JP5568603B2 - 多孔質体および無機選択性膜の製造方法 - Google Patents
多孔質体および無機選択性膜の製造方法 Download PDFInfo
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- JP5568603B2 JP5568603B2 JP2012164491A JP2012164491A JP5568603B2 JP 5568603 B2 JP5568603 B2 JP 5568603B2 JP 2012164491 A JP2012164491 A JP 2012164491A JP 2012164491 A JP2012164491 A JP 2012164491A JP 5568603 B2 JP5568603 B2 JP 5568603B2
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- 239000012528 membrane Substances 0.000 title claims description 62
- 238000004519 manufacturing process Methods 0.000 title claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 96
- 239000002184 metal Substances 0.000 claims description 95
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 73
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 37
- 229910052763 palladium Inorganic materials 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 18
- 229910052709 silver Inorganic materials 0.000 claims description 18
- 239000004332 silver Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- 238000007747 plating Methods 0.000 claims description 15
- 229910045601 alloy Inorganic materials 0.000 claims description 14
- 239000000956 alloy Substances 0.000 claims description 14
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- 239000011148 porous material Substances 0.000 claims description 12
- 229910001220 stainless steel Inorganic materials 0.000 claims description 11
- 239000010935 stainless steel Substances 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 239000010953 base metal Substances 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000011575 calcium Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 3
- -1 nickel metal oxide Chemical class 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- 238000005240 physical vapour deposition Methods 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 32
- 239000001257 hydrogen Substances 0.000 description 23
- 229910052739 hydrogen Inorganic materials 0.000 description 23
- 239000007789 gas Substances 0.000 description 18
- 239000001307 helium Substances 0.000 description 11
- 229910052734 helium Inorganic materials 0.000 description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 11
- 230000008569 process Effects 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 239000010963 304 stainless steel Substances 0.000 description 3
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000005373 porous glass Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 229910000619 316 stainless steel Inorganic materials 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000001833 catalytic reforming Methods 0.000 description 1
- 239000012612 commercial material Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009760 electrical discharge machining Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001872 inorganic gas Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/108—Inorganic support material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0221—Group 4 or 5 metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02231—Palladium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Wire Processing (AREA)
Description
実例1の316SSN/Ni/Agのヘリウム(He)放出量を通常の温度および異なる電圧差で測定する。ヘリウム(He)放出量の測定方法は、INTERNATIONAL JOURNAL OF HYDROGEN ENERGY第35巻(2010年)第6,303〜6,310頁の「Preparation of thin Pd membrane on porous stainless steel tubes modified by a two-step method」で開示された方法を参照する。上記文献で提案された方法により得られた試験結果は、実例1の316SSN/Ni/Agの平均ヘリウム(He)放出量が40,000Nm3/m2・h・atmに達することを示している。同じ試験条件で、316多孔質ステンレス鋼(316PSS)のヘリウム(He)放出量は、約200Nm3/m2・h・atmしかなかった。つまり、実例1の316SSN/Ni/Agの平均ヘリウム(He)放出量は、316PSSのヘリウム(He)放出量の200倍である。
実例1の316SSN/Ni/Agを水素透過膜の支持材料として使用し、316SSN/Ni/Ag/Pdの水素透過膜のサンプルとしてパラジウム(Pd)金属層を支持材料の上に形成した。5kPaの水素正圧および500℃(一般的に、水素透過膜の実際の水素透過動作温度は、約400℃〜450℃である)の下で熱処理を500時間行った後、エネルギー分散型X線分析装置(Energy Dispersive X-ray Analyzer, EDS)でサンプルを分析した。その結果、Ag層において、鉄(Fe)、クロム(Cr)、ニッケル(Ni)の金属素子は検出されなかったため、銀がステンレス鋼材料からガス選択性膜(パラジウム金属層)への鉄(Fe)、クロム(Cr)、ニッケル(Ni)の拡散を効果的に抑制することができ、水素透過効果に影響を及ぼさないことを示している。また、一部のパラジウムと銀の間には相互拡散があるため、パラジウムに銀が存在する場合、水素ガスの流量を増やすことができる。
計算すると、実例1の316SSN/Ni/Agの製造コストは、316PSSの製造コストの1/4、すなわち、US$2,500/m2であった。転換層‐ニッケル(Ni)メッキ層の厚さを増やすことによって、銀(Ag)の使用量を減らし、コストをさらに削減することができる。
11、21 孔
12 金属層
14 転換層
16 ガス選択性膜
18 改質層
20 多孔質体
Claims (17)
- 金属メッシュを提供し、そのうち、複数の金属線を織り交ぜて前記金属メッシュを形成することによって、前記金属線の間に複数の第1孔を形成し、前記各第1孔の面積が、1μm2〜10,000μm2であり、前記第1孔間の面積誤差が、5%未満であることと、
所定の金属を使用して前記金属メッシュを全面から被覆し、前記金属メッシュの表面に金属層を形成することにより、前記第1孔よりも小さな孔径の複数の第2孔を有する多孔質体を形成し、そのうち、前記金属メッシュの表面に形成された金属層の厚さを制御することによって、前記各第2孔の面積が、0.01μm2〜1μm2であり、前記第2孔の面積誤差が、5%未満であることと
を含む多孔質体の製造方法。 - 前記金属メッシュ内の前記第1孔が、同一かつ固定された形状を有する請求項1に記載の多孔質体の製造方法。
- 前記金属メッシュが、織りネットまたは孔を有する薄板である請求項1に記載の多孔質体の製造方法。
- 前記金属メッシュが織りネットである時、前記織りネットの織り方が、平織、あや織、綾畳織、または重ね織を含む請求項1に記載の多孔質体の製造方法。
- 前記金属層の材料と前記金属メッシュの材料の固溶解度が、700℃で0at.%に近い請求項1に記載の多孔質体の製造方法。
- 前記金属メッシュの材料が、ステンレス鋼、ニッケル基金属または銅基金属を含む請求項1に記載の多孔質体の製造方法。
- 前記金属層が、銀、銅、カルシウム、ストロンチウム、ランタンの純金属またはその合金を含む請求項1に記載の多孔質体の製造方法。
- 前記金属層の形成方法が、電気化学メッキ、無電解メッキ、溶融メッキ、物理蒸着、または化学蒸着を含む請求項1に記載の多孔質体の製造方法。
- 前記金属層の最大厚が、前記金属メッシュの前記第1孔の孔径の49%である請求項1に記載の多孔質体の製造方法。
- 前記金属層にガス選択性膜を形成して、ガス分離効果を有する前記多孔質体を形成することをさらに含む請求項1に記載の多孔質体の製造方法。
- 前記ガス選択性膜が、パラジウム金属、バナジウム金属、ニオブ金属、タンタル金属、その合金、またはその組み合わせを含む請求項10に記載の多孔質体の製造方法。
- 前記金属メッシュと前記金属層の間に転換層を形成することをさらに含む請求項1に記載の多孔質体の製造方法。
- 前記転換層の材料が、前記金属層の材料と異なる請求項12に記載の多孔質体の製造方法。
- 請求項1に基づいて製造された前記多孔質体を提供し、前記多孔質体の上にガス選択性膜を形成すること
を含む無機選択性膜の製造方法。 - 前記ガス選択性膜の材料が、パラジウム金属、バナジウム金属、ニオブ金属、タンタル金属、その合金、またはその組み合わせを含む請求項14に記載の無機選択性膜の製造方法。
- 前記多孔質体と前記ガス選択性膜の間に改質層を形成することをさらに含む請求項14に記載の無機選択性膜の製造方法。
- 前記改質層の材料が、アルミニウム金属酸化物、マグネシウム金属酸化物、またはニッケル金属酸化物を含む請求項16に記載の無機選択性膜の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW100146913 | 2011-12-16 | ||
TW100146913A TWI442966B (zh) | 2011-12-16 | 2011-12-16 | 多孔基材及無機選擇膜製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2013126685A JP2013126685A (ja) | 2013-06-27 |
JP5568603B2 true JP5568603B2 (ja) | 2014-08-06 |
Family
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Family Applications (1)
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JP2012164491A Active JP5568603B2 (ja) | 2011-12-16 | 2012-07-25 | 多孔質体および無機選択性膜の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20130156949A1 (ja) |
JP (1) | JP5568603B2 (ja) |
CN (1) | CN103157385B (ja) |
TW (1) | TWI442966B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10668429B2 (en) | 2017-07-12 | 2020-06-02 | Industrial Technology Research Institute | Gas filtration structure and method for filtering gas |
US20190015775A1 (en) * | 2017-07-12 | 2019-01-17 | Industrial Technology Research Institute | Membrane and method for filtering gas |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3332346A1 (de) * | 1983-09-08 | 1985-04-04 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Wasserstoff-permeationswand, verfahren zur herstellung derselben und deren verwendung |
US5645626A (en) * | 1990-08-10 | 1997-07-08 | Bend Research, Inc. | Composite hydrogen separation element and module |
JP3213053B2 (ja) * | 1992-04-27 | 2001-09-25 | 住友金属工業株式会社 | 水素分離膜の製造方法 |
JP3993282B2 (ja) * | 1997-09-29 | 2007-10-17 | 三菱重工業株式会社 | 分離膜モジュール |
JPH11104472A (ja) * | 1997-10-02 | 1999-04-20 | Oputonikusu Seimitsu:Kk | 水素ガス精製用透過膜構造体およびその製造方法およびそれを用いた水素ガス精製装置 |
US6152987A (en) * | 1997-12-15 | 2000-11-28 | Worcester Polytechnic Institute | Hydrogen gas-extraction module and method of fabrication |
KR100247557B1 (ko) * | 1997-12-24 | 2000-03-15 | 김충섭 | 수소기체 분리용 복합막의 제조방법 |
GB2394428B (en) * | 2002-10-24 | 2006-09-20 | Microfiltrex Ltd | Improvements in and relating to filters |
CN1628898B (zh) * | 2003-12-19 | 2012-08-29 | 雷敏宏 | 用于高纯度氢气纯化的支撑式钯膜的制备方法 |
JP2007038111A (ja) * | 2005-08-02 | 2007-02-15 | Tanaka Kikinzoku Kogyo Kk | 水素透過素子及びその製造方法 |
-
2011
- 2011-12-16 TW TW100146913A patent/TWI442966B/zh active
-
2012
- 2012-03-07 CN CN201210062650.XA patent/CN103157385B/zh active Active
- 2012-05-21 US US13/476,024 patent/US20130156949A1/en not_active Abandoned
- 2012-07-25 JP JP2012164491A patent/JP5568603B2/ja active Active
Also Published As
Publication number | Publication date |
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US20130156949A1 (en) | 2013-06-20 |
TW201325696A (zh) | 2013-07-01 |
CN103157385B (zh) | 2016-04-13 |
CN103157385A (zh) | 2013-06-19 |
JP2013126685A (ja) | 2013-06-27 |
TWI442966B (zh) | 2014-07-01 |
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