JP5521286B2 - 薄膜素子の製造方法 - Google Patents

薄膜素子の製造方法 Download PDF

Info

Publication number
JP5521286B2
JP5521286B2 JP2008139130A JP2008139130A JP5521286B2 JP 5521286 B2 JP5521286 B2 JP 5521286B2 JP 2008139130 A JP2008139130 A JP 2008139130A JP 2008139130 A JP2008139130 A JP 2008139130A JP 5521286 B2 JP5521286 B2 JP 5521286B2
Authority
JP
Japan
Prior art keywords
thin film
insulating film
substrate
temporary substrate
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008139130A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009289864A (ja
JP2009289864A5 (https=
Inventor
基彦 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Priority to JP2008139130A priority Critical patent/JP5521286B2/ja
Publication of JP2009289864A publication Critical patent/JP2009289864A/ja
Publication of JP2009289864A5 publication Critical patent/JP2009289864A5/ja
Application granted granted Critical
Publication of JP5521286B2 publication Critical patent/JP5521286B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Thin Film Transistor (AREA)
JP2008139130A 2008-05-28 2008-05-28 薄膜素子の製造方法 Expired - Fee Related JP5521286B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008139130A JP5521286B2 (ja) 2008-05-28 2008-05-28 薄膜素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008139130A JP5521286B2 (ja) 2008-05-28 2008-05-28 薄膜素子の製造方法

Publications (3)

Publication Number Publication Date
JP2009289864A JP2009289864A (ja) 2009-12-10
JP2009289864A5 JP2009289864A5 (https=) 2011-01-06
JP5521286B2 true JP5521286B2 (ja) 2014-06-11

Family

ID=41458818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008139130A Expired - Fee Related JP5521286B2 (ja) 2008-05-28 2008-05-28 薄膜素子の製造方法

Country Status (1)

Country Link
JP (1) JP5521286B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8558960B2 (en) 2010-09-13 2013-10-15 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device and method for manufacturing the same
TWI761605B (zh) * 2012-09-14 2022-04-21 日商半導體能源研究所股份有限公司 半導體裝置及其製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3116085B2 (ja) * 1997-09-16 2000-12-11 東京農工大学長 半導体素子形成法
JP5052033B2 (ja) * 2005-04-28 2012-10-17 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3924303B2 (ja) * 2005-05-09 2007-06-06 ローム株式会社 窒化物半導体素子およびその製法
JP5216201B2 (ja) * 2005-09-27 2013-06-19 株式会社半導体エネルギー研究所 半導体装置、半導体装置の作製方法、液晶表示装置、ｒｆｉｄタグ、発光装置及び電子機器

Also Published As

Publication number Publication date
JP2009289864A (ja) 2009-12-10

Similar Documents

Publication Publication Date Title
KR100364949B1 (ko) 액정 표시 장치의 제조 방법
JP5309672B2 (ja) 薄膜素子およびその製造方法
US9252164B2 (en) Display device and method for manufacturing the same
KR101618157B1 (ko) 표시 장치 및 이의 제조 방법
CN109962095B (zh) 无边框显示装置、无边框显示面板及其制造方法
US8604485B2 (en) Intermediate structure, method and substrate for fabricating flexible display device
JP5345303B2 (ja) 表示装置とその製造方法
JP5483151B2 (ja) 薄膜素子およびその製造方法
JP2008134594A (ja) フレキシブル表示装置及びその製造方法
TWI444945B (zh) 用於製作軟性顯示裝置之基板、結構及軟性顯示裝置的製作方法
CN101231972A (zh) 柔性显示器件及其制造方法
CN102473369A (zh) 配线基板及其制造方法、显示面板以及显示装置
TWI222545B (en) Method of transferring a thin film device onto a plastic sheet and method of forming a flexible liquid crystal display
JP2010008677A (ja) 画像表示装置
JP2014021170A (ja) 液晶表示装置及びその製造方法
JP5521286B2 (ja) 薄膜素子の製造方法
JP4301302B2 (ja) 半導体装置、半導体装置の製造方法及び電子機器
KR102430807B1 (ko) 플렉서블 터치 스크린 패널 및 그 제조 방법
KR102418375B1 (ko) 표시 장치 및 이의 제조 방법
JP2006196712A (ja) 薄膜素子の製造方法
KR20140081408A (ko) 콘택홀 형성방법 및 박막트랜지스터 어레이 기판의 제조방법
CN113823654B (zh) 一种驱动基板、发光装置及其制作方法
CN111223399A (zh) 柔性显示面板的制作方法
JP2011222688A5 (https=)
US9484552B2 (en) Manufacturing method of flexible device substrate

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101110

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101110

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130121

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130212

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130412

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130903

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131101

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140311

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140324

R150 Certificate of patent or registration of utility model

Ref document number: 5521286

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees