JP5525491B2 - レーザスコアリングにおける亀裂深さの制御 - Google Patents
レーザスコアリングにおける亀裂深さの制御 Download PDFInfo
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- JP5525491B2 JP5525491B2 JP2011156493A JP2011156493A JP5525491B2 JP 5525491 B2 JP5525491 B2 JP 5525491B2 JP 2011156493 A JP2011156493 A JP 2011156493A JP 2011156493 A JP2011156493 A JP 2011156493A JP 5525491 B2 JP5525491 B2 JP 5525491B2
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- Prior art keywords
- glass
- laser
- moving
- crack
- trailing edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011521 glass Substances 0.000 claims description 76
- 238000000034 method Methods 0.000 claims description 28
- 238000001816 cooling Methods 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 13
- 239000002826 coolant Substances 0.000 claims description 12
- 230000035515 penetration Effects 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003213 activating effect Effects 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 238000005520 cutting process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000035882 stress Effects 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000013077 scoring method Methods 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0738—Shaping the laser spot into a linear shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Laser Beam Processing (AREA)
Description
a=0.2から2.0h、かつ
b=1.0から10.0h、
ここで、aは短軸の長さであり、bは長軸の長さであり、hはレーザスコアリングされているガラスシートの厚さである。コンドラテンコによれば、bが10.0hよりも大きい場合には、切断プロセスの精度に問題が生じる。したがって、0.7mmの厚さ(液晶ディスプレイ基板に一般的な厚さ)を有するガラス基板に関して、コンドラテンコは、ビームスポットの長軸は7mmの長さを越えるべきではないことを教示している。
12 開始点
20 亀裂
22 ノズル
24 冷却液
30 レーザ
32 第1のレーザビーム
34 円柱レンズ
36 第2のレーザビーム
37 第3のレーザビーム
40 遮断シールド
Claims (8)
- レーザビームをその表面上に通過させることによりガラスに浅い切り目を付ける方法であって、
レーザを作動させて第1のビームを形成し、
該第1のビームを1つ以上のレンズにより変換して、長軸と短軸を有する細長い楕円形ビームスポットを有する第2のビームを形成し、
該第2のビームの両端部に対応する該第2のビームの一部を物理的に遮断して、該第2のビームのスポットの細長い楕円形ビームスポットの長軸を減少させ、両端部が切断された細長い楕円形ビームスポットを有する第3のビームを形成し、
該第3のビームを前記ガラスの表面を横切り移動させて、加熱されたガラスを形成し、ここで、移動している第3のビームが前縁および後縁を有し、
該移動している第3のビームの後縁から所定の距離で、前記加熱されたガラス上に冷却液をノズルから流して、該ガラス中に亀裂を形成し、
前記流れている冷却液と前記移動している第3のビームの後縁との間の所定の距離を制御して、前記ガラス中の亀裂の貫通深さの制御を行なう、
各工程を含むことを特徴とする方法。 - 前記流れている冷却液と前記移動している第3のビームの後縁との間の所定の距離を制御する工程が、前記移動中の第3のビームの後縁により近い点において前記流れている冷却液で前記ガラスを冷却することにより、前記所定の距離を変える工程を含み、それにより、前記流れている冷却液が前記移動中の第3のビームの後縁からより遠い点にある際のクラックの貫通深さよりも浅い貫通深さを有するクラックが生じることを特徴とする請求項1記載の方法。
- 前記第1のビームが、中央領域においてより低いパワーを有し、該中央領域の外側で少なくとも1対のパワー強度ピークを有するパワー分布を有し、
前記第3のビームが、前記端部が切断された第2のビームに対応する傾斜を有するパワー分布を有することを特徴とする請求項1記載の方法。 - 前記レーザがCO 2 レーザを含むことを特徴とする請求項1記載の方法。
- 前記レーザがDモードで作動されていることを特徴とする請求項1記載の方法。
- 前記第3のビームが前記ガラスに対して200ミリメートル毎秒から700ミリメートル毎秒までの速度で動かされることを特徴とする請求項1記載の方法。
- 前記第1のビームを前記第2のビームに変換するのに二つの円柱レンズが用いられることを特徴とする請求項1記載の方法。
- 前記第2のビームの長軸が、該第2のビームの前記端部が遮断された後に20パーセントから40パーセントまで減少していることを特徴とする請求項1記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US264938 | 1999-03-09 | ||
US09/264,938 US6327875B1 (en) | 1999-03-09 | 1999-03-09 | Control of median crack depth in laser scoring |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000064934A Division JP2000281371A (ja) | 1999-03-09 | 2000-03-09 | レーザスコアリングにおける亀裂深さの制御 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011246349A JP2011246349A (ja) | 2011-12-08 |
JP5525491B2 true JP5525491B2 (ja) | 2014-06-18 |
Family
ID=23008282
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000064934A Pending JP2000281371A (ja) | 1999-03-09 | 2000-03-09 | レーザスコアリングにおける亀裂深さの制御 |
JP2011156493A Expired - Fee Related JP5525491B2 (ja) | 1999-03-09 | 2011-07-15 | レーザスコアリングにおける亀裂深さの制御 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000064934A Pending JP2000281371A (ja) | 1999-03-09 | 2000-03-09 | レーザスコアリングにおける亀裂深さの制御 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6327875B1 (ja) |
JP (2) | JP2000281371A (ja) |
KR (1) | KR100604765B1 (ja) |
TW (1) | TW464578B (ja) |
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US5132505A (en) * | 1990-03-21 | 1992-07-21 | U.S. Philips Corporation | Method of cleaving a brittle plate and device for carrying out the method |
RU2024441C1 (ru) | 1992-04-02 | 1994-12-15 | Владимир Степанович Кондратенко | Способ резки неметаллических материалов |
US5776220A (en) | 1994-09-19 | 1998-07-07 | Corning Incorporated | Method and apparatus for breaking brittle materials |
MY120533A (en) * | 1997-04-14 | 2005-11-30 | Schott Ag | Method and apparatus for cutting through a flat workpiece made of brittle material, especially glass. |
JPH1110379A (ja) * | 1997-06-24 | 1999-01-19 | Hitachi Constr Mach Co Ltd | レーザ加工用光学装置 |
US6489588B1 (en) * | 1999-11-24 | 2002-12-03 | Applied Photonics, Inc. | Method and apparatus for separating non-metallic materials |
-
1999
- 1999-03-09 US US09/264,938 patent/US6327875B1/en not_active Expired - Lifetime
-
2000
- 2000-03-08 KR KR1020000011483A patent/KR100604765B1/ko not_active IP Right Cessation
- 2000-03-09 JP JP2000064934A patent/JP2000281371A/ja active Pending
- 2000-03-10 TW TW089104530A patent/TW464578B/zh not_active IP Right Cessation
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2011
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Also Published As
Publication number | Publication date |
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JP2011246349A (ja) | 2011-12-08 |
KR100604765B1 (ko) | 2006-07-26 |
KR20010014540A (ko) | 2001-02-26 |
JP2000281371A (ja) | 2000-10-10 |
TW464578B (en) | 2001-11-21 |
US6327875B1 (en) | 2001-12-11 |
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