JP5540235B2 - Ｘ線分析装置および発光分析装置 - Google Patents
Ｘ線分析装置および発光分析装置 Download PDFInfo
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- JP5540235B2 JP5540235B2 JP2010142404A JP2010142404A JP5540235B2 JP 5540235 B2 JP5540235 B2 JP 5540235B2 JP 2010142404 A JP2010142404 A JP 2010142404A JP 2010142404 A JP2010142404 A JP 2010142404A JP 5540235 B2 JP5540235 B2 JP 5540235B2
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- 230000005856 abnormality Effects 0.000 claims description 196
- 238000005259 measurement Methods 0.000 claims description 40
- 238000001514 detection method Methods 0.000 claims description 34
- 238000004458 analytical method Methods 0.000 claims description 29
- 238000002441 X-ray diffraction Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 49
- 230000002159 abnormal effect Effects 0.000 description 39
- 238000012544 monitoring process Methods 0.000 description 9
- 238000011835 investigation Methods 0.000 description 5
- 238000004876 x-ray fluorescence Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000003745 diagnosis Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 210000000707 wrist Anatomy 0.000 description 1
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| Application Number | Priority Date | Filing Date | Title |
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| JP2010142404A JP5540235B2 (ja) | 2010-06-23 | 2010-06-23 | Ｘ線分析装置および発光分析装置 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2010142404A JP5540235B2 (ja) | 2010-06-23 | 2010-06-23 | Ｘ線分析装置および発光分析装置 |
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| Publication Number | Publication Date |
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| JP2012007928A JP2012007928A (ja) | 2012-01-12 |
| JP2012007928A5 JP2012007928A5 (enrdf_load_stackoverflow) | 2013-04-04 |
| JP5540235B2 true JP5540235B2 (ja) | 2014-07-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2010142404A Active JP5540235B2 (ja) | 2010-06-23 | 2010-06-23 | Ｘ線分析装置および発光分析装置 |
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| JP (1) | JP5540235B2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023135915A1 (ja) | 2022-01-13 | 2023-07-20 | 株式会社リガク | 蛍光ｘ線分析装置 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6510264B2 (ja) * | 2015-02-20 | 2019-05-08 | 株式会社イシダ | 物品検査装置 |
| JP6863267B2 (ja) * | 2017-12-21 | 2021-04-21 | 株式会社島津製作所 | Ｘ線分析装置及び異常検知方法 |
| JP2021081190A (ja) * | 2018-03-20 | 2021-05-27 | 株式会社島津製作所 | 信号処理装置、分析装置および信号処理方法 |
| JP7190749B2 (ja) * | 2020-05-18 | 2022-12-16 | 株式会社リガク | 蛍光ｘ線分析装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3569716B2 (ja) * | 1998-07-07 | 2004-09-29 | 理学電機工業株式会社 | 高周波グロー放電発光分光分析方法およびその装置 |
| JP3477499B2 (ja) * | 1999-12-28 | 2003-12-10 | 理学電機工業株式会社 | 装置保守情報の記憶機能を備えたｘ線分析装置 |
| JP3422980B2 (ja) * | 2000-09-26 | 2003-07-07 | 理学電機工業株式会社 | 蛍光ｘ線分析装置 |
| JP3433178B2 (ja) * | 2000-12-05 | 2003-08-04 | 理学電機工業株式会社 | 蛍光ｘ線分析装置 |
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- 2010-06-23 JP JP2010142404A patent/JP5540235B2/ja active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023135915A1 (ja) | 2022-01-13 | 2023-07-20 | 株式会社リガク | 蛍光ｘ線分析装置 |
| US12247935B2 (en) | 2022-01-13 | 2025-03-11 | Rigaku Corporation | X-ray fluorescence spectrometer |
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| Publication number | Publication date |
|---|---|
| JP2012007928A (ja) | 2012-01-12 |
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