JP5554617B2 - 保持テーブル - Google Patents
保持テーブル Download PDFInfo
- Publication number
- JP5554617B2 JP5554617B2 JP2010091201A JP2010091201A JP5554617B2 JP 5554617 B2 JP5554617 B2 JP 5554617B2 JP 2010091201 A JP2010091201 A JP 2010091201A JP 2010091201 A JP2010091201 A JP 2010091201A JP 5554617 B2 JP5554617 B2 JP 5554617B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- holding table
- work
- suction
- rotation support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004020 conductor Substances 0.000 claims description 15
- 238000002309 gasification Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- 230000002093 peripheral effect Effects 0.000 description 14
- 238000012545 processing Methods 0.000 description 13
- 230000015556 catabolic process Effects 0.000 description 10
- 238000004891 communication Methods 0.000 description 10
- 239000003990 capacitor Substances 0.000 description 9
- 239000012212 insulator Substances 0.000 description 9
- 230000005611 electricity Effects 0.000 description 8
- 238000009413 insulation Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000006698 induction Effects 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 6
- 230000003068 static effect Effects 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010091201A JP5554617B2 (ja) | 2010-04-12 | 2010-04-12 | 保持テーブル |
TW100105997A TWI515819B (zh) | 2010-04-12 | 2011-02-23 | Keep the table |
CN201110090406.XA CN102214550B (zh) | 2010-04-12 | 2011-04-11 | 保持工作台 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010091201A JP5554617B2 (ja) | 2010-04-12 | 2010-04-12 | 保持テーブル |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011222800A JP2011222800A (ja) | 2011-11-04 |
JP5554617B2 true JP5554617B2 (ja) | 2014-07-23 |
Family
ID=44745812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010091201A Active JP5554617B2 (ja) | 2010-04-12 | 2010-04-12 | 保持テーブル |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5554617B2 (zh) |
CN (1) | CN102214550B (zh) |
TW (1) | TWI515819B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4577100A (en) * | 1983-12-27 | 1986-03-18 | United Technologies Corporation | Temperature compensated optical pressure sensor |
JP5662744B2 (ja) * | 2010-09-10 | 2015-02-04 | 東京応化工業株式会社 | 保持装置 |
JP5976312B2 (ja) * | 2011-12-22 | 2016-08-23 | 株式会社ディスコ | ウェーハ保持装置 |
CN104603926B (zh) * | 2012-08-29 | 2017-03-01 | 夏普株式会社 | 基板处理装置和液晶显示面板制造装置 |
JP2015170617A (ja) * | 2014-03-04 | 2015-09-28 | 東京エレクトロン株式会社 | 液処理装置 |
JP6382568B2 (ja) * | 2014-05-09 | 2018-08-29 | 株式会社ディスコ | レーザー加工装置 |
JP6494451B2 (ja) * | 2015-07-06 | 2019-04-03 | 株式会社ディスコ | チャックテーブル及び洗浄装置 |
JP6994852B2 (ja) * | 2017-06-30 | 2022-01-14 | 株式会社ディスコ | レーザー加工装置及びレーザー加工方法 |
JP6944830B2 (ja) * | 2017-07-21 | 2021-10-06 | 東京エレクトロン株式会社 | ワーク保持機構及びワーク処理システム |
KR20200036001A (ko) | 2017-08-10 | 2020-04-06 | 하마마츠 포토닉스 가부시키가이샤 | 미러 장치 |
CN108470851B (zh) * | 2018-03-26 | 2020-03-06 | 京东方科技集团股份有限公司 | 基板处理方法和基板处理装置 |
JP7186356B2 (ja) * | 2019-01-16 | 2022-12-09 | 株式会社東京精密 | ウェーハチャック及びウェーハ保持装置 |
TWI706928B (zh) * | 2020-01-15 | 2020-10-11 | 鴻鎷科技有限公司 | 精密陶瓷工作台 |
CN113524062A (zh) * | 2020-04-16 | 2021-10-22 | 鸿鎷科技有限公司 | 精密陶瓷工作台 |
CN112157724A (zh) * | 2020-09-22 | 2021-01-01 | 安徽中科春谷激光产业技术研究院有限公司 | 一种激光切割较薄材料防振动工作吸台 |
JP2022147550A (ja) * | 2021-03-23 | 2022-10-06 | 株式会社東京精密 | ワーク保持装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11239991A (ja) * | 1997-12-22 | 1999-09-07 | Shipley Far East Kk | 物体の保持装置及びそれを用いる物体の保持方法 |
JP2002164314A (ja) * | 2000-11-27 | 2002-06-07 | Dainippon Screen Mfg Co Ltd | 回転支持板およびそれを用いた基板処理装置 |
JP2002203783A (ja) * | 2001-10-18 | 2002-07-19 | Tokyo Electron Ltd | 処理方法及び処理装置 |
TW594297B (en) * | 2002-07-19 | 2004-06-21 | Hitachi Ind Co Ltd | Substrate assembling device |
JP4705450B2 (ja) * | 2005-03-11 | 2011-06-22 | 株式会社ディスコ | ウェーハの保持機構 |
JP2009043771A (ja) * | 2007-08-06 | 2009-02-26 | Disco Abrasive Syst Ltd | チャックテーブル機構および被加工物の保持方法 |
JP2010283286A (ja) * | 2009-06-08 | 2010-12-16 | Disco Abrasive Syst Ltd | ワーク保持装置 |
-
2010
- 2010-04-12 JP JP2010091201A patent/JP5554617B2/ja active Active
-
2011
- 2011-02-23 TW TW100105997A patent/TWI515819B/zh active
- 2011-04-11 CN CN201110090406.XA patent/CN102214550B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN102214550A (zh) | 2011-10-12 |
TWI515819B (zh) | 2016-01-01 |
JP2011222800A (ja) | 2011-11-04 |
CN102214550B (zh) | 2015-11-04 |
TW201145444A (en) | 2011-12-16 |
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