JP5617564B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP5617564B2
JP5617564B2 JP2010264393A JP2010264393A JP5617564B2 JP 5617564 B2 JP5617564 B2 JP 5617564B2 JP 2010264393 A JP2010264393 A JP 2010264393A JP 2010264393 A JP2010264393 A JP 2010264393A JP 5617564 B2 JP5617564 B2 JP 5617564B2
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group
represented
carbon atoms
general formula
linear
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JP2010264393A
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Japanese (ja)
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JP2012113256A5 (enrdf_load_stackoverflow
JP2012113256A (ja
Inventor
信彦 酒井
信彦 酒井
洋治 浦野
洋治 浦野
訓明 岡本
訓明 岡本
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Fujifilm Wako Pure Chemical Corp
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Wako Pure Chemical Industries Ltd
Fujifilm Wako Pure Chemical Corp
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Priority to JP2010264393A priority Critical patent/JP5617564B2/ja
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Publication of JP2012113256A5 publication Critical patent/JP2012113256A5/ja
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

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  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
JP2010264393A 2010-11-26 2010-11-26 感光性樹脂組成物 Expired - Fee Related JP5617564B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010264393A JP5617564B2 (ja) 2010-11-26 2010-11-26 感光性樹脂組成物

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Application Number Priority Date Filing Date Title
JP2010264393A JP5617564B2 (ja) 2010-11-26 2010-11-26 感光性樹脂組成物

Publications (3)

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JP2012113256A JP2012113256A (ja) 2012-06-14
JP2012113256A5 JP2012113256A5 (enrdf_load_stackoverflow) 2014-01-16
JP5617564B2 true JP5617564B2 (ja) 2014-11-05

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JP2010264393A Expired - Fee Related JP5617564B2 (ja) 2010-11-26 2010-11-26 感光性樹脂組成物

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JP (1) JP5617564B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5910245B2 (ja) * 2012-03-29 2016-04-27 大日本印刷株式会社 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたレリーフパターンの製造方法、及び物品
JP6157111B2 (ja) * 2012-12-26 2017-07-05 東京応化工業株式会社 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子
JP6047422B2 (ja) 2013-02-21 2016-12-21 富士フイルム株式会社 感光性組成物、光硬化性組成物、化学増幅型レジスト組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法
JP2017151209A (ja) 2016-02-23 2017-08-31 アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ ポジ型感光性シロキサン組成物
WO2021049563A1 (ja) * 2019-09-10 2021-03-18 学校法人東京理科大学 光塩基発生剤、化合物、光反応性組成物及び反応生成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3244668A (en) * 1961-01-23 1966-04-05 Ethyl Corp Stabilized plastic
JP5071803B2 (ja) * 2007-09-03 2012-11-14 学校法人東京理科大学 感光性樹脂組成物
JP5505036B2 (ja) * 2009-03-31 2014-05-28 大日本印刷株式会社 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品
JP2011052214A (ja) * 2009-08-07 2011-03-17 Dainippon Printing Co Ltd 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたパターン形成方法並びに物品

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JP2012113256A (ja) 2012-06-14

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