444 priority patent/US8817382B2/en
Priority to CN201210229321.XA priority patent/CN102866483B/zh
Publication of JP2013015652A publication Critical patent/JP2013015652A/ja
Publication of JP2013015652A5 publication Critical patent/JP2013015652A5/ja
Application granted granted Critical
Publication of JP5621723B2 publication Critical patent/JP5621723B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/08Anamorphotic objectives
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/08Anamorphotic objectives
    • G02B13/12Anamorphotic objectives with variable magnification
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/16Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/22Telecentric objectives or lens systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/64Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/142Adjusting of projection optics

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Projection Apparatus (AREA)
  • Liquid Crystal (AREA)
JP2011147999A 2011-07-04 2011-07-04 投写光学系及びこれを備えるプロジェクター Expired - Fee Related JP5621723B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011147999A JP5621723B2 (ja) 2011-07-04 2011-07-04 投写光学系及びこれを備えるプロジェクター
US13/529,444 US8817382B2 (en) 2011-07-04 2012-06-21 Optical projection system and projector including the same
CN201210229321.XA CN102866483B (zh) 2011-07-04 2012-07-03 投影光学系统及具备该投影光学系统的投影机

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011147999A JP5621723B2 (ja) 2011-07-04 2011-07-04 投写光学系及びこれを備えるプロジェクター

Publications (3)

Publication Number Publication Date
JP2013015652A JP2013015652A (ja) 2013-01-24
JP2013015652A5 JP2013015652A5 (enExample) 2013-10-31
JP5621723B2 true JP5621723B2 (ja) 2014-11-12

Family

ID=47438521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011147999A Expired - Fee Related JP5621723B2 (ja) 2011-07-04 2011-07-04 投写光学系及びこれを備えるプロジェクター

Country Status (3)

Country Link
US (1) US8817382B2 (enExample)
JP (1) JP5621723B2 (enExample)
CN (1) CN102866483B (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421558B (zh) * 2010-12-10 2014-01-01 Delta Electronics Inc 用於一成像模組之投影鏡頭及成像模組
JP2013003566A (ja) * 2011-06-22 2013-01-07 Seiko Epson Corp 投写光学系及びこれを備えるプロジェクター
JP5621723B2 (ja) 2011-07-04 2014-11-12 セイコーエプソン株式会社 投写光学系及びこれを備えるプロジェクター
JP5533798B2 (ja) * 2011-07-04 2014-06-25 セイコーエプソン株式会社 投写光学系及びこれを備えるプロジェクター
JP2013029569A (ja) 2011-07-27 2013-02-07 Seiko Epson Corp 投写光学系及びこれを備えるプロジェクター
JP6198172B2 (ja) * 2012-12-25 2017-09-20 株式会社リコー 投射用ズームレンズ、投射光学系および画像表示装置
JP6098506B2 (ja) * 2013-12-27 2017-03-22 ソニー株式会社 投射型画像表示装置及び投射光学系
CN110618523A (zh) * 2014-10-31 2019-12-27 株式会社日东 投射光学系统和投影仪装置
CN106707673A (zh) * 2015-11-17 2017-05-24 芋头科技(杭州)有限公司 一种投影系统
WO2017126028A1 (ja) * 2016-01-19 2017-07-27 日立マクセル株式会社 投写型映像表示装置
JP2017138490A (ja) * 2016-02-04 2017-08-10 セイコーエプソン株式会社 投射光学系、プロジェクター及びプロジェクター用コンバージョンレンズ
JP7019961B2 (ja) 2017-04-20 2022-02-16 コニカミノルタ株式会社 投影光学系及び投影装置
EP3640698B1 (en) * 2017-06-13 2023-05-17 Panasonic Intellectual Property Management Co., Ltd. Lens system, camera system, and imaging system
CN109407277B (zh) * 2018-12-06 2024-04-23 浙江舜宇光学有限公司 光学成像系统
US11287618B2 (en) * 2019-02-14 2022-03-29 Iain A. Neil Anamorphic objective lens system and method for forming anamorphic objective lens assemblies having different focal lengths
JP2020136909A (ja) * 2019-02-20 2020-08-31 セイコーエプソン株式会社 投写画像の調整方法、及び投写装置
WO2021019298A1 (en) * 2019-08-01 2021-02-04 Ernst Leitz Wetzlar Gmbh Anamorphic objective zoom lens
CN112578543B (zh) * 2019-09-29 2022-10-04 中强光电股份有限公司 变焦投影镜头及投影机
CN111146680B (zh) * 2019-12-12 2021-02-02 上海芬创信息科技有限公司 一种脉冲激光器的曲率光圈透镜轮转的驱动电源系统
JP7363518B2 (ja) * 2020-01-24 2023-10-18 セイコーエプソン株式会社 投写光学系およびプロジェクター
CN112596332B (zh) * 2020-12-23 2022-03-11 广景视睿科技(深圳)有限公司 一种投影系统及投影仪
CN115248491B (zh) * 2021-04-25 2024-02-23 北京闻亭泰科技术发展有限公司 一种dlp投影镜头
WO2023010239A1 (en) * 2021-08-02 2023-02-09 Huawei Technologies Co.,Ltd. Zoom lens optical system
GB2610557B (en) * 2021-09-02 2023-09-06 Cooke Optics Ltd Apparatuses, methods and computer programmes for use in modelling images captured by anamorphic lenses
WO2023196650A1 (en) * 2022-04-08 2023-10-12 Glass Imaging Inc. Imaging system with movable non-symmetric lens

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5442484A (en) 1992-01-06 1995-08-15 Mitsubishi Denki Kabushiki Kaisha Retro-focus type lens and projection-type display apparatus
JP3021985B2 (ja) * 1992-07-24 2000-03-15 キヤノン株式会社 アナモフィックコンバーター
TWI255360B (en) 2002-06-19 2006-05-21 Seiko Epson Corp Production device for projection lens, production method for projection lens, projection lens produced by this production method for projection lens, and projector provided with projection lens
JP4488287B2 (ja) * 2003-11-21 2010-06-23 フジノン株式会社 ビーム集光用レンズ
JP4401802B2 (ja) * 2004-02-04 2010-01-20 キヤノン株式会社 カメラ
JP4537108B2 (ja) * 2004-04-12 2010-09-01 キヤノン株式会社 アナモフィックコンバータ
US7085066B2 (en) * 2004-08-20 2006-08-01 Panavision International, L.P. Anamorphic imaging system
DE102006006981A1 (de) * 2006-02-14 2007-08-23 Jos. Schneider Optische Werke Gmbh Projektionsobjektiv für die digitale Kinoprojektion
JP5006069B2 (ja) 2006-05-01 2012-08-22 株式会社リコー 投射光学系及び画像表示装置
JP2009300526A (ja) * 2008-06-10 2009-12-24 Konica Minolta Opto Inc アナモフィックコンバータおよび画像投影システム
CN101776839B (zh) 2009-01-08 2012-06-20 日立民用电子株式会社 倾斜投射光学系统及使用该系统的投射型图像显示装置
JP5455572B2 (ja) * 2009-11-16 2014-03-26 キヤノン株式会社 ズームレンズ及びそれを有する撮像装置
JP5929478B2 (ja) 2011-06-17 2016-06-08 セイコーエプソン株式会社 投写光学系及びこれを備えるプロジェクター
JP2013003566A (ja) * 2011-06-22 2013-01-07 Seiko Epson Corp 投写光学系及びこれを備えるプロジェクター
JP5621723B2 (ja) 2011-07-04 2014-11-12 セイコーエプソン株式会社 投写光学系及びこれを備えるプロジェクター
JP2013029569A (ja) * 2011-07-27 2013-02-07 Seiko Epson Corp 投写光学系及びこれを備えるプロジェクター

Also Published As

Publication number Publication date
US8817382B2 (en) 2014-08-26
JP2013015652A (ja) 2013-01-24
US20130010371A1 (en) 2013-01-10
CN102866483A (zh) 2013-01-09
CN102866483B (zh) 2014-11-12

Similar Documents

Publication Publication Date Title
JP5621723B2 (ja) 投写光学系及びこれを備えるプロジェクター
JP5533798B2 (ja) 投写光学系及びこれを備えるプロジェクター
JP2013003566A (ja) 投写光学系及びこれを備えるプロジェクター
JP2013029569A (ja) 投写光学系及びこれを備えるプロジェクター
JP5929478B2 (ja) 投写光学系及びこれを備えるプロジェクター
CN105892025B (zh) 投影光学系统
JP5930101B1 (ja) 投射光学系及びプロジェクター
US20100271601A1 (en) Projecting zoom lens and projection type display apparatus
WO2017033445A1 (ja) 投射光学系及びプロジェクター
WO2016199426A1 (ja) 投射光学系及びプロジェクター
JP2002055280A (ja) ズームレンズ及びそれを用いた画像投射装置
JP5118583B2 (ja) 投影レンズおよびこれを用いた投写型表示装置
JP6662159B2 (ja) 投射光学系及びプロジェクター
JP2013003369A (ja) 投写光学系及びこれを備えるプロジェクター
JP5118582B2 (ja) 投影レンズおよびこれを用いた投写型表示装置
JP2013057851A (ja) 投写光学系及びこれを備えるプロジェクター
JP2013254131A (ja) 投写光学系及びこれを備えるプロジェクター
JP2013057852A (ja) 投写光学系及びこれを備えるプロジェクター
JP2005084455A (ja) テレセントリックなズームレンズ
JP2025153289A (ja) 投写レンズ及び投写装置
JP2025070042A (ja) 複焦点レンズ、プロジェクターおよび撮像装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130911

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130911

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140325

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140521

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140610

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140702

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140826

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140908

R150 Certificate of patent or registration of utility model

Ref document number: 5621723

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees