JP5487402B2 - 磁気平衡式電流センサ - Google Patents
磁気平衡式電流センサ Download PDFInfo
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- JP5487402B2 JP5487402B2 JP2012530593A JP2012530593A JP5487402B2 JP 5487402 B2 JP5487402 B2 JP 5487402B2 JP 2012530593 A JP2012530593 A JP 2012530593A JP 2012530593 A JP2012530593 A JP 2012530593A JP 5487402 B2 JP5487402 B2 JP 5487402B2
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- 230000005291 magnetic effect Effects 0.000 title claims description 300
- 230000006698 induction Effects 0.000 claims description 16
- 230000005389 magnetism Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 40
- 239000010408 film Substances 0.000 description 28
- 239000000758 substrate Substances 0.000 description 23
- 238000001514 detection method Methods 0.000 description 18
- 239000010410 layer Substances 0.000 description 15
- 239000004020 conductor Substances 0.000 description 12
- 239000011229 interlayer Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910052814 silicon oxide Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000009434 installation Methods 0.000 description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 230000002238 attenuated effect Effects 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005290 antiferromagnetic effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000013080 microcrystalline material Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/205—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using magneto-resistance devices, e.g. field plates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/207—Constructional details independent of the type of device used
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/0023—Electronic aspects, e.g. circuits for stimulation, evaluation, control; Treating the measured signals; calibration
- G01R33/0041—Electronic aspects, e.g. circuits for stimulation, evaluation, control; Treating the measured signals; calibration using feed-back or modulation techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
- Measuring Magnetic Variables (AREA)
Description
図1及び図2は、本発明の実施の形態に係る磁気平衡式電流センサを示す図である。本実施の形態においては、図1及び図2に示す磁気平衡式電流センサは、被測定電流Iが流れる導体11の近傍に配設される。この磁気平衡式電流センサは、導体11に流れる被測定電流Iによる誘導磁界を打ち消す磁界(キャンセル磁界)を生じさせるフィードバック回路12を備えている。このフィードバック回路12は、被測定電流Iによって発生する磁界を打ち消す方向に巻回されたフィードバックコイル121と、磁気検出素子である2つの磁気抵抗効果素子122a,122bと、2つの固定抵抗素子123a,123bとを有する。
Claims (5)
- 被測定電流を流通する電流線からの誘導磁界により出力が変化する磁気センサと、
前記磁気センサに印加される前記誘導磁界を減衰させる磁界減衰部と、
前記磁気センサの出力により前記誘導磁界を相殺するキャンセル磁界を発生させ、当該キャンセル磁界と前記誘導磁界とが相殺される平衡状態となったときに、前記被測定電流に応じた電流が流れるフィードバックコイルとを備え、
前記フィードバックコイルは、前記磁界減衰部に印加される前記キャンセル磁界の向きを、前記磁界減衰部に印加される前記誘導磁界の向きに対して逆方向に向けるように設けられたことを特徴とする磁気平衡式電流センサ。 - 前記磁界減衰部は、前記磁気センサと前記電流線との間に配置されたことを特徴とする請求項1に記載の磁気平衡式電流センサ。
- 前記フィードバックコイルが、前記磁気センサ及び前記磁界減衰部を内側に配置可能な筒状に形成されることを特徴とする請求項1または請求項2に記載の磁気平衡式電流センサ。
- 前記フィードバックコイルが、平面コイルであることを特徴とする請求項1または請求項2に記載の磁気平衡式電流センサ。
- 前記磁気センサ、前記磁界減衰部、前記フィードバックコイルの順、または前記フィードバックコイル、前記磁界減衰部、前記磁気センサの順に、基板に対して積層されたことを特徴とする請求項4に記載の磁気平衡式電流センサ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012530593A JP5487402B2 (ja) | 2010-08-23 | 2011-07-25 | 磁気平衡式電流センサ |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010185825 | 2010-08-23 | ||
JP2010185825 | 2010-08-23 | ||
PCT/JP2011/066803 WO2012026255A1 (ja) | 2010-08-23 | 2011-07-25 | 磁気平衡式電流センサ |
JP2012530593A JP5487402B2 (ja) | 2010-08-23 | 2011-07-25 | 磁気平衡式電流センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2012026255A1 JPWO2012026255A1 (ja) | 2013-10-28 |
JP5487402B2 true JP5487402B2 (ja) | 2014-05-07 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2012530593A Active JP5487402B2 (ja) | 2010-08-23 | 2011-07-25 | 磁気平衡式電流センサ |
Country Status (4)
Country | Link |
---|---|
US (1) | US9069032B2 (ja) |
JP (1) | JP5487402B2 (ja) |
CN (1) | CN103069282B (ja) |
WO (1) | WO2012026255A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013161773A1 (ja) * | 2012-04-23 | 2013-10-31 | 日立金属株式会社 | 磁気センサデバイス |
WO2014148437A1 (ja) | 2013-03-18 | 2014-09-25 | 日立金属株式会社 | 磁気センサ |
JP6255902B2 (ja) * | 2013-10-30 | 2018-01-10 | Tdk株式会社 | 磁界検出装置 |
JP6446859B2 (ja) * | 2014-06-27 | 2019-01-09 | ヤマハ株式会社 | 集積回路 |
WO2016056137A1 (ja) * | 2014-10-10 | 2016-04-14 | 日立金属株式会社 | 電流検出装置、及び電流検出方法 |
WO2017002678A1 (ja) * | 2015-07-01 | 2017-01-05 | 株式会社村田製作所 | 電流センサ |
WO2017169156A1 (ja) * | 2016-03-30 | 2017-10-05 | アルプス電気株式会社 | 平衡式磁界検知装置 |
WO2018143122A1 (ja) * | 2017-02-02 | 2018-08-09 | アルプス電気株式会社 | 平衡式電流センサ |
JP6658676B2 (ja) * | 2017-06-13 | 2020-03-04 | Tdk株式会社 | 電流センサ |
JP6620796B2 (ja) * | 2017-07-28 | 2019-12-18 | Tdk株式会社 | オフセット推定装置および方法、磁気センサの補正装置ならびに電流センサ |
CN109932670B (zh) * | 2019-03-27 | 2021-06-29 | 三峡大学 | 基于上电置位的闭环tmr磁场测量装置 |
JP7332725B2 (ja) * | 2020-01-23 | 2023-08-23 | アルプスアルパイン株式会社 | 磁気抵抗効果素子を用いた磁気センサおよび電流センサ |
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2011
- 2011-07-25 JP JP2012530593A patent/JP5487402B2/ja active Active
- 2011-07-25 CN CN201180040724.3A patent/CN103069282B/zh active Active
- 2011-07-25 WO PCT/JP2011/066803 patent/WO2012026255A1/ja active Application Filing
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2013
- 2013-01-16 US US13/743,274 patent/US9069032B2/en active Active
Patent Citations (2)
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JP2000516714A (ja) * | 1996-08-16 | 2000-12-12 | ノンボラタイル エレクトロニクス,インコーポレイテッド | 磁流センサ |
JP2004132790A (ja) * | 2002-10-09 | 2004-04-30 | Fuji Electric Holdings Co Ltd | 電流センサ |
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Publication number | Publication date |
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US20130127456A1 (en) | 2013-05-23 |
JPWO2012026255A1 (ja) | 2013-10-28 |
US9069032B2 (en) | 2015-06-30 |
WO2012026255A1 (ja) | 2012-03-01 |
CN103069282B (zh) | 2015-06-03 |
CN103069282A (zh) | 2013-04-24 |
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