JP2012113256A5 - - Google Patents
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- Publication number
- JP2012113256A5 JP2012113256A5 JP2010264393A JP2010264393A JP2012113256A5 JP 2012113256 A5 JP2012113256 A5 JP 2012113256A5 JP 2010264393 A JP2010264393 A JP 2010264393A JP 2010264393 A JP2010264393 A JP 2010264393A JP 2012113256 A5 JP2012113256 A5 JP 2012113256A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- linear
- represented
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims 32
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 18
- 239000011342 resin composition Substances 0.000 claims 17
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 11
- 125000000217 alkyl group Chemical group 0.000 claims 10
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 10
- 125000004093 cyano group Chemical group *C#N 0.000 claims 8
- 125000001424 substituent group Chemical group 0.000 claims 8
- 125000003545 alkoxy group Chemical group 0.000 claims 7
- 125000004122 cyclic group Chemical group 0.000 claims 7
- 125000003118 aryl group Chemical group 0.000 claims 5
- 125000005843 halogen group Chemical group 0.000 claims 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 4
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 238000001723 curing Methods 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 125000000041 C6-C10 aryl group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 0 CC1N(C)C(*)*(C)CC1 Chemical compound CC1N(C)C(*)*(C)CC1 0.000 description 7
- BAUWRHPMUVYFOD-UHFFFAOYSA-N CN(CC1)CCC1O Chemical compound CN(CC1)CCC1O BAUWRHPMUVYFOD-UHFFFAOYSA-N 0.000 description 2
- BCZTZJSORICCIJ-UHFFFAOYSA-N CNCCC[Si+](C)(C)O[Si+](C)C Chemical compound CNCCC[Si+](C)(C)O[Si+](C)C BCZTZJSORICCIJ-UHFFFAOYSA-N 0.000 description 2
- MCTWTZJPVLRJOU-UHFFFAOYSA-N C[n]1cncc1 Chemical compound C[n]1cncc1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 description 2
- DLLMOOWEEOQMCT-ZRDIBKRKSA-N C/C(/C(N1CCCCC1)=O)=C\c(c(O)c1)ccc1OC Chemical compound C/C(/C(N1CCCCC1)=O)=C\c(c(O)c1)ccc1OC DLLMOOWEEOQMCT-ZRDIBKRKSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010264393A JP5617564B2 (ja) | 2010-11-26 | 2010-11-26 | 感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010264393A JP5617564B2 (ja) | 2010-11-26 | 2010-11-26 | 感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012113256A JP2012113256A (ja) | 2012-06-14 |
| JP2012113256A5 true JP2012113256A5 (enrdf_load_stackoverflow) | 2014-01-16 |
| JP5617564B2 JP5617564B2 (ja) | 2014-11-05 |
Family
ID=46497489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010264393A Expired - Fee Related JP5617564B2 (ja) | 2010-11-26 | 2010-11-26 | 感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5617564B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5910245B2 (ja) * | 2012-03-29 | 2016-04-27 | 大日本印刷株式会社 | 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたレリーフパターンの製造方法、及び物品 |
| JP6157111B2 (ja) * | 2012-12-26 | 2017-07-05 | 東京応化工業株式会社 | 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子 |
| JP6047422B2 (ja) | 2013-02-21 | 2016-12-21 | 富士フイルム株式会社 | 感光性組成物、光硬化性組成物、化学増幅型レジスト組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| JP2017151209A (ja) | 2016-02-23 | 2017-08-31 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | ポジ型感光性シロキサン組成物 |
| WO2021049563A1 (ja) * | 2019-09-10 | 2021-03-18 | 学校法人東京理科大学 | 光塩基発生剤、化合物、光反応性組成物及び反応生成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3244668A (en) * | 1961-01-23 | 1966-04-05 | Ethyl Corp | Stabilized plastic |
| JP5071803B2 (ja) * | 2007-09-03 | 2012-11-14 | 学校法人東京理科大学 | 感光性樹脂組成物 |
| JP5505036B2 (ja) * | 2009-03-31 | 2014-05-28 | 大日本印刷株式会社 | 塩基発生剤、樹脂組成物、当該樹脂組成物からなるパターン形成用材料、当該樹脂組成物を用いたパターン形成方法並びに物品 |
| JP2011052214A (ja) * | 2009-08-07 | 2011-03-17 | Dainippon Printing Co Ltd | 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたパターン形成方法並びに物品 |
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2010
- 2010-11-26 JP JP2010264393A patent/JP5617564B2/ja not_active Expired - Fee Related